WAFER WASHING METHOD, AND LIQUID CHEMICAL USED IN SAME
申请人:Central Glass Company, Limited
公开号:EP3340283A1
公开(公告)日:2018-06-27
[Object] To provide a water-repellent protective film-forming liquid chemical used in a process of cleaning a wafer by means of a cleaning machine whose liquid contact member contains a vinyl chloride resin.
[Solution] A liquid chemical is used, which includes: an alkoxysilane represented by the following general formula [1]; at least one kind selected from the group consisting of a sulfonic acid represented by the following general formula [2], an anhydride of the sulfonic acid, a salt of the sulfonic acid and a sulfonic acid derivative represented by the following general formula [3]; and a diluent solvent containing at least one kind selected from the group consisting of a hydrocarbon, an ether and a thiol.
(R1)aSi(H)b(OR2)4-a-b [1]
R3-S(=O)2OH [2]
R3-S(=O)2O-Si(H)3-c(R4)c [3]