5,5-Dimethyl-4-methylideneoxolan-2-one | 132994-88-8

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 内酯类
• 英文名称: 5,5-Dimethyl-4-methylideneoxolan-2-one
• CAS: 132994-88-8
• 化学式: C₇H₁₀O₂
• 分子量: 126.155
• InChiKey: NRBOHRLGLQZLLG-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  0.6
• 重原子数：
  9
• 可旋转键数：
  0
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.57
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为产物：
  描述：

  2-methylbut-3-yn-2-yl 2-bromoacetate 、 丙醇 以9%的产率得到
  参考文献：
  名称：

  KOLT, R. J.;GRILLER, D.;WAYNER, D. D. M., TETRAHEDRON LETT, 31,(1990) N2, C. 7539-7540

  摘要：

  DOI：

文献信息

• Fluorine-Containing Compound, Fluorine-Containing Polymer, Negative-Type Resist Composition, and Patterning Process Using Same
  申请人：ISONO Yoshimi

  公开号：US20120226070A1

  公开（公告）日：2012-09-06

  A fluorine-containing unsaturated carboxylic acid represented by formula (1), wherein R 1 represents a polymerizable double-bond containing group, R 3 represents a fluorine atom or fluorine-containing alkyl group, and W represents a bivalent linking group. This compound can provide a fluorine-containing polymer compound that has a weight-average molecular weight of 1,000-1,000,000 and contains a repeating unit represented by formula (2), wherein R 3 and W are defined as above, each of R 4 , R 5 and R 6 independently represents a hydrogen atom, fluorine atom or monovalent organic group, at least two of R 4 , R 5 and R 6 may be combined to form a ring. This polymer compound can provide a chemically amplified resist composition that is transparent to KrF or ArF excimer laser light and has a high resolution and is capable of forming a pattern having a rectangular section with no swelling.

  化学式（1）所表示的含氟不饱和羧酸，其中R1代表可聚合的双键含基团，R3代表氟原子或含氟烷基团，W代表二价连接基团。该化合物可提供一种分子量为1,000-1,000,000且含有化学式（2）所表示的重复单元的含氟聚合物化合物，其中R3和W如上所定义，R4、R5和R6中的每一个独立地代表氢原子、氟原子或一价有机基团，R4、R5和R6中至少有两个可以结合形成环。该聚合物化合物可提供一种化学增强型光刻胶组合物，该组合物对KrF或ArF准分子激光光线透明，具有高分辨率，并能够形成具有矩形截面且无膨胀的图案。
• Positive-Type Resist Composition
  申请人：ISONO Yoshimi

  公开号：US20090061353A1

  公开（公告）日：2009-03-05

  Disclosed is a fluorine-containing polymer compound containing first and second repeating units respectively represented by formulas (a-1) and (a-2), wherein R 3 represents a fluorine atom or fluorine-containing alkyl group, each of W and W 1 independently represents a bivalent linking group, R 2 represents an acid-labile protecting group, each of R 4 , R 5 and R 6 independently represents a hydrogen atom, fluorine atom or monovalent organic group, and at least two of R 4 , R 5 , R 6 and W or W 1 may be combined to form a cyclic structure in formula (a-1) or (a-2). This polymer compound has a weight-average molecular weight of 1,000 to 1,000,000 and can provide a resist composition capable of forming a pattern with no swelling and no pattern falling down.

  本发明涉及一种含氟聚合物化合物，其中包含第一和第二重复单元，分别由式（a-1）和（a-2）表示，其中R3表示氟原子或含氟烷基，W和W1各自表示双价连接基团，R2表示酸敏保护基团，R4、R5和R6各自表示氢原子、氟原子或单价有机基团，且式（a-1）或（a-2）中至少两个R4、R5、R6和W或W1可组成环状结构。该聚合物化合物具有1,000至1,000,000的重均分子量，并可提供一种抗膨胀和无图案脱落的光刻胶组合物。
• Fluorine-Containing Sulfonates Having Polymerizable Anions and Manufacturing Method Therefor, Fluorine-Containing Resins, Resist Compositions, and Pattern-Forming Method Using Same
  申请人：Masubuchi Takashi

  公开号：US20110177453A1

  公开（公告）日：2011-07-21

  According to the present invention, there is provided a polymerizable fluorine-containing sulfonic acid onium salt of the following general formula (2) and a resin obtained by polymerization thereof. It is possible by the use of this sulfonate resin of the present invention to provide a resist composition with high resolution, board depth of focus tolerance (DOF), small line edge roughness (LER) and high sensitivity. In the formula, Z represents a substituted or unsubstituted C 1 -C 6 straight or branched alkylene group, or a divalent moiety in which substituted or unsubstituted C 1 -C 6 straight or branched alkylene groups are bonded in series to a divalent group obtained by elimination of two hydrogen atoms from an alicyclic or aromatic hydrocarbon; R represents a hydrogen atom, a halogen atom, or a C 1 -C 3 alkyl or fluorine-containing alkyl group; and Q + represents a sulfonium cation or an iodonium cation.

  根据本发明，提供了一种可聚合的含氟磺酸盐聚合物，其化学式为(2)，以及通过其聚合获得的树脂。使用本发明的磺酸盐树脂，可以提供具有高分辨率、深度焦点容忍度(DOF)、小线边粗糙度(LER)和高灵敏度的抗蚀剂组合物。在该公式中，Z表示取代或未取代的C1-C6直链或支链烷基，或者是由环烷烃或芳香族碳氢化合物中消除两个氢原子而得到的取代或未取代的C1-C6直链或支链烷基序列键合到二价基团中的一个二价基团；R表示氢原子、卤素原子或C1-C3烷基或含氟烷基；Q+表示磺酸盐阳离子或碘酸盐阳离子。
• Unsaturated spiro-γ-lactone formation by the dissociative reduction of bromoacetates
  作者：R.J. Kolt、D. Griller、D.D.M. Wayner

  DOI：10.1016/s0040-4039(00)97292-7

  日期：1990.1

  Unsaturated spiro-gamma-butyrolactones can be prepared in good yields from bromoacetate precursors by a simple route that requires only 2-propanol as solvent and free radical initiation.
• KOLT, R. J.;GRILLER, D.;WAYNER, D. D. M., TETRAHEDRON LETT, 31,(1990) N2, C. 7539-7540
  作者：KOLT, R. J.、GRILLER, D.、WAYNER, D. D. M.

  DOI：——

  日期：——