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2,2-Bis-vinyloxy-butane | 90112-60-0

中文名称
——
中文别名
——
英文名称
2,2-Bis-vinyloxy-butane
英文别名
2,2-Bis(ethenoxy)butane
2,2-Bis-vinyloxy-butane化学式
CAS
90112-60-0
化学式
C8H14O2
mdl
——
分子量
142.198
InChiKey
XJICNTGCGHWSMM-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    2.7
  • 重原子数:
    10
  • 可旋转键数:
    5
  • 环数:
    0.0
  • sp3杂化的碳原子比例:
    0.5
  • 拓扑面积:
    18.5
  • 氢给体数:
    0
  • 氢受体数:
    2

文献信息

  • FUMARIC ACID DIESTER-CINNAMIC ACID ESTER-BASED COPOLYMER, PRODUCTION METHOD THEREOF AND FILM USING THE SAME
    申请人:TOSOH CORPORATION
    公开号:US20150291751A1
    公开(公告)日:2015-10-15
    To provide a novel fumaric acid diester-cinnamic acid ester-based copolymer having a high molecular weight, which is expected to maintain excellent strength or ensures excellent toughness even when formed into a film, a method for efficiently producing the copolymer, and a film using the same. The fumaric acid diester-cinnamic acid ester-based copolymer contains a fumaric acid diester residue unit, a cinnamic acid ester residue unit having an alkyl group with a carbon number of 1 to 6, and a residue unit of a polyfunctional monomer having two or more radical polymerizable functional groups.
    提供一种具有高分子量的新型顺丁烯二酸二酯-肉桂酸酯共聚物,预计即使形成薄膜也能保持优异的强度或确保出色的韧性,以及一种高效生产该共聚物的方法和使用该共聚物的薄膜。该顺丁烯二酸二酯-肉桂酸酯共聚物包含顺丁烯二酸二酯残基单元、具有碳数为1至6的烷基的肉桂酸酯残基单元和具有两个或更多自由基聚合官能团的多官能单体残基单元。
  • Resin composition for laser engraving, relief printing plate precursor for laser engraving, relief printing plate, and method of manufacturing relief printing plate
    申请人:FUJIFILM Corporation
    公开号:EP2095947A1
    公开(公告)日:2009-09-02
    The invention provides a resin composition for laser engraving, having a binder polymer containing at least one of a structure unit represented by the following Formula (I) or a structure unit represented by the following Formula (II). In the Formulae, Q represents a partial structure which provides an acid group having an acid dissociation constant pKa of 0 to 20 when it is in the form of -Q-H; R1 to R3 each independently represent a hydrogen atom or a monovalent organic group; and A and B each independently represent a bivalent organic connecting group. The invention further provides a relief printing plate precursor having a relief forming layer containing the resin composition, a method for manufacturing a relief printing plate having crosslinking components of the relief forming layer and laser engraving the relief forming layer, and a relief printing plate formed thereby.
    本发明提供了一种用于激光雕刻的树脂组合物,其粘结剂聚合物含有下式(I)所代表的结构单元或下式(II)所代表的结构单元中的至少一种。在式中,Q 代表部分结构,当它以-Q-H 的形式存在时,可提供酸解离常数 pKa 为 0 至 20 的酸基;R1 至 R3 各自独立地代表氢原子或一价有机基团;A 和 B 各自独立地代表二价有机连接基团。本发明进一步提供了一种浮雕印刷板前体,该前体具有含有树脂组合物的浮雕形成层;一种制造浮雕印刷板的方法,该方法具有交联浮雕形成层的组分和激光雕刻浮雕形成层;以及由此形成的浮雕印刷板。
  • (FUMARIC ACID DIESTER)-(CINNAMIC ACID ESTER) COPOLYMER, METHOD FOR PRODUCING SAME, AND FILM PRODUCED USING SAME
    申请人:Tosoh Corporation
    公开号:EP2927250A1
    公开(公告)日:2015-10-07
    To provide a novel fumaric acid diester-cinnamic acid ester-based copolymer having a high molecular weight, which is expected to maintain excellent strength or ensures excellent toughness even when formed into a film, a method for efficiently producing the copolymer, and a film using the same. The fumaric acid diester-cinnamic acid ester-based copolymer contains a fumaric acid diester residue unit, a cinnamic acid ester residue unit having an alkyl group with a carbon number of 1 to 6, and a residue unit of a polyfunctional monomer having two or more radical polymerizable functional groups.
    提供一种新型富马酸二酯-肉桂酸酯基共聚物,该共聚物具有高分子量,即使形成薄膜也可望保持优异的强度或确保优异的韧性;提供一种高效生产该共聚物的方法;以及提供一种使用该共聚物的薄膜。富马酸二酯-肉桂酸酯基共聚物含有富马酸二酯残基单元、具有碳原子数为 1 至 6 的烷基的肉桂酸酯残基单元和具有两个或两个以上可自由基聚合官能团的多官能团单体残基单元。
  • ABRASIVE ARTICLES COMPRISING VINYL ETHER FUNCTIONAL RESINS
    申请人:MINNESOTA MINING AND MANUFACTURING COMPANY
    公开号:EP0710171A1
    公开(公告)日:1996-05-08
  • US9512284B2
    申请人:——
    公开号:US9512284B2
    公开(公告)日:2016-12-06
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