The invention provides compounds of formula (I): Said compounds being inhibitors of Kv3 channels and of use in the prophylaxis or treatment of related disorders.
Photoresist underlayer film-forming composition and pattern forming process
申请人:Shin-Etsu Chemical Co., Ltd.
公开号:EP2813891A2
公开(公告)日:2014-12-17
In lithography, a composition comprising a novolak resin comprising recurring units of hydroxycoumarin is used to form a photoresist underlayer film. The underlayer film is strippable in alkaline water, without causing damage to ion-implanted Si substrates or SiO2 substrates.
Neue Sulfonsäureester von Hydroxycumarinen, ihre Herstellung und sie enthaltende Arzneimittel
申请人:BASF Aktiengesellschaft
公开号:EP0111746B1
公开(公告)日:1987-09-16
UNDERLAYER FILM-FORMING COMPOSITION AND PATTERN FORMING PROCESS
申请人:SHIN-ETSU CHEMICAL CO., LTD.
公开号:US20140363956A1
公开(公告)日:2014-12-11
In lithography, a composition comprising a novolak resin comprising recurring units of hydroxycoumarin is used to form a photoresist underlayer film. The underlayer film is strippable in alkaline water, without causing damage to ion-implanted Si substrates or SiO
2
substrates.