3-Hydroxymethyl-bicyclo<2.2.2>octan-carbonsaeure-(2)-lacton | 6715-19-1

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 内酯类
• 英文名称: 3-Hydroxymethyl-bicyclo<2.2.2>octan-carbonsaeure-(2)-lacton
• 英文别名: hexahydro-4,7-ethano-isobenzofuran-1-one；4-Oxatricyclo[5.2.2.02,6]undecan-3-one
• CAS: 6715-19-1
• 化学式: C₁₀H₁₄O₂
• 分子量: 166.22
• InChiKey: NGFXZUKRVDEVFI-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.3
• 重原子数：
  12
• 可旋转键数：
  0
• 环数：
  4.0
• sp3杂化的碳原子比例：
  0.9
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  2

文献信息

• Fluorine-Containing Sulfonic Acid Salt, Fluorine-Containing Sulfonic Acid Salt Resin, Resist Composition, and Pattern Forming Method Using Same
  申请人：Central Glass Company, Limited

  公开号：US20150198879A1

  公开（公告）日：2015-07-16

  Disclosed is a fluorine-containing sulfonic acid salt resin having a repeating unit represented by the following general formula (3). In the formula, each A independently represents a hydrogen atom, a fluorine atom or a trifluoromethyl group, and n represents an integer of 1-10. W represents a bivalent linking group, R 01 represents a hydrogen atom or a monovalent organic group, and M + represents a monovalent cation. A resist composition containing this resin is further superior in sensitivity, resolution and reproducibility of mask pattern and is capable of forming a pattern with a low LER.

  本公开了一种含氟磺酸盐树脂，其具有以下通用式（3）所代表的重复单元。在该式中，每个A独立地表示氢原子、氟原子或三氟甲基基团，n表示1-10的整数。W表示二价连接基团，R01表示氢原子或一价有机基团，M+表示一价阳离子。含有该树脂的抗蚀组合物在感光性、分辨率和掩膜图案的重现性方面更加优越，并且能够形成具有较低LER的图案。
• ACID-DEGRADABLE RESIN COMPOSITIONS CONTAINING KETENE-ALDEHYDE COPOLYMER
  申请人：NIPPON SODA CO., LTD.

  公开号：EP1482361B1

  公开（公告）日：2007-10-03
• Resin containing ketene-aldehyde copolymer
  申请人：NIPPON SODA CO., LTD.

  公开号：EP1720063B1

  公开（公告）日：2010-04-07
• Positive resist compositions and patterning process
  申请人：Hatakeyama Jun

  公开号：US20070072115A1

  公开（公告）日：2007-03-29

  A polymer is obtained from (meth)acrylate having a bridged ring lactone group, (meth)acrylate having an acid-labile leaving group, and (meth)acrylate having a hydroxynaphthyl pendant. A positive resist composition comprising the polymer as a base resin, when exposed to high-energy radiation and developed, exhibits a high sensitivity, a high resolution, and a minimal line edge roughness due to controlled swell during development, and leaves minimal residues following development.
• RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER, AND RESIST PATTERN-FORMING METHOD
  申请人：JSR CORPORATION

  公开号：US20130203000A1

  公开（公告）日：2013-08-08

  A radiation-sensitive resin composition includes a polymer component, a radiation-sensitive acid generating agent, and a nitrogen-containing compound having a ring structure. The polymer component includes, in an identical polymer or different polymers, a first structural unit represented by a formula (1) and a second structural unit represented by a formula (2). R 1 represents a hydrogen atom or a methyl group. Z is a group which represents a divalent monocyclic alicyclic hydrocarbon group taken together with R 2 . R 2 represents a carbon atom. R 3 represents a methyl group or an ethyl group. R 4 represents a hydrogen atom or a methyl group. X is a group which represents a divalent bridged alicyclic hydrocarbon group having no less than 10 carbon atoms taken together with R 5 . R 5 represents a carbon atom. R 6 represents a branched alkyl group having 3 or 4 carbon atoms.