COATING-TYPE COMPOSITION FOR FORMING ORIGINAL FILM, PATTERNING PROCESS, POLYMER, AND METHOD FOR MANUFACTURING POLYMER
申请人:Shin-Etsu Chemical Co., Ltd.
公开号:EP3876035A1
公开(公告)日:2021-09-08
The present invention provides a coating-type composition for forming an organic film containing: a polymer having a structure shown by the following general formula (1) as a partial structure; and an organic solvent, where in the formula (1), ring structures Ar1 and Ar2 represent a benzene ring or a naphthalene ring optionally having a substituent, and W1 represents an aryl group having 6 to 30 carbon atoms and optionally having a substituent. This provides a coating-type composition for forming an organic film that can form an organic film having high patterncurving resistance and high dry-etching resistance, the composition being excellent in solvent solubility and having a low generation of defects.
本发明提供了一种用于形成有机薄膜的涂层型组合物,该组合物包含:具有以下通式(1)所示结构的聚合物,作为部分结构;以及有机溶剂,其中在式(1)中,环结构 Ar1 和 Ar2 代表可选具有取代基的苯环或萘环,W1 代表具有 6 至 30 个碳原子且可选具有取代基的芳基。这就提供了一种用于形成有机薄膜的涂层型组合物,该组合物可以形成具有高抗图案弯曲性和高抗干蚀刻性的有机薄膜,而且该组合物具有优异的溶剂溶解性和较低的缺陷产生率。