COMPOUND, ACID GENERATOR, RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN
申请人:Kawaue Akiya
公开号:US20100104973A1
公开(公告)日:2010-04-29
There are provided a compound preferable as an acid generator for a resist composition, an acid generator including the compound, a resist composition containing the acid generator, and a method of forming a resist pattern using the resist composition, and the compound is represented by general formula (b1-12) shown below:
R
2
—CH
2
—O—Y
1
—SO
3
−
A
+
(b1-12)
wherein R
2
represents a monovalent aromatic organic group; Y
1
represents an alkylene group of 1 to 4 carbon atoms which may be fluorinated; and A
+
represents a cation.