2,2-difluoro-3-hydroxy-4-methylpentanoic acid | 1248233-69-3

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: 2,2-difluoro-3-hydroxy-4-methylpentanoic acid
• CAS: 1248233-69-3
• 化学式: C₆H₁₀F₂O₃
• 分子量: 168.14
• InChiKey: RPDGATXUWOOFSA-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.2
• 重原子数：
  11
• 可旋转键数：
  3
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.83
• 拓扑面积：
  57.5
• 氢给体数：
  2
• 氢受体数：
  5

反应信息

• 作为反应物：
  描述：

  2,2-difluoro-3-hydroxy-4-methylpentanoic acid 在 sodium hydroxide 、 ammonium cerium(IV) nitrate 、 硫酸 、 水 、 双(2-氧代-3-恶唑烷基)次磷酰氯 、 二异丁基氢化铝 、 N,N-二异丙基乙胺 、 三苯基膦 、 偶氮二甲酸二乙酯 作用下， 以 四氢呋喃 、 二氯甲烷 、 水 、 甲苯 、 乙腈 为溶剂， 生成 tert-butyl N-(2,2-difluoro-4-methyl-1-oxopentan-3-yl)carbamate
  参考文献：
  名称：

  Synthesis of (Z)-fluoroalkene dipeptide isosteres utilizing organocopper-mediated reduction of γ,γ-difluoro-α,β-enoates

  摘要：

  gamma,gamma -Difluoro-alpha,beta -enoates are reduced with organocopper reagents to afford the corresponding gamma -fluoro-beta,gamma -enoates. This organocopper-mediated reduction was applied to the synthesis of (Z)-fluoroalkene dipeptide isosteres. (C) 2000 Elsevier Science Ltd. All rights reserved.

  DOI：

  10.1016/s0040-4039(00)01924-9
• 作为产物：
  描述：

  2,2-difluoro-3-hydroxy-4-methylpentanoic acid ethyl ester 在 sodium hydroxide 、 水 作用下， 以 四氢呋喃 为溶剂， 生成 2,2-difluoro-3-hydroxy-4-methylpentanoic acid
  参考文献：
  名称：

  Synthesis of (Z)-fluoroalkene dipeptide isosteres utilizing organocopper-mediated reduction of γ,γ-difluoro-α,β-enoates

  摘要：

  gamma,gamma -Difluoro-alpha,beta -enoates are reduced with organocopper reagents to afford the corresponding gamma -fluoro-beta,gamma -enoates. This organocopper-mediated reduction was applied to the synthesis of (Z)-fluoroalkene dipeptide isosteres. (C) 2000 Elsevier Science Ltd. All rights reserved.

  DOI：

  10.1016/s0040-4039(00)01924-9

文献信息

• Fluorinated ester monomer, making method, fluorinated ester polymer, and difluorohydroxycarboxylic acid
  申请人：Kinsho Takeshi

  公开号：US08697903B2

  公开（公告）日：2014-04-15

  A fluorinated ester monomer is provided having formula (1) wherein R1 is H, CH3 or CF3, R2 and R3 are H or a monovalent hydrocarbon group, or R2 and R3 forms a hydrocarbon ring, R4 is a monovalent hydrocarbon group, and k is 0 or 1. A polymer obtained from the monomer has transparency to radiation with a wavelength of up to 200 nm and appropriate alkaline hydrolysis, is constructed such that any of water repellency, water slip and surface segregation may be adjusted by a choice of its structure, and is useful in forming ArF immersion lithography materials.

  提供一种具有公式（1）的氟化酯单体，其中R1为H、CH3或CF3，R2和R3为H或单价烃基，或R2和R3形成烃环，R4为单价烃基，k为0或1。从该单体获得的聚合物具有对波长高达200纳米的辐射透明度和适当的碱性水解性能，其结构可以通过选择进行任何的防水性、水滑性和表面分离调整，并且在形成ArF浸没光刻材料方面非常有用。
• FLUORINATED ESTER MONOMER, MAKING METHOD, FLUORINATED ESTER POLYMER, AND DIFLUOROHYDROXYCARBOXYLIC ACID
  申请人：KINSHO Takeshi

  公开号：US20120083580A1

  公开（公告）日：2012-04-05

  A fluorinated ester monomer is provided having formula (1) wherein R 1 is H, CH 3 or CF 3 , R 2 and R 3 are H or a monovalent hydrocarbon group, or R 2 and R 3 forms a hydrocarbon ring, R 4 is a monovalent hydrocarbon group, and k is 0 or 1. A polymer obtained from the monomer has transparency to radiation with a wavelength of up to 200 nm and appropriate alkaline hydrolysis, is constructed such that any of water repellency, water slip and surface segregation may be adjusted by a choice of its structure, and is useful in forming ArF immersion lithography materials.

  提供了一种氟化酯单体，其化学式为（1），其中R1为H、CH3或CF3，R2和R3为H或单价碳氢基团，或R2和R3形成碳氢环，R4为单价碳氢基团，k为0或1。从该单体中获得的聚合物具有对波长达200纳米的辐射透明度和适当的碱性水解性，其结构可以通过选择来调节任何的防水性、水滑性和表面分离性，可用于制备ArF浸没光刻材料。
• ONIUM SALT COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US20210179554A1

  公开（公告）日：2021-06-17

  An onium salt having formula (1) serving as an acid diffusion inhibitor and a chemically amplified resist composition comprising the acid diffusion inhibitor are provided. When processed by lithography, the resist composition exhibits a high sensitivity, and excellent lithography performance factors such as CDU and LWR.

  提供一种具有化学式（1）的醇铵盐，用作酸扩散抑制剂，以及包括该酸扩散抑制剂的化学增强型抗蚀剂组合物。当通过光刻加工时，该抗蚀剂组合物表现出高灵敏度和优异的光刻性能因素，例如CDU和LWR。
• RESIST COMPOSITION AND PATTERNING PROCESS
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US20200249571A1

  公开（公告）日：2020-08-06

  A resist composition comprising a sulfonium salt having formula (1) as PAG, a base polymer, and an organic solvent, when processed by lithography, has light transmittance, acid diffusion suppressing effect, and excellent lithography performance factors such as DOF, LWR and MEF. A lithography process for forming a resist pattern from the composition is also provided.

  一种抗蚀组合物，包括具有公式（1）作为PAG的磺酸盐、基础聚合物和有机溶剂。在光刻工艺中加工时，该组合物具有光透过率、抑制酸扩散效果和优异的光刻性能因素，例如DOF、LWR和MEF。还提供了一种从该组合物形成抗蚀图案的光刻工艺。
• ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US20220127225A1

  公开（公告）日：2022-04-28

  An onium salt having formula (1) serving as an acid diffusion inhibitor and a chemically amplified resist composition comprising the acid diffusion inhibitor are provided. When processed by lithography, the resist composition forms a pattern having minimal defects and excellent lithography performance factors such as CDU, LWR and DOF.

  提供一种化学式为(1)的盐类，作为酸扩散抑制剂，并提供一种化学增强型光刻胶组合物，其中包括该酸扩散抑制剂。当通过光刻技术进行加工时，该光刻胶组合物形成的图案具有最小的缺陷和出色的光刻性能因子，如CDU、LWR和DOF。