dihydro-3,4,4-trimethyl-2(3H)-furanone | 1679-56-7

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 内酯类
• 英文名称: dihydro-3,4,4-trimethyl-2(3H)-furanone
• 英文别名: α,β,β-Trimethyl-γ-butyrolacton；3,4,4-trimethyloxolan-2-one
• CAS: 1679-56-7
• 化学式: C₇H₁₂O₂
• 分子量: 128.171
• InChiKey: REYDLGVIKHOSMB-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.6
• 重原子数：
  9
• 可旋转键数：
  0
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.86
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为产物：
  描述：

  1,2,2-Trimethyl-3-trimethylsilanyloxy-cyclopropanecarboxylic acid methyl ester 在 钾硼氢 作用下， 以 甲醇 为溶剂， 反应 17.0h， 以89%的产率得到dihydro-3,4,4-trimethyl-2(3H)-furanone
  参考文献：
  名称：

  2-Siloxy-substituted methyl cyclopropanecarboxylates as building blocks in synthesis: efficient one-pot conversion to .gamma.-butyrolactones

  摘要：

  DOI：

  10.1021/jo00202a017

文献信息

• Salt suitable for an acid generator and a chemically amplified resist composition containing the same
  申请人：Harada Yukako

  公开号：US20070078269A1

  公开（公告）日：2007-04-05

  The present invention provides a salt of the formula (I): wherein ring Y represents monocyclic or polycyclic hydrocarbon group having 3 to 30 carbon atoms, in which one —CH 2 — group is substituted with —COO— group, and at least one hydrogen atom in the monocyclic or polycyclic hydrocarbon group may optionally be substituted with alkyl group having 1 to 6 carbon atom, alkoxy group having 1 to 6 carbon atom, perfluoroalkyl group having 1 to 4 carbon atoms, hydroxyalkyl group having 1 to 6 carbon atoms, hydroxyl group or cyano group; Q 1 and Q 2 each independently represent fluorine atom or perfluoroalkyl group having 1 to 6 carbon atoms; A + represents organic counter ion; and n shows an integer of 0 to 12. The present invention also provides a chemically amplified resist composition comprising the salt of the formula (I).

  本发明提供了一种具有公式(I)的盐： 其中环Y代表具有3至30个碳原子的单环或多元环烃基团，其中一个—CH2—基团被—COO—基团取代，并且单环或多元环烃基团中的至少一个氢原子可以可选地被具有1至6个碳原子的烷基取代，具有1至6个碳原子的烷氧基，具有1至4个碳原子的全氟烷基，具有1至6个碳原子的羟基烷基，羟基或腈基；Q1和Q2各自独立地代表氟原子或具有1至6个碳原子的全氟烷基；A+代表有机反离子；n表示0至12的整数。 本发明还提供了一种含有公式(I)盐的化学放大抗蚀剂组合物。
• NOVEL ROCK INHIBITORS
  申请人：Leysen Dirk

  公开号：US20140057942A1

  公开（公告）日：2014-02-27

  The present invention relates to new kinase inhibitors of Formula (I), wherein X is oxygen, —NH—, or a direct bond; Y is —NH— or a direct bond; n is an integer from 0 to 4; m is an integer from 0 to 4; Cy represents a bivalent radical consisting of a satured (poly)cycle, including fused, bi-, spiro or bridged carbocycles and heterocycles; in particular selected from the group consisting of: Formula (II), Ar is selected from the group comprising: Formula (III), R 2 is hydrogen or methyl; R 8 is hydrogen, methyl, halogen, or alkynyl; R 1 is an aryl or heteroaryl more specifically ROCK inhibitors, compositions, in particular pharmaceuticals, comprising such inhibitors, and to uses of such inhibitors in the treatment and prophylaxis of disease. In particular, the present invention relates to new ROCK inhibitors, compositions, in particular pharmaceuticals, comprising such inhibitors, and to uses of such inhibitors in the treatment and prophylaxis of disease. In addition, the invention relates to methods of treatment and use of said compounds in the manufacture of a medicament for the application to a number of therapeutic indications including sexual dysfunction, inflammatory diseases, ophthalmic diseases and Respiratory diseases.

