Ta(OMe)4(thd) | 238757-13-6

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: Ta(OMe)4(thd)
• CAS: 238757-13-6
• 化学式: C₁₅H₃₁O₆Ta
• 分子量: 488.355
• InChiKey: JUJOLBYWVMTWCZ-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  None
• 重原子数：
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• 可旋转键数：
  None
• 环数：
  None
• sp3杂化的碳原子比例：
  None
• 拓扑面积：
  None
• 氢给体数：
  None
• 氢受体数：
  None

反应信息

• 作为产物：
  描述：

  2,2,6,6-四甲基-3,5-庚二酮 、 甲醇钽 以 正己烷 为溶剂， 以85%的产率得到Ta(OMe)4(thd)
  参考文献：
  名称：

  Some tantalum(V) β-diketonate and tantalum(V) aminoalcoholate derivatives potentially important in the deposition of tantalum-containing materials

  摘要：

  The complexes [Ta(OCH3)(4)(L)] (1,2) [where HL = 2,2,6,6-tetramethylheptane-3,5-dione (tmhdH) or 2,4-pentanedione (acacH)] have been isolated from the reaction of tantalum penta-methoxide with HL in n-hexane. These complexes are relatively stable and do not fume with moist air. The solid state structures of 1 and 2 reveal distorted octahedral coordination about the tantalum with the beta-diketonate occupying equatorial positions. Complexes of the type trans,cis-[TaCl2(OCH3)(2)(beta-diketonate)], where beta-diketone = tmhdH (5) or acacH (6), have also been prepared from the reaction of TaCl5 with the respective beta-diketonates in absolute methanol and characterised. The complexes exhibit distorted octahedral coordination about the tantalum with the chloride atoms occupying trans axial positions and the methoxide and beta-diketonate ligands occupying equatorial positions. The reactions of tantalum penta-methoxide with nitrogen-containing donors gave the analogous liquid products of the formula [Ta(OCH3)(4)(L')] where L' = dmae (3) (N,N-dimethylaminoethoxide) or bis-dmap (4) (1,3-bis(dimethylamino)-2-propoxide). Their spectroscopic data are consistent with coordination of the nitrogenous ligands as N,O chelates (only one N coordinated in the case of bis-dmap). The use of compounds of this type in the deposition of complex oxides by liquid injection MOCVD is discussed. (C) 1999 Elsevier Science Ltd. All rights reserved.

  DOI：

  10.1016/s0277-5387(99)00236-3

文献信息

• Metal–organic chemical vapour deposition of lead scandium tantalate: chemical issues and precursor selection
  作者：Anthony C Jones、Timothy J Leedham、Hywel O Davies、Kirsty A Fleeting、Paul O’Brien、Michael J Crosbie、Peter J Wright、Dennis J Williams、Penelope A Lane

  DOI：10.1016/s0277-5387(99)00365-4

  日期：2000.2

  MOCVD is a promising technique for the deposition of the pyroelectric oxide lead scandium tantalate, Pb(Sc0.5Ta0.5)O-3. In order to exploit the full potential of the method, it is important to identify the optimum combination of precursors so that process parameters and film properties are optimised. In this paper, issues involved in the selection of suitable Pb, Sc and Ta precursors are discussed and the molecular design of new Ta and Sc sources is described. It is shown how the use of carefully matched precursors allows the growth of Pb(Sc0.5Ta0.5)O-3 in the required perovskite phase at low substrate temperatures. (C) 2000 Elsevier Science Ltd All rights reserved.