tert-butyl 2-formyloxyacetate | 145641-58-3

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: tert-butyl 2-formyloxyacetate
• CAS: 145641-58-3
• 化学式: C₇H₁₂O₄
• 分子量: 160.17
• InChiKey: DHJVSDREWODVNU-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1
• 重原子数：
  11
• 可旋转键数：
  5
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.71
• 拓扑面积：
  52.6
• 氢给体数：
  0
• 氢受体数：
  4

反应信息

• 作为反应物：
  描述：

  tert-butyl 2-formyloxyacetate 在 吡啶 、 2,6-二叔丁基-4-甲基苯酚 、 水 、 碳酸氢钠 作用下， 以 二氯甲烷 、 二甲基亚砜 为溶剂， 反应 75.0h， 生成 2-(tert-butoxy)-N-(2-(methacryloyloxy)ethyl)-N-methyl-2-oxo-N-((perfluorophenyl)methyl)ethan-1-aminium trifluoromethanesulfonate
  参考文献：
  名称：

  FLUORINATED ZWITTERIONIC POLYMERS AND METHODS OF USE

  摘要：

  Fluorinated monomer compositions having the formula: A-L-Z (1), wherein A is a polymerizable group (e.g., a vinyl group); L is a bond or linking portion; Z is a zwitterionic moiety or a zwitterionic precursor moiety containing a protecting group capable of deprotection to form a charged group; wherein at least one hydrogen atom in A, L, and/or Z in Formula (1) is substituted by a fluorinated hydrocarbon group, wherein the fluorinated hydrocarbon group contains 1-12 carbon atoms and precisely or at least one, two, three, four, five, or six fluorine atoms. Also described herein are fluorinated zwitterionic polymers derived from such monomers. Also described herein are mixed-charge zwitterionic polymers. Other aspects include methods for producing the monomers and polymers, bulk material (e.g., hydrogel or copolymer hybrid) compositions of any of the zwitterionic polymers described herein, fouling-resistant and/or fouling releasing surfaces and objects, and nanoparticles containing the polymer or bulk material.

  公开号：

  WO2023249926A2
• 作为产物：
  描述：

  甲酸 、 溴乙酸叔丁酯 在 三乙胺 作用下， 以 乙酸乙酯 为溶剂， 反应 48.0h， 以68%的产率得到tert-butyl 2-formyloxyacetate
  参考文献：
  名称：

  拟肽的光刻合成

  摘要：

  我们描述了一种合成拟肽（寡聚 N 取代甘氨酸）的新型光刻方法。该策略能够构建空间可寻址的拟肽微阵列，从而为发现蛋白质配体提供潜在的强大工具。

  DOI：

  10.1021/ja039565w

文献信息

• Approaches to the synthesis of endothiopeptides: Synthesis of a thioamide-containing C-terminal bombesin nonapeptide
  作者：Jurjus Jurayj、Mark Cushman

  DOI：10.1016/s0040-4020(01)89436-9

  日期：——

  Several approaches have been investigated for the synthesis of a bombesin C-terminal nonapeptide analogue AsnGlnTrpAlaVAlGlyHisLeu-ψCSNHMet-NH2. A new activated dithioester 16 has been synthesized. Thioacylation of methionine methyl ester with 16 was always accompanied by racemization, resulting in the formation of diastereomeric mixtures of reaction products.

  几种方法已被研究用于铃蟾肽C-末端九肽类似物AsnGlnTrpAlaVAlGlyHisLeu-ψCSNHMet-NH的合成2。已经合成了新的活化的二硫酯16。甲硫氨酸甲酯与16的硫酰化总是伴随着消旋作用，导致反应产物的非对映异构体混合物的形成。
• Radiation-sensitive resin composition
  申请人：——

  公开号：US20020009668A1

  公开（公告）日：2002-01-24

  A radiation-sensitive resin composition comprising an acid-labile group-containing resin and a photoacid generator is disclosed. The resin has a structure of the formula (1), 1 wherein R 1 represents a hydrogen atom, a monovalent acid-labile group, an alkyl group having 1-6 carbon atoms which does not have an acid-labile group, or an alkylcarbonyl group having 2-7 carbon atoms which does not have an acid-labile group, X 1 represents a linear or branched fluorinated alkyl group having 1-4 carbon atoms, and R 2 represents a hydrogen atom, a linear or branched alkyl group having 1-10 carbon atoms, or a linear or branched fluorinated alkyl group having 1-10 carbon atoms. The resin composition exhibits high transmittance of radiation, high sensitivity, resolution, and pattern shape, and is useful as a chemically amplified resist in producing semiconductors at a high yield.