  本发明涉及新型激酶抑制剂，其化学式为(I)，其中X是氧、—NH—或直接键；Y是—NH—或直接键；n是从0到4的整数；m是从0到4的整数；Cy代表由饱和（多）环组成的二价基团，包括融合的、双的、螺环或桥接的碳环和杂环；特别是从以下组中选择：化学式（II），Ar是从包括化学式（III）的组中选择；R2是氢或甲基；R8是氢、甲基、卤素或炔基；R1是芳基或杂芳基，更具体地是ROCK抑制剂，包含此类抑制剂的组合物，特别是药品，以及此类抑制剂在治疗和预防疾病中的用途。特别是，本发明涉及新型ROCK抑制剂，包含此类抑制剂的组合物，特别是药品，以及此类抑制剂在治疗和预防疾病中的用途。此外，本发明还涉及治疗方法以及使用所述化合物在制造药品中的应用，用于治疗包括性功能障碍、炎症性疾病、眼科疾病和呼吸系统疾病等多种治疗适应症。
• RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ACID GENERATOR AND COMPOUND
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US20170176855A1

  公开（公告）日：2017-06-22

  A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, and which includes a base component (A) which exhibits changed solubility in a developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including a compound (B1) represented by general formula (b1) shown below (in general formula (b1), R b1 represents a bridged alicyclic group having 7 to 30 carbon atoms and containing a polar group; Y b1 represents a linear hydrocarbon group of 9 or more carbon atoms which may have a substituent excluding at least one member selected from the group consisting of an aromatic hydrocarbon group and a vinyl group; V b1 represents a fluorinated alkylene group; m represents an integer of 1 or more; and M m+ represents an organic cation having a valency of m). R b1 —Y b1 —V b1 —SO 3 − (M m+ ) 1/m (b1)

  一种抗蚀组合物，在暴露后产生酸，并在酸的作用下在显影溶液中表现出改变的溶解度，包括在酸的作用下在显影溶液中表现出改变的溶解度的基组分（A）和在暴露后产生酸的酸生成组分（B），其中酸生成组分（B）包括下面所示的一般式（b1）表示的化合物（B1）（在一般式（b1）中，Rb1代表具有7至30个碳原子并含有极性基团的桥环脂环基团；Yb1代表具有9个或更多碳原子的线性烃基团，可能具有一个取代基，但不包括由芳香烃基团和乙烯基组成的至少一种成员；Vb1代表氟代烷基烯基团；m表示1或更多的整数；Mm+代表价数为m的有机阳离子）。Rb1—Yb1—Vb1—SO3−(Mm+)1/m（b1）
• RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND COMPOUND
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US20200174365A1

  公开（公告）日：2020-06-04

  A resist composition containing a base material component of which solubility in a developing solution is changed due to an action of an acid and a compound represented by Formula (bd1); in the formula, R bd1 to R bd3 each independently represent an aryl group which may have a substituent, provided that one or more of R bd1 to R bd3 are aryl groups having a fluorinated alkyl group which may have a substituent, and at least one of the fluorinated alkyl groups which may have a substituent in these aryl groups is bonded to a carbon atom adjacent to a carbon atom that is bonded to a sulfur atom in the formula, and a total number of the fluorinated alkyl groups which may have a substituent is 2 or more; X − represents a counter anion.

  一种抗蚀组合物，含有基础材料组分，其在显影溶液中的溶解性由酸的作用和由化合物代表的公式（bd1）改变；在公式中，Rbd1到Rbd3各自独立地代表可能具有取代基的芳基，前提是Rbd1到Rbd3中的一个或多个是可能具有取代基的芳基，而这些芳基中至少有一个可能具有取代基的氟代烷基与公式中与硫原子相结合的碳原子相邻的碳原子结合，可能具有取代基的氟代烷基的总数为2或更多；X−代表一个对离子。
• Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same
  申请人：Harada Yukako

