4,4"-bis(trethoxysilyl)terphenyl | 123640-94-8

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: 4,4"-bis(trethoxysilyl)terphenyl
• 英文别名: 4,4'-bis(triethoxysilyl)terphenyl；(EtO)3Si-Tph-Si(EtO)3；4,4a(2)a(2)-Bis(triethoxysilyl)-1,1a(2):4a(2),1a(2)a(2)-terphenyl；triethoxy-[4-[4-(4-triethoxysilylphenyl)phenyl]phenyl]silane
• CAS: 123640-94-8
• 化学式: C₃₀H₄₂O₆Si₂
• 分子量: 554.831
• InChiKey: WKTQWQDJCIXXLX-UHFFFAOYSA-N

物化性质

• 沸点：
  547.1±43.0 °C(Predicted)
• 密度：
  1.08±0.1 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  5.53
• 重原子数：
  38
• 可旋转键数：
  16
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.4
• 拓扑面积：
  55.4
• 氢给体数：
  0
• 氢受体数：
  6

反应信息

• 作为反应物：
  描述：

  4,4"-bis(trethoxysilyl)terphenyl 在 盐酸 、 水 、 1,12-bis(octadecyldimethylammonium)dodecane dibromide 作用下， 反应 44.0h， 生成 对三联苯
  参考文献：
  名称：

  Theoretical Studies on Si−C Bond Cleavage in Organosilane Precursors during Polycondensation to Organosilica Hybrids

  摘要：

  Molecular orbital theory calculations were carried out to predict the occurrence of Si-C bond cleavage in various organosilane precursors during polycondensation to organosilica hybrids under acidic and basic conditions. On the basis of proposed mechanisms for cleavage of the Si-C bonds, the proton affinity (PA) of the carbon atom at the ipso-position and the PA of the carbanion generated after Si-C cleavage were chosen as indices for Si-C bond stability under acidic and basic conditions, respectively. The indices were calculated using a density functional theory (DFT) method for model compounds of organosilane precursors (R-Si(OH)(3)) having organic groups (R) of benzene (Ph), biphenyl (Bp), terphenyl (Tph), naphthalene (Nph), N-methylcarbazole (MCz), and anthracene (Ant). The orders for the predicted stability of the Si-C bond were Ph > Nph > Bp > Ant > Tph > MCz for acidic conditions and Ph > MCz > Bp > Nph > Tph > Ant for basic conditions. These behaviors were primarily in agreement with experimental results where cleavage of the Si-C bonds occurred for Tph (both acidic and basic), MCz (acidic), and Ant (basic). The Si-C bond cleavage of organosilane precursors during polycondensation is qualitatively predicted from these indices based on our theoretical approach.

  DOI：

  10.1021/jp101242g
• 作为产物：
  描述：

  三乙氧基氯硅烷 、 4,4''-二溴三联苯 在 叔丁基锂 作用下， 生成 4,4"-bis(trethoxysilyl)terphenyl
  参考文献：
  名称：

  芳基倍半硅氧烷凝胶和相关材料。有机和无机网络的新混合体

  摘要：

  已经合成了用于制备无定形有机-无机杂化网络材料的分子结构单元。双(三乙氧基甲硅烷基)芳基1-4和-乙炔基5单体的水解和缩合导致形成干凝胶形式的芳基-和乙炔基-桥接的聚倍半硅氧烷。凝胶是玻璃状材料，由直径在 50 到 80 纳米之间的均匀颗粒聚集体组成。原子力显微镜用于检查苯基桥联聚倍半硅氧烷的细粒聚集体特性

  DOI：

  10.1021/ja00043a014

文献信息

• Arylsilsesquioxane gels and related materials. New hybrids of organic and inorganic networks
  作者：K. J. Shea、D. A. Loy、O. Webster

  DOI：10.1021/ja00043a014

  日期：1992.8

  Molecular building blocks for the preparation of amorphous hybrid organic-inorganic network materials have been synthesized. Hydrolysis and condensation of bis(triethoxysilyl)aryl 1-4 and -ethynyl 5 monomers results in formation of aryl- and ethynyl-bridged polysilsequioxanes in the form of xerogels. The gels were glasslike materials composed of uniform aggregate of particles between 50 and 80 nm in

  已经合成了用于制备无定形有机-无机杂化网络材料的分子结构单元。双(三乙氧基甲硅烷基)芳基1-4和-乙炔基5单体的水解和缩合导致形成干凝胶形式的芳基-和乙炔基-桥接的聚倍半硅氧烷。凝胶是玻璃状材料，由直径在 50 到 80 纳米之间的均匀颗粒聚集体组成。原子力显微镜用于检查苯基桥联聚倍半硅氧烷的细粒聚集体特性
• Theoretical Studies on Si−C Bond Cleavage in Organosilane Precursors during Polycondensation to Organosilica Hybrids
  作者：Soichi Shirai、Yasutomo Goto、Norihiro Mizoshita、Masataka Ohashi、Takao Tani、Toyoshi Shimada、Shi-aki Hyodo、Shinji Inagaki

  DOI：10.1021/jp101242g

  日期：2010.5.20

  Molecular orbital theory calculations were carried out to predict the occurrence of Si-C bond cleavage in various organosilane precursors during polycondensation to organosilica hybrids under acidic and basic conditions. On the basis of proposed mechanisms for cleavage of the Si-C bonds, the proton affinity (PA) of the carbon atom at the ipso-position and the PA of the carbanion generated after Si-C cleavage were chosen as indices for Si-C bond stability under acidic and basic conditions, respectively. The indices were calculated using a density functional theory (DFT) method for model compounds of organosilane precursors (R-Si(OH)(3)) having organic groups (R) of benzene (Ph), biphenyl (Bp), terphenyl (Tph), naphthalene (Nph), N-methylcarbazole (MCz), and anthracene (Ant). The orders for the predicted stability of the Si-C bond were Ph > Nph > Bp > Ant > Tph > MCz for acidic conditions and Ph > MCz > Bp > Nph > Tph > Ant for basic conditions. These behaviors were primarily in agreement with experimental results where cleavage of the Si-C bonds occurred for Tph (both acidic and basic), MCz (acidic), and Ant (basic). The Si-C bond cleavage of organosilane precursors during polycondensation is qualitatively predicted from these indices based on our theoretical approach.