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2,4-Heptanedione, 5-ethyl- | 725708-70-3

中文名称
——
中文别名
——
英文名称
2,4-Heptanedione, 5-ethyl-
英文别名
5-ethylheptane-2,4-dione
2,4-Heptanedione, 5-ethyl-化学式
CAS
725708-70-3
化学式
C9H16O2
mdl
——
分子量
156.22
InChiKey
WTOINXDHRHCLLI-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    1.6
  • 重原子数:
    11
  • 可旋转键数:
    5
  • 环数:
    0.0
  • sp3杂化的碳原子比例:
    0.78
  • 拓扑面积:
    34.1
  • 氢给体数:
    0
  • 氢受体数:
    2

文献信息

  • METHOD FOR PRODUCING ARTICLE COATED WITH PATTERNED FILM AND PHOTOSENSITIVE COMPOSITION
    申请人:Nippon Sheet Glass Co., Ltd.
    公开号:EP1160625A1
    公开(公告)日:2001-12-05
    There can be provided a method for producing a pattern film-coated article which has excellent film formability, can remove unexposed portions of a film completely in the development step after exposing the film to light, and has excellent pattern accuracy; and a photosensitive composition. The method for producing a pattern film-coated article comprises the steps of coating a photosensitive composition comprising an organometallic or organosilicon compound having photosensitivity and a hydrolyzable metal or silicon alkoxide on a substrate, irradiating the coated film on the substrate with light to polymerize the exposed portions of the coated film and then dissolving unexposed portions to remove them, wherein a pattern film-coated article is produced from an allyl group-containing metal or silicon alkoxide as the organometallic or organosilicon compound.
    本发明提供了一种生产图案涂膜制品的方法,该方法具有优异的成膜性,在胶片曝光后的显影步骤中可以完全去除胶片的未曝光部分,并且具有优异的图案精度;还提供了一种感光组合物。 生产图案涂膜制品的方法包括以下步骤:在基底上涂布由具有感光性的有机金属或有机硅化合物和可水解的金属或硅烷氧基化合物组成的感光组合物,用光照射基底上的涂膜,使涂膜的曝光部分聚合,然后溶解未曝光部分以去除它们,其中图案涂膜制品是用含烯丙基的金属或硅烷氧基化合物作为有机金属或有机硅化合物生产的。
  • Method for producing article coated with patterned film and photosensitive composition
    申请人:——
    公开号:US20020160298A1
    公开(公告)日:2002-10-31
    There can be provided a method for producing a pattern film-coated article which has excellent film formability, can remove unexposed portions of a film completely in the development step after exposing the film to light. and has excellent pattern accuracy; and a photosensitive composition. The method for producing a pattern film-coated article comprises the steps of coating a photosensitive composition comprising an organometallic or organosilicon compound having photosensitivity and a hydrolyzable metal or silicon alkoxide on a substrate, irradiating the coated film on the substrate with light to polymerize the exposed portions of the coated film and then dissolving unexposed portions to remove them, wherein a pattern film-coated article is produced from an allyl group-containing metal or silicon alkoxide as the organometallic or organosilicon compound.
    可以提供一种生产涂有图案薄膜制品的方法,这种制品具有优异的成膜性,可以在胶片曝光后的显影步骤中完全去除胶片的未曝光部分,并且具有优异的图案精度;以及一种感光组合物。 生产图案涂膜制品的方法包括以下步骤:在基底上涂布由具有感光性的有机金属或有机硅化合物和可水解的金属或硅烷氧基化合物组成的感光组合物,用光照射基底上的涂膜,使涂膜的曝光部分聚合,然后溶解未曝光部分以除去它们,其中图案涂膜制品是用含烯丙基的金属或硅烷氧基化合物作为有机金属或有机硅化合物生产的。
  • COMPOSITION AND POLYMER
    申请人:Asahi Kasei Kabushiki Kaisha
    公开号:EP2735581B1
    公开(公告)日:2021-07-14
  • Composition and Polymer
    申请人:Nakamura Akitake
    公开号:US20140121293A1
    公开(公告)日:2014-05-01
    Disclosed is a composition comprising (A) at least one compound selected from the group consisting of an ether compound having two or more ether groups, a trivalent phosphorus compound, and a ketone compound, (B) a boron trihalide, and (C) an episulfide compound.
  • US4061604A
    申请人:——
    公开号:US4061604A
    公开(公告)日:1977-12-06
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