3,5-二庚基-1,2,4-噻唑-4-胺 | 59944-53-5

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 唑类
• 中文名称: 3,5-二庚基-1,2,4-噻唑-4-胺
• 中文别名: 4-氨基-3,5-二庚基-4H-1,2,4-三唑
• 英文名称: 3,5-Diheptyl-1,2,4-triazol-4-ylamine
• 英文别名: 3,5-diheptyl-1,2,4-triazol-4-amine
• CAS: 59944-53-5
• 化学式: C₁₆H₃₂N₄
• 分子量: 280.45
• InChiKey: HTAVZCVYBKYBBM-UHFFFAOYSA-N

物化性质

• 稳定性/保质期：

  避免接触氧化物

计算性质

• 辛醇/水分配系数(LogP)：
  5.9
• 重原子数：
  20
• 可旋转键数：
  12
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.88
• 拓扑面积：
  56.7
• 氢给体数：
  1
• 氢受体数：
  3

安全信息

• 海关编码：
  2933990090

文献信息

• Polishing composition and polishing method using the same
  申请人：FUJIMI INCORPORATED

  公开号：EP2348080A1

  公开（公告）日：2011-07-27

  A polishing composition of the present invention contains an oxidant, an anticorrosive, and a surfactant comprising a compound represented by Chemical Formula 1: One to three of R1 to R5 in Chemical Formula 1 are alkyl groups, alkynyl groups, alkenyl groups, aryl groups, or arylalkylene groups, one is a hydrogen atom or an alkyl group having 1 to 9 carbon atoms, and the remainder are hydrogen atoms. OR6 is oxyethylene, oxypropylene, or a random or block conjugate of oxyethylene and oxypropylene. n is an integer of 1 or more. X is an OSO3- group, an OPO32- group, or an OH group.

  本发明的抛光组合物含有氧化剂、防腐剂和表面活性剂，其中表面活性剂由化学式 1 所代表的化合物组成： 化学式 1 中 R1 至 R5 的一至三个是烷基、炔基、烯基、芳基或芳基亚烷基，一个是氢原子或具有 1 至 9 个碳原子的烷基，其余是氢原子。OR6 是氧乙烯、氧丙烯或氧乙烯和氧丙烯的无规或嵌段共轭物。X 是 OSO3- 基团、OPO32- 基团或 OH 基团。
• Polishing composition and polishing method
  申请人：FUJIMI INCORPORATED

  公开号：EP2374852A1

  公开（公告）日：2011-10-12

  A polishing composition contains a polishing accelerator, a water-soluble polymer including a constitutional unit originating from a polymerizable compound having a guanidine structure such as dicyandiamide, and an oxidant. The water-soluble polymer may be a water-soluble polymer including a constitutional unit originating from dicyandiamide and a constitutional unit originating from formaldehyde, a diamine or a polyamine.

  一种抛光组合物含有一种抛光促进剂、一种水溶性聚合物（包括源自具有胍结构（如双氰胺）的可聚合化合物的构型单元）和一种氧化剂。水溶性聚合物可以是一种水溶性聚合物，包括源自双氰胺的构型单元和源自甲醛、二胺或多胺的构型单元。
• POLISHING COMPOSITION AND POLISHING METHOD USING SAME, AND SUBSTRATE MANUFACTURING METHOD
  申请人：Fujimi Incorporated

  公开号：EP2779216A1

  公开（公告）日：2014-09-17

  Provided is a polishing composition to be used for polishing an object including a conductor layer and an electrically conductive material layer that is in contact with the conductor layer. In a state in which the positive electrode and the negative electrode of an electrometer are connected to the electrically conductive material layer and the conductor layer, respectively, in the polishing composition at ordinary temperature, the current flowing from the positive electrode to the negative electrode has a positive value or is zero when the electrically conductive material layer and the conductor layer are polished. The polishing composition preferably contains a nitrogen atom-containing compound, a sulfur atom-containing compound, or a phosphorus atom-containing compound as an additive to control the value of the current to positive or zero.

  本发明提供了一种用于抛光物体的抛光组合物，该物体包括导体层和与导体层接触的导电材料层。在常温下，在抛光组合物中，将电度表的正极和负极分别与导电材料层和导体层连接的状态下，当导电材料层和导体层被抛光时，从正极流向负极的电流为正值或为零。抛光组合物最好含有含氮原子化合物、含硫原子化合物或含磷原子化合物作为添加剂，以控制电流值为正值或零。
• POLISHING COMPOSITION
  申请人：Fujimi Incorporated

  公开号：EP3112436A1

  公开（公告）日：2017-01-04

  The present invention relates to a polishing composition used in application in which a polishing object having a cobalt element-containing layer is polished, including: a cobalt dissolution inhibitor; and a pH adjusting agent, wherein the polishing composition has a pH of 4 or more and 12 or less, and the cobalt dissolution inhibitor is at least one member selected from the group consisting of an organic compound having an ether bond, an organic compound having a hydroxyl group, an organic compound having a carboxyl group and having a molecular weight of 130 or more, and salts thereof. According to the present invention, there is provided a polishing composition capable of suppressing the dissolution of a cobalt element-containing layer when a polishing object having a cobalt element-containing layer is polished.

  本发明涉及一种用于抛光具有含钴元素层的抛光对象的抛光组合物，包括：钴溶解抑制剂；和pH值调节剂，其中抛光组合物的pH值为4或以上和12或以下，钴溶解抑制剂为至少一种选自以下组成的成员：具有醚键的有机化合物、具有羟基的有机化合物、具有羧基且分子量为130或以上的有机化合物及其盐类。根据本发明，提供了一种抛光组合物，能够在抛光具有含钴元素层的抛光对象时抑制含钴元素层的溶解。
• Polishing composition
  申请人：FUJIMI INCORPORATED

  公开号：US10059860B2

  公开（公告）日：2018-08-28

  The present invention relates to a polishing composition used in application in which a polishing object having a cobalt element-containing layer is polished, including: a cobalt dissolution inhibitor; and a pH adjusting agent, wherein the polishing composition has a pH of 4 or more and 12 or less, and the cobalt dissolution inhibitor is at least one member selected from the group consisting of an organic compound having an ether bond, an organic compound having a hydroxyl group, an organic compound having a carboxyl group and having a molecular weight of 130 or more, and salts thereof. According to the present invention, there is provided a polishing composition capable of suppressing the dissolution of a cobalt element-containing layer when a polishing object having a cobalt element-containing layer is polished.

  本发明涉及一种用于抛光具有含钴元素层的抛光对象的抛光组合物，包括：钴溶解抑制剂；和pH值调节剂，其中抛光组合物的pH值为4或以上和12或以下，钴溶解抑制剂为至少一种选自以下组成的成员：具有醚键的有机化合物、具有羟基的有机化合物、具有羧基且分子量为130或以上的有机化合物及其盐类。根据本发明，提供了一种抛光组合物，能够在抛光具有含钴元素层的抛光对象时抑制含钴元素层的溶解。