  公开了一种辐射敏感的树脂组合物，包括一个含有酸敏感基团的树脂和一个光酸发生剂。该树脂的结构式为(1)，其中R1代表氢原子、一价酸敏感基团、不含酸敏感基团的1-6个碳原子的烷基或不含酸敏感基团的2-7个碳原子的烷基酰基，X1代表线性或支链的含有1-4个碳原子的氟化烷基，R2代表氢原子、含有1-10个碳原子的线性或支链烷基，或含有1-10个碳原子的线性或支链氟化烷基。该树脂组合物表现出辐射的高透过率、高敏感度、分辨率和图案形状，可用于在高产率下生产半导体中的化学放大图案。
• VINYLPHENYLPROPIONIC ACID DERIVATIVES, PROCESSES FOR PRODUCTION OF THE DERIVATIVES, POLYMERS THEREOF AND RADIOSENSITIVE RESIN COMPOSITIONS
  申请人：JSR Corporation

  公开号：EP1231205A1

  公开（公告）日：2002-08-14

  Vinylphenylpropionic acid derivatives; processes for producing the derivatives; polymers of the same; and radiosensitive resin compositions containing the polymers. The above polymers exhibit low radiation absorption and are useful as the resin component of radiosensitive resin compositions particularly suitable for chemically amplified resists. For example, t-butyl 4-vinylphenylpropionate is produced by (1) reacting t-butyl bromoacetate with tri(n-butyl)phosphine to obtain a quaternary phosphonium salt, (2) reacting this salt with a base to obtain a phosphorus ylide, (3) reacting this ylide with 2,4,6-tris(3',5'-di-t-butyl-4'-hydroxybenzyl)methyl-styrene to obtain a quaternary phosphonium salt, and (4) hydrolyzing this salt.

  乙烯基苯丙酸衍生物；生产该衍生物的工艺；该衍生物的聚合物；以及含有该聚合物的辐射敏感树脂组合物。上述聚合物的辐射吸收率低，可用作辐射敏感树脂组合物的树脂成分，尤其适用于化学放大抗蚀剂。例如，4-乙烯基苯基丙酸叔丁酯是通过以下方法制得的：(1) 将溴乙酸叔丁酯与三(正丁基)膦反应，得到季鏻盐、(2) 将这种盐与碱反应，得到一种磷酰亚胺； (3) 将这种酰亚胺与 2,4,6-三（3',5'-二-叔丁基-4'-羟基苄基）甲基苯乙烯反应，得到一种季鏻盐； (4) 将这种盐水解。
• RESIN MATERIAL FOR FORMING UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD FOR PRODUCING RESIST UNDERLAYER FILM, AND LAYERED PRODUCT
  申请人：Mitsui Chemicals, Inc.

  公开号：EP3693793A1

  公开（公告）日：2020-08-12

  Provided is a resin material for forming an underlayer film which is used to form a resist underlayer film used in a multi-layer resist process, the resin material including a cyclic olefin polymer (I), in which a temperature at an intersection between a storage modulus (G') curve and a loss modulus (G") curve in a solid viscoelasticity of the resin material for forming an underlayer film which is as measured under conditions of a measurement temperature range of 30°C to 300°C, a heating rate of 3°C/min, and a frequency of 1 Hz in a nitrogen atmosphere in a shear mode using a rheometer is higher than or equal to 40°C and lower than or equal to 200°.

  本发明提供了一种用于形成底层膜的树脂材料，该底层膜可用于形成多层光刻胶工艺中使用的光刻胶底层膜，该树脂材料包括环烯烃聚合物 (I)、其中，用于形成底层膜的树脂材料的固体粘弹性中的存储模量（G'）曲线和损失模量（G"）曲线的交点温度高于或等于 40°C，且低于或等于 200°C；该固体粘弹性是在测量温度范围为 30°C 至 300°C、加热速率为 3°C/min 和频率为 1 Hz 的条件下，在氮气环境中使用流变仪以剪切模式测得的。
• ALFA-HELIX MIMETICS AND METHOD RELATING TO THE TREATMENT OF CANCER STEM CELLS
  申请人：Choongwae Pharma Corporation

  公开号：EP1957516B1

  公开（公告）日：2016-03-09