Near-IR Two Photon Microscopy Imaging of Silica Nanoparticles Functionalized with Isolated Sensitized Yb(III) Centers
作者:Giuseppe Lapadula、Adrien Bourdolle、Florian Allouche、Matthew P. Conley、Iker del Rosal、Laurent Maron、Wayne W. Lukens、Yannick Guyot、Chantal Andraud、Sophie Brasselet、Christophe Copéret、Olivier Maury、Richard A. Andersen
DOI:10.1021/cm404140q
日期:2014.1.28
nanoparticles. The surface complexes ([DEAS·[email protected]2], Ln = Y, Yb) were characterized using IR, solid-state NMR, UV-vis, and EXAFS spectroscopies in combination with the preparation and characterization of similar molecular analogues by analytical techniques (IR, solution NMR, UV–vis, X-ray crystallography) as well as DFT calculations. Starting from the partial dehydroxylation of the silica at 700
通过注入约31.4毫安,制备了最大截面为41.4×10 3 GM的近红外发射的明亮纳米物体(Goppert Mayer)。在12纳米二氧化硅纳米粒子的表面上有180个4,4'-二乙基氨基苯乙烯基-2,2'-联吡啶(DEAS)Yb(III)络合物。使用红外光谱,固态核磁共振,紫外可见和EXAFS光谱技术结合分析制备和表征相似的分子类似物,对表面配合物([DEAS·[受电子邮件保护] 2 ],Ln = Y,Yb)进行了表征。技术(IR,溶液NMR,UV-vis,X射线晶体学)以及DFT计算。从在0.8 OH·nm -2的高真空下于700°C的二氧化硅部分脱羟基开始,Ln(N(SiMe 3)2)3生成≡SiO–Ln(N(SiMe 3)2)2,在加热步骤和DEAS发色团的配位作用下,生成(≡SiO)3 Ln(DEAS)。表面和分子类似物在固态下就DEAS结合常数,吸收最大值和发光特性(分配给配体为