Secondary Amides of (<i>R</i>)-3,3,3-Trifluoro-2-hydroxy-2-methylpropionic Acid as Inhibitors of Pyruvate Dehydrogenase Kinase
作者:Thomas D. Aicher、Robert C. Anderson、Jiaping Gao、Suraj S. Shetty、Gary M. Coppola、James L. Stanton、Douglas C. Knorr、Donald M. Sperbeck、Leonard J. Brand、Christine C. Vinluan、Emma L. Kaplan、Carol J. Dragland、Hollis C. Tomaselli、Amin Islam、Robert J. Lozito、Xilin Liu、Wieslawa M. Maniara、William S. Fillers、Dominick DelGrande、R. Eric Walter、William R. Mann
DOI:10.1021/jm990358+
日期:2000.1.1
6-tetrahydropyridine)thiourea, SDZ048-619 (1), is a modest inhibitor (IC(50) = 180 microM) of pyruvatedehydrogenasekinase (PDHK). In an optimization of the N-methylcarbothioamide moiety of 1, it was discovered that amides with a small acyl group, in particular appropriately substituted amides of (R)-3,3,3-trifluoro-2-hydroxy-2-methylpropionic acid, are inhibitors of PDHK. Utilizing this acyl moiety, herein is
The Discovery of Setileuton, a Potent and Selective 5-Lipoxygenase Inhibitor
作者:Yves Ducharme、Marc Blouin、Christine Brideau、Anne Châteauneuf、Yves Gareau、Erich L. Grimm、Hélène Juteau、Sébastien Laliberté、Bruce MacKay、Frédéric Massé、Marc Ouellet、Myriam Salem、Angela Styhler、Richard W. Friesen
DOI:10.1021/ml100029k
日期:2010.7.8
The discovery of novel and selectiveinhibitors of human 5-lipoxygenase (5-LO) is described. These compounds are potent, orally bioavailable, and active at inhibiting leukotriene biosynthesis in vivo in a dog PK/PD model. A major focus of the optimization process was to reduce affinity for the human ether-a-go-go gene potassium channel while preserving inhibitory potency on 5-LO. These efforts led
Amides having formula I: ##STR1## wherein E, X, R.sup.2 and R.sup.3 have the meanings given in the specification, and pharmaceutically acceptable salts and pharmaceutically acceptable in vivo hydrolysable esters thereof, which are useful in the treatment of urinary incontinence. Further provided are processes for preparing the amides and pharmaceutical compositions containing them.
NON-IONIC COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
申请人:SUMITOMO CHEMICAL COMPANY, LIMITED
公开号:US20160145186A1
公开(公告)日:2016-05-26
A compound which is non-ionic compound, the compound has a group represented by formula (Ia):
wherein R
2
represents a group having a C
3
to C
18
alicyclic hydrocarbon group where a methylene group may be replaced by an oxygen atom or a carbonyl group, Rf
1
and Rf
2
each independently represent a C
1
to C
4
perfluoroalkyl group, and * represents a binding site.
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION FOR ArF IMMERSION LITHOGRAPHY AND PATTERN FORMING PROCESS
申请人:Ohsawa Youichi
公开号:US20130034813A1
公开(公告)日:2013-02-07
A chemically amplified positive resist composition comprising (A) a sulfonium salt of 3,3,3-trifluoro-2-hydroxy-2-trifluoromethylpropionic acid, (B) an acid generator, (C) a base resin, and (D) an organic solvent is suited for ArF immersion lithography. The carboxylic acid sulfonium salt is highly hydrophobic and little leached out in immersion water. By virtue of controlled acid diffusion, a pattern profile with high resolution can be constructed.