2-oxaspiro<4.5>dec-7-en-3-one | 133568-33-9

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 内酯类
• 英文名称: 2-oxaspiro<4.5>dec-7-en-3-one
• 英文别名: 2-Oxaspiro[4.5]dec-7-en-3-one
• CAS: 133568-33-9
• 化学式: C₉H₁₂O₂
• 分子量: 152.193
• InChiKey: SXROUIRZVOWFBP-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.4
• 重原子数：
  11
• 可旋转键数：
  0
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.67
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为产物：
  描述：

  (E)-4-(5-bromo-3-pentenyl)-2(5H)-furanone 以6%的产率得到
  参考文献：
  名称：

  AMPUTCH, MARY A.;LITTLE, R. DANIEL, TETRAHEDRON, 47,(1991) N, C. 383-402

  摘要：

  DOI：

文献信息

• Polymerizable compound, polymer, positive resist composition, and patterning process using the same
  申请人：Hatakeyama Jun

  公开号：US20090297979A1

  公开（公告）日：2009-12-03

  The present invention provides; a polymer suitable as a base resin for a positive resist composition, in particular a chemically amplified positive resist composition, having a higher resolution, a larger exposure allowance, a smaller sparse-dense size difference, a better process applicability, a better pattern configuration after exposure, and in addition, a further excellent etching resistance, than a conventional positive resist; a positive resist composition using the same; a patterning process; and a novel polymerizable compound to obtain a polymer like this. The present invention was accomplished by a polymer whose hydrogen atom of at least a carboxyl group is substituted by an acid labile group represented by the following general formula (2), a positive resist composition using the same, a patterning process, and a novel polymerizable compound to obtain a polymer like this.

  本发明提供了一种聚合物，适用于作为正向光刻胶组成的基础树脂，特别是化学放大正向光刻胶组成，具有更高的分辨率、更大的曝光容差、更小的稀密差异、更好的工艺适用性、曝光后更好的图案构形，以及比传统正向光刻胶更出色的蚀刻抗性；使用该聚合物的正向光刻胶组成；一种图案化工艺；以及一种新型的可聚合化合物，以获得类似的聚合物。本发明通过一种聚合物实现，其至少一个羧基的氢原子被下述通式（2）所表示的酸敏感基团所取代，使用该聚合物的正向光刻胶组成，一种图案化工艺，以及一种新型的可聚合化合物，以获得类似的聚合物。
• Electroreductive cyclization reactions: Attempts to use 2(5h)furanones (α,β-unsaturated butenolides). Dominance of acid-base over cyclization chemistry
  作者：Mary A. Amputch、R.Daniel Little

  DOI：10.1016/s0040-4020(01)90497-1

  日期：1991.1

  butenolides as substrates in the electroreductive cyclization reaction has been investigated. A variety of butenolides bearing either an α,β,-unsaturated ester, an α,β,δ,-unsaturated ester, allylic bromide, bromide, mesylate or aldehyde functionality on the appending side chain have been examined. The performance of each of these systems under electroreductive cyclization reaction conditions is severely limited

  已经研究了丁烯内酯在电还原环化反应中作为底物的潜在用途。已经研究了在附接的侧链上带有α，β，不饱和酯，α，β，δ，不饱和酯，烯丙基溴，溴化物，甲磺酸酯或醛官能度的各种丁烯化物。这些系统在电还原环化反应条件下的性能受到丁烯内酯环的C5和附加侧链的C1处酸性质子的存在的严重限制。
• POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS
  申请人：Hatakeyama Jun

  公开号：US20100227273A1

  公开（公告）日：2010-09-09

  A positive resist composition comprising as a base resin a polymer having carboxyl groups whose hydrogen is substituted by an acid labile group of acenaphthene structure exhibits a high contrast of alkaline dissolution rate before and after exposure, a high resolution, a good pattern profile and minimal LER after exposure, a significant effect of suppressing acid diffusion rate, and improved etching resistance.

  一种正性光阻组合物，包括一种基础树脂，其具有羧基，其氢被取代为一个蒽环结构的酸不稳定基团。该组合物在曝光前后表现出高对比度的碱溶解速率、高分辨率、良好的图案轮廓和曝光后最小的LER，具有抑制酸扩散速率的显著效果，以及改善的蚀刻抗性。
• AMPUTCH, MARY A.;LITTLE, R. DANIEL, TETRAHEDRON, 47,(1991) N, C. 383-402
  作者：AMPUTCH, MARY A.、LITTLE, R. DANIEL

  DOI：——

  日期：——
• US7449277B2
  申请人：——

  公开号：US7449277B2

  公开（公告）日：2008-11-11