11-Sulfanylundecanal | 144314-69-2

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: 11-Sulfanylundecanal
• 英文别名: 11-sulfanylundecanal
• CAS: 144314-69-2
• 化学式: C₁₁H₂₂OS
• 分子量: 202.36
• InChiKey: IIUKIXWEKFNLLM-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.7
• 重原子数：
  13
• 可旋转键数：
  10
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.91
• 拓扑面积：
  18.1
• 氢给体数：
  1
• 氢受体数：
  2

文献信息

• Enzyme triggered redox altering chemical elimination (E-trace) immunoassay
  申请人：Ohmx Corporation

  公开号：EP2642291A1

  公开（公告）日：2013-09-25

  The present invention provides methods for the detection of target analytes in a test sample, said methods using a solid support comprising an electrode comprising an optional self -assembled monolayer (SAM), a covalently attached electroactive active moiety (EAM) comprising a transition metal complex comprising a self-immolative moiety (SIM) and a peroxides sensitive moiety (PSM), wherein said EAM has a first E0 and a capture binding ligand that binds the analyte.

  本发明提供了检测测试样品中目标分析物的方法，所述方法使用一种固体支持物，该支持物包括一个电极，该电极包含一个可选的自组装单层（SAM）、一个共价连接的电活性分子（EAM），该EAM包含一个过渡金属复合物，该过渡金属复合物包含一个自惰性分子（SIM）和一个过氧化物敏感分子（PSM），其中所述EAM具有第一E0和一个结合分析物的捕获结合配体。
• Stabilization of self-assembled monolayers
  申请人：Liu Gang-Yu

  公开号：US20050221081A1

  公开（公告）日：2005-10-06

  Self-assembled monolayers and other solid support/surface-layer systems are widely used as resists for nanofabrication because of its closely packed structure, low defect density, and uniform thickness. However these resists suffer the drawback of low stability in liquid due to desorption and/or oxidation induced desorption. Stabilized solid support/surface-layer systems and methods of preserving the integrity and structure of self-assembled monolayers on solid surfaces are provided. The method involves adding small amount of amphiphilic molecules, such as DMF and DMSO, into aqueous solutions as preserving media. These molecules adhere favorably to defect sites within monolayers and inhibit the initiation of both known degradation pathways: oxidation and desorption. Also provided are stabilized systems including the solid support/surface-layer system and stabilizing solution, as well as kits of stabilizing solutions for use with various systems.

  自组装单层和其他固体支撑/表面层系统因其结构紧密、缺陷密度低和厚度均匀而被广泛用作纳米制造的抗蚀剂。然而，由于解吸和/或氧化引起的解吸，这些抗蚀剂存在在液体中稳定性低的缺点。本研究提供了稳定的固体支持物/表面层系统以及在固体表面保持自组装单层的完整性和结构的方法。该方法包括在水溶液中加入少量两亲分子，如 DMF 和 DMSO，作为保存介质。这些分子能很好地附着在单层表面的缺陷部位，并抑制氧化和解吸这两种已知降解途径的发生。此外，还提供了包括固体支持物/表面层系统和稳定溶液在内的稳定系统，以及用于各种系统的稳定溶液套件。
• A RUBBER COMPOUND FOR TYRE PRODUCTION
  申请人：Bridgestone Corporation

  公开号：EP3083276B1

  公开（公告）日：2017-08-02
• [EN] STABILIZATION OF SELF-ASSEMBLED MONOLAYERS<br/>[FR] STABILISATION DE MONOCOUCHES AUTO-ASSEMBLEES
  申请人：UNIV CALIFORNIA

  公开号：WO2005089415A2

  公开（公告）日：2005-09-29

  Self-assembled monolayers and other solid support/surface-layer systems are widely used as resists for nanofabrication because of its closely packed structure, low defect density, and uniform thickness. However these resists suffer the drawback of low stability in liquid due to desorption and/or oxidation induced desorption. Stabilized solid support/surface-layer systems and methods of preserving the integrity and structure of self-assembled monolayers on solid surfaces are provided. The method involves adding small amount of amphiphilic molecules, such as DMF and DMSO, into aqueous solutions as preserving media. These molecules adhere favorably to defect sites within monolayers and inhibit the initiation of both known degradation pathways: oxidation and desorption. Also provided are stabilized systems including the solid support/surface-layer system and stabilizing solution, as well as kits of stabilizing solutions for use with various systems.