Photosensitive composition, photosensitive lithography plate and method for producing lithography plate
申请人:Matsumura Toshiyuki
公开号:US20070020555A1
公开(公告)日:2007-01-25
Disclosed is a light sensitive composition containing a compound A having a group capable of undergoing radical polymerization, a compound B having a group capable of undergoing cationic polymerization, a photopolymerization initiator C, and a polymer binder D, the light sensitive composition being characterized in that the photopolymerization initiator C comprises an iron-arene complex and a halogenated alkyl group-containing compound.
US7285375B2
申请人:——
公开号:US7285375B2
公开(公告)日:2007-10-23
An improved procedure for the conversion of amines to alcohols at low temperature