1-(Chloromethoxy)-3,3-dimethylbutane | 1517277-79-0

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: 1-(Chloromethoxy)-3,3-dimethylbutane
• CAS: 1517277-79-0
• 化学式: C₇H₁₅ClO
• 分子量: 150.64
• InChiKey: UCENPNKAXBHGRR-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.8
• 重原子数：
  9
• 可旋转键数：
  4
• 环数：
  0.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  9.2
• 氢给体数：
  0
• 氢受体数：
  1

文献信息

• PATTERNING PROCESS, RESIST COMPOSITION, AND ACETAL COMPOUND
  申请人：Hatakeyama Jun

  公开号：US20110236826A1

  公开（公告）日：2011-09-29

  A pattern is formed by applying a resist composition comprising a polymer comprising recurring units having an acid labile group-substituted hydroxyl group, an acid generator, and an organic solvent onto a substrate, prebaking the composition to form a resist film, exposing the resist film to high-energy radiation to define exposed and unexposed regions, baking, and developing the exposed film with an organic solvent developer to form a negative pattern wherein the unexposed region of film is dissolved and the exposed region of film is not dissolved.
• US8440386B2
  申请人：——

  公开号：US8440386B2

  公开（公告）日：2013-05-14