[EN] SUBSTITUTED PYRIMIDINES AND METHODS OF USE<br/>[FR] PYRIMIDINES SUBSTITUÉES ET MÉTHODES D'UTILISATION
申请人:THERAVANCE BIOPHARMA R&D IP LLC
公开号:WO2021203131A1
公开(公告)日:2021-10-07
The present disclosure provides inhibitors of activin receptor-like kinase 5 (ALK5). Also disclosed are methods to modulate the activity of ALK5 and methods of treatment of disorders mediated by ALK5.
Novel benzimidazole derivatives and pharmaceutical compositions comprising these compounds
申请人:NEUROSEARCH A/S
公开号:US20040097570A1
公开(公告)日:2004-05-20
The present invention relates to novel benzimidazole derivatives, pharmaceutical compositions containing these compounds, and methods of treatment therewith. The compounds of the invention are useful in the treatment of central nervous system diseases and disorders, which are responsive to modulation of the GABA
A
receptor complex, and in particular for inducing and maintaining anesthesia, sedation and muscle relaxation, as well as for combating febrile convulsions in children. The compounds of the invention may also be used by veterinarians.
POLYMERS FUNCTIONALIZED WITH LACTONES OR THIOLACTONES CONTAINING A PROTECTED AMINO GROUP
申请人:Bridgestone Corporation
公开号:EP2751142A1
公开(公告)日:2014-07-09
PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE AND ELECTRONIC DEVICE
申请人:FUJIFILM Corporation
公开号:US20140045117A1
公开(公告)日:2014-02-13
A pattern forming method, includes: (i) a step of forming a film from an actinic ray-sensitive or radiation-sensitive resin composition containing (P) a resin having (a1) a repeating unit capable of decomposing by an action of an acid to produce a carboxyl group, represented by the following formula (I) as defined in the specification and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; (ii) a step of exposing the film; and (iii) a step of performing a development by using a developer containing an organic solvent to form a negative pattern.
ACTINIC RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY- OR RADIATION-SENSITIVE FILM AND METHOD OF FORMING PATTERN
申请人:FUJIFILM Corporation
公开号:US20140234759A1
公开(公告)日:2014-08-21
According to one embodiment, there is provided an actinic ray- or radiation-sensitive resin composition containing
(A) a resin containing a repeating unit represented by general formula (1) below and a repeating unit that is decomposed by an action of an acid to generate an alkali-soluble group, and
(B) a compound that generates the acid when exposed to actinic rays or radiation,
where
L represents a bivalent connecting group,
R
1
represents a hydrogen atom or an alkyl group, and
Z represents a cyclic acid anhydride structure.