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potassium salt of (4-sulfo-3,3,4,4-tetrafluorobutyl 2-methyl-2-propenoate) | 1383986-49-9

中文名称
——
中文别名
——
英文名称
potassium salt of (4-sulfo-3,3,4,4-tetrafluorobutyl 2-methyl-2-propenoate)
英文别名
2-methyl-2-propenoic acid 4-sulfo-3,3,4,4-tetrafluorobutyl ester, potassium salt;Potassium 1,1,2,2-tetrafluoro-4-(methacryloyloxy)butane-1-sulfonate;potassium;1,1,2,2-tetrafluoro-4-(2-methylprop-2-enoyloxy)butane-1-sulfonate
potassium salt of (4-sulfo-3,3,4,4-tetrafluorobutyl 2-methyl-2-propenoate)化学式
CAS
1383986-49-9
化学式
C8H9F4O5S*K
mdl
——
分子量
332.314
InChiKey
AMLAIJACXRHXBG-UHFFFAOYSA-M
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    -1.73
  • 重原子数:
    19
  • 可旋转键数:
    7
  • 环数:
    0.0
  • sp3杂化的碳原子比例:
    0.62
  • 拓扑面积:
    91.9
  • 氢给体数:
    0
  • 氢受体数:
    9

反应信息

  • 作为反应物:
    描述:
    potassium salt of (4-sulfo-3,3,4,4-tetrafluorobutyl 2-methyl-2-propenoate)5-phenyl-5H-dibenzo[b,d]thiophenium bromide二氯甲烷 为溶剂, 生成 5-phenyldibenzothiophenium 1,1,2,2-tetrafluoro-4-(methacryloyloxy)butane-1-sulfonate
    参考文献:
    名称:
    METHOD OF PREPARING PHOTOACID GENERATING MONOMER
    摘要:
    一种制备单体的方法包括将公式(I)的磺酮与具有聚合基团的亲核试剂反应,其中每个R独立地为F、C1-10烷基、氟取代的C1-10烷基、C1-10环烷基或氟取代的C1-10环烷基,但至少一个R为F;n为0至10的整数,m为1至4+2n的整数。通过这种方法可以制备单体,包括光酸生成单体。
    公开号:
    US20120172619A1
  • 作为产物:
    描述:
    3,3,4,4-tetrafluoro-butane sultonepotassium methacrylate 在 potassium hydride 、 甲基丙烯酸对苯二酚 作用下, 以 四氢呋喃 为溶剂, 以78.8%的产率得到potassium salt of (4-sulfo-3,3,4,4-tetrafluorobutyl 2-methyl-2-propenoate)
    参考文献:
    名称:
    METHOD OF PREPARING PHOTOACID GENERATING MONOMER
    摘要:
    一种制备单体的方法包括将公式(I)的磺酮与具有聚合基团的亲核试剂反应,其中每个R独立地为F、C1-10烷基、氟取代的C1-10烷基、C1-10环烷基或氟取代的C1-10环烷基,但至少一个R为F;n为0至10的整数,m为1至4+2n的整数。通过这种方法可以制备单体,包括光酸生成单体。
    公开号:
    US20120172619A1
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文献信息

