申请人:Yamato Hitoshi
公开号:US20090042114A1
公开(公告)日:2009-02-12
Compounds of the formula I or II
wherein R
1
is C
1
-C
10
haloalkylsulfonyl, halobenzenesulfonyl, C
2
-C
10
haloalkanoyl, halobenzoyl; R
2
is halogen or C
1
-C
10
haloalkyl; Ar
1
is phenyl, biphenylyl, fluorenyl, naphthyl, anthracyl, phenanthryl, or heteroaryl, all of which are optionally substituted; Ar′
1
is for example phenylene, naphthylene, diphenylene, heteroarylene, oxydiphenylene, phenylene-D-D
1
-D-phenylene or —Ar″
1
-A
1
-Y
1
-A
1
-Ar″
1
—; wherein these radicals optionally are substituted; Ar″
1
is phenylene, naphthylene, anthracylene, phenanthrylene, or heteroarylene, all optionally substituted; A
1
is for example a direct bond, —O—, —S—, or —NR
6
—; Y
1
inter alia is C
1
-C
18
alkylene; X is halogen; D is for example —O—, —S— or —NR
6
—; D
1
inter alia is C
1
-C
18
alkylene; are particularly suitable as photolatent acids in ArF resist technology.