There are disclosed compounds of formula I, ##STR1## wherein R.sup.1 and R.sup.2 independently represent hydrogen or halogen, R.sup.3 and R.sup.4 independently represent phenyl, or alkyl C.sub.1-6 optionally substituted by one or more substituents selected from OR.sup.5, alkylthio C.sub.1-6, NR.sup.6 R.sup.7, phenyl, COOR.sup.8 and halogen, R.sup.5, R.sup.6, R.sup.7 and R.sup.8 independently represent hydrogen or alkyl C.sub.1-6, and X represents an acidic moiety, and pharmaceutically acceptable salts thereof. Processes for their production and pharmaceutical compositions and methods of treatment involving their use are also described.
公开了化合物I的结构,其式为##STR1## 其中R.sup.1和R.sup.2独立地表示氢或卤素,R.sup.3和R.sup.4独立地表示苯基或烷基C.sub.1-6,其中该烷基可以选择性地被一个或多个取代基所取代,所述取代基被选择自OR.sup.5,烷基
硫基C.sub.1-6,NR.sup.6R.sup.7,苯基,COOR.sup.8和卤素,R.sup.5,R.sup.6,R.sup.7和R.sup.8独立地表示氢或烷基C.sub.1-6,X表示酸性基团,以及其药学上可接受的盐。还描述了其生产过程和包含其使用的制药组合物和治疗方法。