  • METHOD OF PREPARING PHOTOACID GENERATING MONOMER
    申请人:Coley Suzanne M.
    公开号:US20120172619A1
    公开(公告)日:2012-07-05
    A method of preparing a monomer comprises reacting a sultone of the formula (I): wherein each R is independently F, C 1-10 alkyl, fluoro-substituted C 1-10 alkyl, C 1-10 cycloalkyl, or fluoro-substituted C 1-10 cycloalkyl, provided that at least one R is F; n is an integer of from 0 to 10, and m is an integer of 1 to 4+2n, with a nucleophile having a polymerizable group. Monomers, including a photoacid-generating monomer, may be prepared by this method.
    一种制备单体的方法包括将公式(I)的磺酮与具有聚合基团的亲核试剂反应,其中每个R独立地为F、C1-10烷基、氟取代的C1-10烷基、C1-10环烷基或氟取代的C1-10环烷基,但至少一个R为F;n为0至10的整数,m为1至4+2n的整数。通过这种方法可以制备单体,包括光酸生成单体。
  • POLYMERIZABLE PHOTOACID GENERATORS
    申请人:Thackeray James W.
    公开号:US20120171616A1
    公开(公告)日:2012-07-05
    A compound has formula (I): Q-O-(A)-Z − G + (I) wherein Q is a halogenated or non-halogenated, C 2-30 olefin-containing group, A is a fluorine-substituted C 1-30 alkylene group, a fluorine-substituted C 3-30 cycloalkylene group, a fluorine-substituted C 6-30 arylene group, or a fluorine-substituted C 7-30 alkylene-arylene group, Z is an anionic group comprising sulfonate, sulfonamide, or sulfonamide, and G + has formula (II): wherein X is S or I, each R 0 is halogenated or non-halogenated and is independently C 1-30 alkyl group; a polycyclic or monocyclic C 3-30 cycloalkyl group; a polycyclic or monocyclic C 4-30 aryl group; or a combination of these, wherein when X is S, one of the R 0 groups is optionally attached to one adjacent R 0 group by a single bond, and a is 2 or 3, wherein when X is I, a is 2, or when X is S, a is 3. A copolymer, a photoresist, a coated substrate and method of patterning are disclosed.
    一种化合物的化学式为(I): Q-O-(A)-Z−G+(I),其中Q是卤代或非卤代的含有C2-30烯烃基团的基团,A是氟代的C1-30烷基烯基基团、氟代的C3-30环烷基烷基基团、氟代的C6-30芳基烷基基团或氟代的C7-30烷基芳基基团,Z是包括磺酸盐、磺酰胺或磺酰胺的阴离子基团,G+的化学式为(II):其中X为S或I,每个R0为卤代或非卤代且独立的C1-30烷基基团;多环或单环的C3-30环烷基基团;多环或单环的C4-30芳基基团;或这些的组合,其中当X为S时,其中一个R0基团可以通过单键连接到相邻的一个R0基团上,且a为2或3,当X为I时,a为2,当X为S时,a为3。还公开了共聚物、光阻、涂层基板和图案化方法。
  • Photoacid generating monomer and precursor thereof
    申请人:Coley Suzanne M.
    公开号:US08716518B2
    公开(公告)日:2014-05-06
    A monomer compound has the formula (I): where each R1, R2, and R3 is independently H, F, C1-10 alkyl, fluoro-substituted C1-10 alkyl, C1-10 cycloalkyl, or fluoro-substituted C1-10 cycloalkyl, provided that at least one of R1, R2, or R3 is F; n is an integer of from 1 to 10, A is a halogenated or non-halogenated C2-30 olefin-containing polymerizable group, and G+ is an organic or inorganic cation. The monomer is the reaction product of a sultone precursor and the oxyanion of a hydroxy-containing halogenated or non-halogenated C2-30 olefin-containing compound. A polymer includes the monomer of formula (I).
    单体化合物的化学式为(I):其中每个R1,R2和R3独立地为H,F,C1-10烷基,氟代C1-10烷基,C1-10环烷基或氟代C1-10环烷基,前提是R1,R2或R3中至少有一个是F; n是1至10的整数,A是含卤或不含卤的C2-30含烯基可聚合基团,G +是有机或无机阳离子。该单体是磺酸酯前体和含羟基的卤代或不卤代C2-30含烯基化合物的氧阴离子的反应产物。聚合物包括化学式(I)的单体。
  • Polymerizable photoacid generators
    申请人:Thackeray James W.
    公开号:US08900792B2
    公开(公告)日:2014-12-02
    A compound has formula (I): Q-O-(A)-Z−G+  (I) wherein Q is a halogenated or non-halogenated, C2-30 olefin-containing group, A is a fluorine-substituted C1-30 alkylene group, a fluorine-substituted C3-30 cycloalkylene group, a fluorine-substituted C6-30 arylene group, or a fluorine-substituted C7-30 alkylene-arylene group, Z is an anionic group comprising sulfonate, sulfonamide, or sulfonimide, and G+ has formula (II): wherein X is S or I, each R0 is halogenated or non-halogenated and is independently C1-30 alkyl group; a polycyclic or monocyclic C3-30 cycloalkyl group; a polycyclic or monocyclic C4-30 aryl group; or a combination of these, wherein when X is S, one of the R0 groups is optionally attached to one adjacent R0 group by a single bond, and a is 2 or 3, wherein when X is I, a is 2, or when X is S, a is 3. A copolymer, a photoresist, a coated substrate and method of patterning are disclosed.
    一种化合物的化学式为(I): Q-O-(A)-Z−G+,其中Q是卤化或非卤化的含有C2-30烯基的基团,A是氟代的C1-30烷基、氟代的C3-30环烷基、氟代的C6-30芳基、或氟代的C7-30烷基-芳基,Z是包括磺酸盐、磺酰胺或磺酰亚胺的阴离子基团,G+的化学式为(II):其中X为S或I,每个R0是卤化或非卤化且独立的C1-30烷基、多环或单环的C3-30环烷基、多环或单环的C4-30芳基或这些的组合,当X为S时,R0中的一个可以通过单键连接到相邻的R0基团之一上,a为2或3,当X为I时,a为2,当X为S时,a为3。还公开了一种共聚物、光刻胶、涂层基板和制图方法。
  • Method of preparing photoacid generating monomer
    申请人:Coley Suzanne M.
    公开号:US08907122B2
    公开(公告)日:2014-12-09
    A method of preparing a monomer comprises reacting a sultone of the formula (I): wherein each R is independently F, C1-10 alkyl, fluoro-substituted C1-10 alkyl, C1-10 cycloalkyl, or fluoro-substituted C1-10 cycloalkyl, provided that at least one R is F; n is an integer of from 0 to 10, and m is an integer of 1 to 4+2n, with a nucleophile having a polymerizable group. Monomers, including a photoacid-generating monomer, may be prepared by this method.
    一种制备单体的方法包括将式(I)的磺酮与含有聚合基团的亲核试剂反应,其中每个R独立地表示F、C1-10烷基、氟代C1-10烷基、C1-10环烷基或氟代C1-10环烷基,但至少一个R为F;n为0到10的整数,m为1到4+2n的整数。可以通过这种方法制备单体,包括光酸发生单体。
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