3-(2-氰基乙基-(2-羟基乙基)氨基)丙腈 | 6305-56-2

• 物质功能分类: 分析化学 - 标准品 - 药典标准品和杂质标准品
• 分子结构分类: 有机化合物 - 有机氮化合物
• 中文名称: 3-(2-氰基乙基-(2-羟基乙基)氨基)丙腈
• 英文名称: 3,3'-<(2-hydroxyethyl)imino>bispropionitrile
• 英文别名: N,N-bis(2-cyanoethyl)ethanolamine；N-Bis-<2-cyanethyl>ethanolamin；2--ethanol-(1)；3--ethanol；N-(2-cyanoethyl)-N-(2-hydroxyethyl)-3-aminopropiononitrile；3-[(2-cyano-ethyl)-(2-hydroxy-ethyl)-amino]-propionitrile；3-[2-Cyanoethyl(2-hydroxyethyl)amino]propanenitrile
• CAS: 6305-56-2
• 化学式: C₈H₁₃N₃O
• 分子量: 167.211
• InChiKey: KFCMMJDSUVSXAJ-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  -1
• 重原子数：
  12
• 可旋转键数：
  6
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.75
• 拓扑面积：
  71
• 氢给体数：
  1
• 氢受体数：
  4

安全信息

• 海关编码：
  2926909090

反应信息

• 作为反应物：
  描述：

  3-(2-氰基乙基-(2-羟基乙基)氨基)丙腈 在 盐酸 、 sodium hydroxide 、 氢气 、 镍 、 N,N-二异丙基乙胺 作用下， 以 四氢呋喃 、 甲醇 、 乙醇 、 水 为溶剂， 60.0 ℃ 、344.74 kPa 条件下， 反应 6.0h， 生成 1-(1-Adamantyl)-3-[3-[3-(1-adamantylcarbamoylamino)propyl-(2-hydroxyethyl)amino]propyl]urea
  参考文献：
  名称：

  Synthesis and Self-Assembly of Supramolecular Dendritic “Bow-Ties”:  Effect of Peripheral Functionality on Association Constants

  摘要：

  Self-assembled polyester dendritic bow-ties with various peripheral groups were prepared, and their association constants were measured by H-1 NMR in CDCl3. The two complementary dendrons were prepared by attachment of either a bis(adamantylurea) or a glycinylurea to the focal point of the dendron. The parent self-assembled system with benzylidene acetals on one periphery and isopropylidene acetals on the other had an association constant of 520 M-1. Upon deprotection of one dendron, the association constant is increased by more than an order of magnitude as the solubility of the hydroxyl-terminated dendron in CDCl3 is decreased. In contrast, attachment of tri(ethylene oxide) units to the periphery of one dendron lowers the association constant by almost an order of magnitude. The causes of these relatively large changes in complex strength are discussed in terms of solubility, steric effects, competitive hydrogen bonding, and the structure of the dendritic scaffold.

  DOI：

  10.1021/jo035329s
• 作为产物：
  描述：

  C.I.酸性橙108 、 丙烯腈 在 bismuth(lll) trifluoromethanesulfonate 作用下， 以 乙腈 为溶剂， 反应 1.33h， 以85%的产率得到3-(2-氰基乙基-(2-羟基乙基)氨基)丙腈
  参考文献：
  名称：

  Chemoselective Michael TypeAddition of Aliphatic Amines to α,β-Ethylenic CompoundsUsing Bismuth Triflate Catalyst

  摘要：

  三氟甲磺酸铋的催化量在温和条件下能高效催化脂肪胺与α,β-乙烯基化合物在乙腈中的迈克尔加成反应。该反应具有化学选择性，因为芳香胺不参与反应。此外，催化剂易于回收和重复使用。

  DOI：

  10.1055/s-2003-38345

文献信息

• Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process
  申请人：——

  公开号：US20040167322A1

  公开（公告）日：2004-08-26

  A chemical amplification type resist composition comprising a specific benzenesulfonyldiazomethane containing a long-chain alkoxyl group at the 2-position on benzene ring has many advantages including improved resolution, improved focus latitude, minimized line width variation or shape degradation even on long-term PED, minimized debris left after coating, development and peeling, and improved pattern profile after development and is thus suited for microfabrication.

