2-Ethyl-5-hydroxyhexanoic acid lactone | 26828-95-5

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 内酯类
• 英文名称: 2-Ethyl-5-hydroxyhexanoic acid lactone
• 英文别名: 3-ethyl-6-methyl-tetrahydro-pyran-2-one；3-Aethyl-6-methyl-tetrahydro-pyran-2-on；3-Aethyl-6-methyl-2-oxo-tetrahydropyran；3-Ethyl-6-methyloxan-2-one
• CAS: 26828-95-5
• 化学式: C₈H₁₄O₂
• 分子量: 142.198
• InChiKey: SPQWEGVNMHZBEA-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.9
• 重原子数：
  10
• 可旋转键数：
  1
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.88
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为反应物：
  描述：

  2-Ethyl-5-hydroxyhexanoic acid lactone 生成 2-ethyl-5-hydroxy-hexanal cyclohemiacetal
  参考文献：
  名称：

  Colonge,J.; Guigues,F., Comptes Rendus des Seances de l'Academie des Sciences, Serie C: Sciences Chimiques, 1966, vol. 262, p. 426 - 427

  摘要：

  DOI：
• 作为产物：
  描述：

  5-cyano-2-heptanone 在 盐酸 、 钾硼氢 作用下， 以 乙醚 为溶剂， 生成 2-Ethyl-5-hydroxyhexanoic acid lactone
  参考文献：
  名称：

  Colonge,J.; Guigues,F., Bulletin de la Societe Chimique de France, 1967, p. 3881 - 3888

  摘要：

  DOI：

文献信息

• Manganese-Catalyzed Regioselective C–H Lactonization and Hydroxylation of Fatty Acids with H₂O₂
  作者：Vladimir I. Kurganskiy、Roman V. Ottenbacher、Mikhail V. Shashkov、Evgenii P. Talsi、Denis G. Samsonenko、Konstantin P. Bryliakov

  DOI：10.1021/acs.orglett.2c03458

  日期：2022.12.9

  selective C–H lactonization of fatty acids (C5–C16), catalyzed by manganese(II) complexes bearing bis-amino-bis-pyridine ligands. The catalyst system uses the environmentally benign hydrogen peroxide as oxidant and exhibits high efficiency (100–200 TON), providing under optimized conditions γ-lactones in 60–90% yields. Remarkably, by changing the reaction conditions, the oxidation of hexanoic acid can be

  在此，我们报道了由带有双氨基双吡啶配体的锰 (II) 配合物催化的脂肪酸 (C5–C16) 的直接选择性 C–H 内酯化。该催化剂系统使用对环境无害的过氧化氢作为氧化剂，具有高效率（100-200 TON），在优化条件下以 60-90% 的收率提供 γ-内酯。值得注意的是，通过改变反应条件，己酸的氧化可以转向形成 δ-己内酯，产率高达 67%。此外，已经证明了从线性 C7-C10 酸中以高达 48% 的产率获得 (ω-1)-羟基衍生物的可能性。
• Metabolism of 2-ethylhexanol administered orally and dermally to the female Fischer 344 rat
  作者：P. J. Deisinger、R. J. Boatman、D. Guest

  DOI：10.3109/00498259409043246

  日期：1994.1

  1. Excretion balance studies were conducted with 2-ethylhexanol (2-EH) in female Fischer 344 rats following single high (500 mg/kg) and low (50 mg/kg) oral doses of [C-14]2-EH, following repeated oral dosing with unlabelled 2-EH at the low level, following dermal exposure for 6 h with a 1 g/kg applied dose of [C-14]2-EH, and following a 1 mg/kg i.v. dose of [C-14]2-EH.2. The high, low and repeated low oral dose studies with 2-EH showed similar excretion balance profiles of [C-14], With some evidence of metabolic saturation at the high dose.3. No evidence of metabolic induction was seen following the repealed low oral dosing.4. All of the oral doses were eliminated rapidly, predominantly in the urine during the first 24 h following dosing.5. The dermal dosing resulted in only about 5% absorption of the 1 g/kg dose, with the major portion of the dose recovered unabsorbed from the dermal exposure cell at 6 h.6. Urinary metabolites eliminated following the oral and dermal doses were predominately glucuronides of oxidized metabolites of 2-EH, including glucuronides of 2-ethyladipic acid, 2-ethylhexanoic acid, 5-hydroxy-2-ethylhexanoic acid and 6-hydroxy-2-ethylhexanoic acid.
• Badoche, Annales de Chimie (Cachan, France), 1944, vol. <11> 19, p. 405,412
  作者：Badoche

  DOI：——

  日期：——
• ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
  申请人：FUJIFILM Corporation

  公开号：US20210055653A1

  公开（公告）日：2021-02-25

  Provided are an actinic ray-sensitive or radiation-sensitive resin composition containing a resin (A), in which the resin (A) includes a repeating unit having an acidic group and a repeating unit having an acid-decomposable group, a content of the repeating unit having an acidic group is 15% by mole or more with respect to all the repeating units in the resin (A), a content of the repeating unit having an acid-decomposable group is more than 20% by mole with respect to all the repeating units in the resin (A), a glass transition temperature of the resin (A) is 145° C. or lower, and the actinic ray-sensitive or radiation-sensitive resin composition is used for formation of a film having a film thickness of 2 μm or more; and a resist film, a pattern forming method, and a method for manufacturing an electronic device, each using the actinic ray-sensitive or radiation-sensitive resin composition.