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4a,5,8,8a-Tetrahydro-1H-5,8-methano-2-benzopyran-1,3(4H)-dione | 96392-00-6

中文名称
——
中文别名
——
英文名称
4a,5,8,8a-Tetrahydro-1H-5,8-methano-2-benzopyran-1,3(4H)-dione
英文别名
4-oxatricyclo[6.2.1.02,7]undec-9-ene-3,5-dione
4a,5,8,8a-Tetrahydro-1H-5,8-methano-2-benzopyran-1,3(4H)-dione化学式
CAS
96392-00-6
化学式
C10H10O3
mdl
——
分子量
178.18
InChiKey
ZHRLFUOROPZHGR-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    0.9
  • 重原子数:
    13
  • 可旋转键数:
    0
  • 环数:
    3.0
  • sp3杂化的碳原子比例:
    0.6
  • 拓扑面积:
    43.4
  • 氢给体数:
    0
  • 氢受体数:
    3

文献信息

  • SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION HAVING ORGANIC GROUP HAVING ALIPHATIC POLYCYCLIC STRUCTURE
    申请人:NISSAN CHEMICAL INDUSTRIES, LTD.
    公开号:US20170153549A1
    公开(公告)日:2017-06-01
    A resist underlayer film-forming composition for lithography having an aliphatic polycyclic structure including, as a silane, a hydrolyzable silane, a hydrolysis product thereof, a hydrolysis-condensation product thereof, or a combination thereof, in which the aliphatic polycyclic structure is a structure which a hydrolyzable silane of Formula (1): R 1 a R 2 b Si(R 3 ) 4−(a+b) Formula (1) (where R 1 is an organic group having an aliphatic polycyclic structure and bonded to a Si atom through a Si—C bond; R 3 is an ethoxy group; a is an integer of 1; b is an integer of 0 to 2; and a+b is an integer of 1 to 3) has, or a structure included in a compound added as an aliphatic polycyclic compound, an aliphatic polycyclic dicarboxylic acid, or an aliphatic polycyclic dicarboxylic acid anhydride, each optionally having a double bond, a hydroxy group, or an epoxy group.
  • US4022954A
    申请人:——
    公开号:US4022954A
    公开(公告)日:1977-05-10
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