1-acryloyloxy-4-oxatricyclo[4.3.1.13,8]undecan-5-one | 265999-35-7

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 内酯类
• 英文名称: 1-acryloyloxy-4-oxatricyclo[4.3.1.13,8]undecan-5-one
• 英文别名: 1-acryloyloxy-4-oxatricyclo[4.3.1.13.8]undecan-5-one；(5-oxo-4-oxatricyclo[4.3.1.13,8]undecan-1-yl) prop-2-enoate
• CAS: 265999-35-7
• 化学式: C₁₃H₁₆O₄
• 分子量: 236.268
• InChiKey: LMQNBAKSHRRPKC-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.9
• 重原子数：
  17
• 可旋转键数：
  3
• 环数：
  4.0
• sp3杂化的碳原子比例：
  0.69
• 拓扑面积：
  52.6
• 氢给体数：
  0
• 氢受体数：
  4

反应信息

• 作为产物：
  描述：

  5-oxo-4-oxa-5-homoadamantane-1-ol 、 丙烯酰氯 在 三乙胺 作用下， 以 甲苯 为溶剂， 以50%的产率得到1-acryloyloxy-4-oxatricyclo[4.3.1.13,8]undecan-5-one
  参考文献：
  名称：

  4-oxatricyclo[4.3.1.1 3,8]undecan-5-one derivative and process for producing the same

  摘要：

  该化合物是一种新颖的4-氧代三环[4.3.1.1^3,8]十一烷-5-酮衍生物，其分子式如下（1）：其中R为氢原子或(meth)丙烯酰基，构成环的碳原子除了在公式中指示的取代基外，还可能有其他取代基。该化合物在1位具有一个羟基或(meth)丙烯酰氧基。

  公开号：

  US06486330B1

文献信息

• 4-Oxatricyclo(4.3.1.1-3,8)undecan-5-one derivatives and process for producing the same
  申请人：Daicel Chemical Industries, Ltd.

  公开号：EP1081150A1

  公开（公告）日：2001-03-07

  A 4-oxatricyclo[4.3.1.13,8]undecan-5-one derivative is shown by the following formula (1): wherein R is a hydrogen atom or a (meth)acryloyl group, and carbon atoms constituting a ring may have a substituent in addition to the substituents indicated in the formula. This compound is a novel 4-oxatricyclo[4.3.1.13,8]undecan-5-one derivative having a hydroxyl group or a (meth)acryloyloxy group at the 1-position.

  4-oxatricyclo[4.3.1.13,8]undecan-5-one 衍生物如下式（1）所示： 其中 R 是氢原子或（甲基）丙烯酰基，而构成环的碳原子除了具有式中所示的取代基外，还可以具有一个取代基。该化合物是一种新型 4-氧杂三环[4.3.1.13,8]十一烷-5-酮衍生物，在 1 位上具有羟基或（甲基）丙烯酰氧基。
• Process for the production of high-molecular compounds for photoresist
  申请人：Watanabe Hitoshi

  公开号：US20050100815A1

  公开（公告）日：2005-05-12

  The process for producing a photoresist polymeric compound of the present invention is characterized by a process for producing a photoresist polymeric compound having a repeated unit corresponding to at least one monomer selected from a monomer (a) having a lactone skeleton, a monomer (b) having a group which becomes soluble in alkali by elimination with an acid and a monomer (c) having an alicyclic skeleton having a hydroxyl group, wherein the process comprises the step of; (i) the polymerization step (A) polymerizing a mixture of monomers containing at least one monomer selected from the above monomers (a), (b) and (c), and the extraction step (B) of extracting a polymer formed in the polymerization by using an organic solvent and water to partition the formed polymer into an organic solvent layer and a metal component as an impurity into an aqueous layer, or (ii) the step (I) passing a polymer solution, which contains a polymer having a repeated unit corresponding to at least one of the above monomers (a), (b) and (c), and a metal content of which is 1000 ppb by weight or less relative to the polymer, through a filter comprising a porous polyolefin membrane having cation-exchange group. The method of the present invention can efficiently provide a photoresist polymeric compound having an impurity content such as metal of extremely low.

  本发明的光刻胶聚合化合物的生产工艺，其特征在于生产具有重复单元的光刻胶聚合化合物的工艺，该重复单元对应于至少一种单体，该单体选自具有内酯骨架的单体(a)、具有通过与酸消除而变得可溶于碱的基团的单体(b)和具有具有羟基的脂环族骨架的单体(c)，其中该工艺包括以下步骤；(i) 聚合步骤(A)聚合含有至少一种选自上述单体(a)、(b)和(c)的单体的混合物，提取步骤(B)使用有机溶剂和水提取聚合中形成的聚合物，将形成的聚合物分成有机溶剂层和作为杂质的金属组分的水层、或 (ii) 步骤(I)将聚合物溶液通过由具有阳离子交换基团的多孔聚烯烃膜组成的过滤器，该聚合物溶液含有与上述单体(a)、(b)和(c)中至少一种单体相对应的重复单元，且相对于聚合物的金属含量为 1000 ppb 或更少（按重量计）。本发明的方法可以有效地提供杂质（如金属）含量极低的光刻胶聚合物化合物。
• PROCESS FOR THE PRODUCTION OF HIGH-MOLECULAR COMPOUNDS FOR PHOTORESIST
  申请人：DAICEL CHEMICAL INDUSTRIES, LTD.

  公开号：EP1491560B1

  公开（公告）日：2007-11-21
• Process for producing photoresist polymeric compounds
  申请人：Watanabe Hitoshi

  公开号：US20060116493A1

  公开（公告）日：2006-06-01

  Process for producing photoresist polymeric compound having repeated units corresponding to at least one monomer selected from monomer (a) having lactone skeleton, monomer (b) having group which becomes soluble in alkali by elimination with acid, and monomer (c) having alicyclic skeleton having hydroxyl group. Process includes (A) polymerizing mixture of monomers containing at least one monomer selected from the above monomers (a), (b), and (c), and (B) extracting polymer formed in the polymerization by using organic solvent and water to partition the formed polymer into organic solvent layer and metal component impurity into aqueous layer, or passing polymer solution, which contains polymer having repeated units corresponding to at least one of the above monomers (a), (b), and (c) and metal content of which is 1000 ppb by weight or less relative to the polymer through filter comprising porous polyolefin membrane having cation-exchange group. The photoresist polymeric compounds have a metallic impurity content that is extremely low.
• PROCESS FOR PRODUCING PHOTORESIST POLYMERIC COMPOUNDS
  申请人：WATANABE Hitoshi

  公开号：US20080268377A1

  公开（公告）日：2008-10-30

  Process for producing photoresist polymeric compound having repeated units corresponding to at least one monomer selected from monomer (a) having lactone skeleton, monomer (b) having group which becomes soluble in alkali by elimination with acid, and monomer (c) having alicyclic skeleton having hydroxyl group. Process includes (A) polymerizing mixture of monomers containing at least one monomer selected from the above monomers (a), (b), and (c), and (B) extracting polymer formed in the polymerization by using organic solvent and water to partition the formed polymer into organic solvent layer and metal component impurity into aqueous layer, or passing polymer solution, which contains polymer having repeated units corresponding to at least one of the above monomers (a), (b), and (c) and metal content of which is 1000 ppb by weight or less relative to the polymer through filter comprising porous polyolefin membrane having cation-exchange group. The photoresist polymeric compounds have a metallic impurity content that is extremely low.