Ethyl-methyl-phenacylsulfanium | 29710-86-9

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: Ethyl-methyl-phenacylsulfanium
• CAS: 29710-86-9
• 化学式: C₁₁H₁₅OS
• 分子量: 195.305
• InChiKey: VXUQSZLNKUTSGH-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.7
• 重原子数：
  13
• 可旋转键数：
  4
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.36
• 拓扑面积：
  18.1
• 氢给体数：
  0
• 氢受体数：
  1

文献信息

• Resin suitable for an acid generator and a chemically amplified positive resist composition containing the same
  申请人：Ando Nobuo

  公开号：US20070149702A1

  公开（公告）日：2007-06-28

  The present invention provides a resin which generates an acid by irradiation and is a salt of an organic cation and an anionic polymer wherein the anionic polymer has no carbon-carbon unsaturated bond. The present invention further provides a chemically amplified resist composition comprising the same.

  本发明提供了一种树脂，通过辐射产生酸，是有机阳离子和阴离子聚合物的盐，其中阴离子聚合物没有碳-碳不饱和键。本发明还提供了包含该树脂的化学增感光阻组合物。
• ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE SAME, PATTERN FORMING METHOD, MANUFACTURING METHOD OF ELECTRONIC DEVICE AND ELECTRONIC DEVICE
  申请人：FUJIFILM Corporation

  公开号：US20140356771A1

  公开（公告）日：2014-12-04

  There is provided an actinic ray-sensitive or radiation-sensitive resin composition, having: (A) a resin having a repeating unit represented by formula (I); (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; and (C) a resin having at least one repeating unit (x) out of a repeating unit represented by formula (II) and a repeating unit represented by formula (III) and containing substantially neither fluorine atom nor silicon atom, wherein the content of the repeating unit (x) is 90% or more by mole based on all repeating units in the resin (C).
• SULFONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20160349612A1

  公开（公告）日：2016-12-01

  A sulfonium salt having both anion and cation moieties in the molecule functions as a photoacid generator and is compatible with other components. A resist composition comprising the sulfonium salt has the advantages of reduced acid diffusion and forms a pattern with a good balance of sensitivity, MEF and DOF, less outgassing, and minimal defects.
• US7304175B2
  申请人：——

  公开号：US7304175B2

  公开（公告）日：2007-12-04
• US9645491B2
  申请人：——

  公开号：US9645491B2

  公开（公告）日：2017-05-09