  公开号：US20080081293A1

  公开（公告）日：2008-04-03

  The present invention provides a salt represented by the formula (I): wherein P 1 , P 2 and P 3 each independently represent a C1-C30 alkyl group which may be substituted with at least one selected from a hydroxyl group, a C3-C12 cyclic hydrocarbon group and a C1-C12 alkoxy group, or a C3-C30 cyclic hydrocarbon group which may be substituted with at least one selected from a hydroxyl group and a C1-C12 alkoxy group, provided that all of P 1 , P 2 and P 3 are not simultaneously phenyl groups which may be substituted, Q 1 and Q 2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, and R represents a group represented by the formula: wherein A 1 represents —OH or —Y 1 —OH, n represents an integer of 1 to 9, and Y 1 represents a divalent C1-C6 saturated aliphatic hydrocarbon group; a group represented by the formula: wherein ring X 1 represents a C3-C30 monocyclic or polycyclic hydrocarbon group in which one —CH 2 — group is substituted with —CO—, and at least one hydrogen atom in the monocyclic or polycyclic hydrocarbon group may be substituted with a C1-C6 alkyl group, a C1-C6 alkoxy group, a C1-C4 perfluoroalkyl group, a C1-C6 hydroxyalkyl group, a hydroxyl group or a cyano group; a group represented by the formula: wherein ring X 2 represents a C3-C30 monocyclic or polycyclic hydrocarbon group in which a hydrogen atom of one —CH 2 — group is substituted with a hydroxyl group, and at least one hydrogen atom in the monocyclic or polycyclic hydrocarbon group may be substituted with a C1-C6 alkyl group, a C1-C6 alkoxy group, a C1-C4 perfluoroalkyl group, a C1-C6 hydroxyalkyl group, a hydroxyl group or a cyano group; a group represented by the formula: wherein ring X 3 represents a C3-C30 monocyclic or polycyclic hydrocarbon group in which one —CH 2 — group is substituted with —COO—, and at least one hydrogen atom in the monocyclic or polycyclic hydrocarbon group may be substituted with a C1-C6 alkyl group, a C1-C6 alkoxy group, a C1-C4 perfluoroalkyl group, a C1-C6 hydroxyalkyl group, a hydroxyl group or a cyano group, and m represents an integer of 0 to 12; or a group represented by the formula: wherein ring X 4 represents a C6-C30 polycyclic hydrocarbon group having tricycle or more, and at least one hydrogen atom in the polycyclic hydrocarbon group may be substituted with a C1-C6 alkyl group, a C1-C6 alkoxy group, a C1-C4 perfluoroalkyl group, a C1-C6 hydroxyalkyl group or a cyano group, and l represents an integer of 1 to 12. The present invention further provides a chemically amplified resist composition comprising the salt represented by the above-mentioned formula (I).

  本发明提供了一种盐，其表示为公式（I）：其中P1、P2和P3各自独立地表示一个C1-C30烷基基团，该基团可以被至少一个羟基、一个C3-C12环烃基团和一个C1-C12烷氧基中的至少一个取代，或者一个C3-C30环烃基团，该基团可以被至少一个羟基和一个C1-C12烷氧基中的至少一个取代，前提是P1、P2和P3均不同时为可以被取代的苯基；Q1和Q2各自独立地表示氟原子或者C1-C6全氟烷基基团，R表示由以下公式表示的一个基团：其中A1表示—OH或—Y1—OH，n表示1到9之间的整数，Y1表示二价的C1-C6饱和脂肪族碳氢基团；一个由以下公式表示的基团：其中环X1表示一个C3-C30的单环或多环碳氢基团，其中一个—CH2—基团被—CO—取代，并且单环或多环碳氢基团中的至少一个氢原子可以被C1-C6烷基基团、C1-C6烷氧基、C1-C4全氟烷基基团、C1-C6羟基烷基基团、羟基或氰基取代；一个由以下公式表示的基团：其中环X2表示一个C3-C30的单环或多环碳氢基团，其中一个—CH2—基团的氢原子被羟基取代，并且单环或多环碳氢基团中的至少一个氢原子可以被C1-C6烷基基团、C1-C6烷氧基、C1-C4全氟烷基基团、C1-C6羟基烷基基团、羟基或氰基取代；一个由以下公式表示的基团：其中环X3表示一个C3-C30的单环或多环碳氢基团，其中一个—CH2—基团被—COO—取代，并且单环或多环碳氢基团中的至少一个氢原子可以被C1-C6烷基基团、C1-C6烷氧基、C1-C4全氟烷基基团、C1-C6羟基烷基基团、羟基或氰基取代，m表示0到12之间的整数；或者一个由以下公式表示的基团：其中环X4表示一个具有三环或更多的C6-C30多环碳氢基团，多环碳氢基团中的至少一个氢原子可以被C1-C6烷基基团、C1-C6烷氧基、C1-C4全氟烷基基团、C1-C6羟基烷基基团或氰基取代，l表示1到12之间的整数。本发明还提供了一种化学增感抗蚀组合物，其包含上述公式（I）表示的盐。