methacrylic acid 1-methoxyisobutyl ester | 487048-12-4

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: methacrylic acid 1-methoxyisobutyl ester
• 英文别名: 1-methoxy-2-methylpropyl methacrylate；methoxy-2-methylpropyl methacrylate；1-Methoxy-2-methylpropyl 2-methylprop-2-enoate；(1-methoxy-2-methylpropyl) 2-methylprop-2-enoate
• CAS: 487048-12-4
• 化学式: C₉H₁₆O₃
• 分子量: 172.224
• InChiKey: DUOYWYYFTMJWHO-UHFFFAOYSA-N

物化性质

• 沸点：
  196.5±23.0 °C(Predicted)
• 密度：
  0.943±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  2.4
• 重原子数：
  12
• 可旋转键数：
  5
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.67
• 拓扑面积：
  35.5
• 氢给体数：
  0
• 氢受体数：
  3

反应信息

• 作为产物：
  描述：

  甲基丙烯酸 、 1-methoxy-2-methylprop-1-ene 在 对甲苯磺酸 作用下， 反应 2.5h， 生成 methacrylic acid 1-methoxyisobutyl ester
  参考文献：
  名称：

  PROCESS FOR PRODUCING ETHER COMPOUND

  摘要：

  本发明提供了以下用于生产等的过程，该过程能够生产醚化合物，该化合物对于化学放大型抗蚀组合物、药物合成中间体、涂料等具有用途，且副反应较少且产率高。一种生产具有由通式（II）表示的基团的醚化合物的方法，其中R1、R2和R3可以相同也可以不同，并表示取代或未取代的烷基、取代或未取代的芳基或取代或未取代的芳基烷基，或者R1和R2与相邻碳原子一起形成环烷基，包括允许具有羟基（包括羧基）的化合物与由通式（I）表示的烯基醚发生反应，其中R1、R2和R3分别具有上述定义的相同含义。

  公开号：

  EP1415968A1

文献信息

• SULFONIUM SALT, RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20160090355A1

  公开（公告）日：2016-03-31

  A sulfonium salt of formula (0-1) is provided wherein W is alkylene or arylene, R 01 is a monovalent hydrocarbon group, m is 0, 1 or 2, k is an integer: 0≦k≦5+4m, R 101 , R 102 and R 103 are a monovalent hydrocarbon group, or at least two of R 101 , R 102 and R 103 may bond together to form a ring with the sulfur atom, and L is a single bond, ester, sulfonic acid ester, carbonate or carbamate bond. A resist composition comprising the sulfonium salt as PAG exhibits a very high resolution when processed by EB and EUV lithography. A pattern with minimal LER is obtainable.

  提供一种化学式为（0-1）的磺鎓盐，其中W是烷基或芳基，R01是一价碳氢基团，m为0、1或2，k为整数：0≦k≦5+4m，R101、R102和R103是一价碳氢基团，或者R101、R102和R103中至少两个可以相互结合形成与硫原子的环，L是单键、酯、磺酸酯、碳酸酯或氨基甲酸酯键。包含磺鎓盐作为PAG的抗蚀组成物在经过电子束或极紫外光刻过程时表现出非常高的分辨率。可获得具有最小LER的图案。
• SULFONIUM SALT, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION USING SAID POLYMER, AND RESIST PATTERNING PROCESS
  申请人：DOMON Daisuke

  公开号：US20120308920A1

  公开（公告）日：2012-12-06

  There is disclosed a sulfonium salt shown by the following general formula (1). There can be a sulfonium salt capable of introducing an acid-generating unit generating an acid having an appropriate acid strength and not impairing adhesion with a substrate into a base polymer; a polymer using the said sulfonium salt; a chemically amplified resist composition using the said polymer as a base polymer; and a patterning process using the said chemically amplified resist composition.