  一种化学放大型抗蚀组合物，包括在苯环上的2-位含有长链烷氧基基团的特定苯磺酰二氮甲烷，具有许多优点，包括提高分辨率，改善焦点宽度，即使在长期PED上也减少线宽变化或形状退化，涂层、显影和剥离后减少残留物，并在显影后改善图案轮廓，因此适用于微加工。
• Convergent Synthesis of Polynitrile and/or Polyamine Dendrimers through Hydroaminomethylation and Michael Addition
  作者：Maryam Beigi、Stefan Ricken、Kai Sven Müller、Fikret Koç、Peter Eilbracht

  DOI：10.1002/ejoc.201001307

  日期：2011.3

  A general concept for a versatile convergent synthesis of polynitrile and/or polyamine dendrimers has been developed by applying Vogtle's procedure in combination with the tandem hydroformylation/reductive amination sequence, known as hydroaminomethylation. In this approach, first Vogtle's procedure is used to generate the desired dendron, which can then be attached to different types of polyfunctionalized

  通过将 Vogtle 程序与串联加氢甲酰化/还原胺化序列（称为加氢氨甲基化）相结合，开发了多腈和/或多胺树枝状聚合物的通用会聚合成的一般概念。在这种方法中，首先使用 Vogtle 的程序来生成所需的树突，然后将其连接到不同类型的多官能化核（例如，聚胺、多卤化物或聚烯烃核）以提供所需的球状结构。该方法可用作合成具有设计的壳和核特性的树枝状聚合物的一般程序，如所提供的实施例所示。
• Photoacid generators, chemically amplified resist compositions, and patterning process
  申请人：Ohsawa Youichi

  公开号：US20070292768A1

  公开（公告）日：2007-12-20

  A photoacid generator has formula (1). A chemically amplified resist composition comprising the photoacid generator has advantages including a high resolution, focus latitude, long-term PED dimensional stability, and a satisfactory pattern profile shape. When the photoacid generator is combined with a resin having acid labile groups other than those of the acetal type, resolution and top loss are improved. The composition is suited for deep UV lithography.

  一种光酸发生剂的化学式为（1）。包括该光酸发生剂的化学增感抗蚀组合物具有诸如高分辨率、焦点宽度、长期PED尺寸稳定性和令人满意的图案轮廓形状等优点。当该光酸发生剂与具有除了缩醛类型以外的酸敏感基团的树脂结合时，可以改善分辨率和顶部损失。该组合物适用于深紫外光刻。
• Resist composition and patterning process
  申请人：Watanabe Satoshi

  公开号：US20100009299A1

  公开（公告）日：2010-01-14

  The present invention relates to: a resist composition such as a chemically amplified resist composition for providing an excellent pattern profile even at a substrate-side boundary face of resist, in addition to a higher resolution in photolithography for micro-fabrication, and particularly in photolithography adopting, as an exposure source, KrF laser, ArF laser, F 2 laser, ultra-short ultraviolet light, electron beam, X-rays, or the like; and a patterning process utilizing the resist composition. The present invention provides a chemically amplified resist composition comprising one or more kinds of amine compounds or amine oxide compounds (except for those having a nitrogen atom of amine or amine oxide included in a ring structure of an aromatic ring) at least having a carboxyl group and having no hydrogen atoms covalently bonded to a nitrogen atom as a basic center.

  本发明涉及一种抗蚀组合物，例如用于在抗蚀物的基板侧边界面上提供优异图案轮廓的化学增感抗蚀组合物，除了在微细加工的光刻工艺中具有更高的分辨率外，特别是在采用KrF激光、ArF激光、F2激光、超短紫外光、电子束、X射线等作为曝光光源的光刻工艺中；以及利用该抗蚀组合物的图案化工艺。本发明提供一种化学增感抗蚀组合物，其包括一种或多种胺化合物或胺氧化合物（除了那些在芳香环的环结构中不含有胺或胺氧原子的氮原子的化合物），至少具有一个羧基，并且没有氢原子共价键结合到氮原子作为碱性中心。
• POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS
  申请人：NISHI Tsunehiro

  公开号：US20100062374A1

  公开（公告）日：2010-03-11

  A positive resist composition comprises (A) a resin component which becomes soluble in an alkaline developer under the action of an acid and (B) an acid generator. The resin (A) is a polymer comprising recurring units containing a non-leaving hydroxyl group represented by formula (1) wherein R 1 is H, methyl or trifluoromethyl, X is a single bond or methylene, m is 1 or 2, and the hydroxyl group attaches to a secondary carbon atom. The composition is improved in resolution when processed by lithography.

  一种正性光刻胶组合物包括（A）在酸的作用下在碱性显影剂中变得可溶的树脂组分和（B）酸发生剂。树脂（A）是一种聚合物，包含由式（1）表示的非离去羟基的重复单元，其中R1为H、甲基或三氟甲基，X为单键或亚甲基，m为1或2，并且羟基连接到次级碳原子。当通过光刻工艺处理时，该组合物在分辨率方面得到改善。