The present invention relates to a method for modifying line edge roughness on a lithographically-produced feature in a material, the method comprising applying a block copolymer to an area on the feature having line edge roughness, the block copolymer comprising a charged hydrophilic polymer block and a non-charged hydrophilic polymer block.
本发明涉及一种用于修改材料中光刻制造特征的线边粗糙度的方法,该方法包括将嵌段共聚物应用于具有线边粗糙度的特征上的区域,所述嵌段共聚物包括带电的亲
水性聚合物块和非带电的亲
水性聚合物块。