  公开了一种由以下一般式（1）所示的硫銨鹽。可以有一种硫銨鹽，能夠將一個能夠生成具有適當酸度並不損害與基材的粘附性的酸的酸生成單元引入到基聚合物中；使用所述硫銨鹽的聚合物；使用所述聚合物作為基聚合物的化學放大的抗蝕組成物；以及使用所述化學放大的抗蝕組成物的圖案形成過程。
• Process for producing ether compound
  申请人：Shimizu Ikuo

  公开号：US20060074262A1

  公开（公告）日：2006-04-06

  The present invention provides the following process for producing and the like, which enables the production of an ether compound, which is useful for chemical amplification type resist compositions, synthetic intermediates of pharmaceuticals, paints, or the like, with less side reaction and in high yield. A process for producing an ether compound having a group represented by the general formula (II) wherein R 1 , R 2 and R 3 may be the same or different, and represent substituted or unsubstituted alkyl, substituted or unsubstituted aryl or substituted or unsubstituted aralkyl, or R 1 and R 2 form cycloalkyl together with an adjacent carbon atom, which comprises allowing a compound having a hydroxyl group (including a carboxyl group) to react with an alkenyl ether represented by the general formula (I) wherein R 1 , R 2 and R 3 have the same significances as defined above respectively.

  本发明提供了以下用于生产等的过程，使得能够以较少的副反应和高收率生产对化学放大型抗蚀剂组合物、制药中间体、油漆或类似物有用的醚化合物。一种生产醚化合物的过程，该醚化合物具有由通式（II）表示的基团，其中R1、R2和R3可以相同或不同，并且分别表示取代或未取代的烷基、取代或未取代的芳基或取代或未取代的芳基烷基，或者R1和R2与相邻的碳原子一起形成环状烷基，该过程包括使具有羟基（包括羧基）的化合物与由通式（I）表示的烯基醚反应，其中R1、R2和R3分别具有上述定义的相同意义。
• Resist composition and patterning process
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：EP1378795A1

  公开（公告）日：2004-01-07

  Resist compositions comprising as the base resin a polymer using an alkoxyalkyl (meth)acrylate as a reactive group which is decomposable under the action of an acid to increase solubility in alkali have advantages including a practical level of shelf stability, a significantly enhanced contrast of alkali dissolution rate before and after exposure, a high sensitivity, and a high resolution over a wide baking temperature range. The compositions are best suited as a chemically amplified positive resist material for micropatterning in the manufacture of VLSI.

  抗蚀剂组合物的基体树脂是以烷氧基烷基（甲基）丙烯酸酯为活性基团的聚合物，这种聚合物在酸的作用下可分解，以增加在碱中的溶解度，其优点包括实用的货架稳定性、暴露前后碱溶解率的显著增强对比、高灵敏度以及在宽烘烤温度范围内的高分辨率。这些组合物最适合作为化学放大正抗蚀剂材料，用于制造超大规模集成电路的微图案化。
• COMPOSITION SENSITIVE TO VISIBLE LIGHT
  申请人：Kyowa Hakko Chemical Co., Ltd.

  公开号：EP1548498A1

  公开（公告）日：2005-06-29

  The present invention provides a visible light-sensitive composition which is highly sensitive to a visible light and is useful as an electronic circuit forming material, a lithographic printing material, etc., said visible light-sensitive composition comprising (a) a polymer comprising a repeating unit represented by general formula (I): wherein R1, R2, and R3 are the same or different and each represents substituted or unsubstituted alkyl, substituted or unsubstituted aryl, or substituted or unsubstituted aralkyl, or alternatively R1 and R2 form cycloalkyl together with the adjacent carbon atom, and R4 represents lower alkyl, (b) a compound that generates an acid by visible light irradiation and (c) a sensitizing dye.

  本发明提供了一种对可见光高度敏感并可用作电子电路形成材料、平版印刷材料等的可见光敏感组合物，所述可见光敏感组合物包括 (a) 由通式(I)代表的重复单元组成的聚合物： 其中 R1、R2 和 R3 相同或不同，各自代表取代或未取代的烷基、取代或未取代的芳基、取代或未取代的芳烷基，或者 R1 和 R2 与相邻碳原子一起形成环烷基，R4 代表低级烷基；(b) 通过可见光照射产生酸的化合物；(c) 感光染料。