2,5-Bis(1-ethoxyethoxy)cyclohexan-1-ol | 671223-91-9

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: 2,5-Bis(1-ethoxyethoxy)cyclohexan-1-ol
• CAS: 671223-91-9
• 化学式: C₁₄H₂₈O₅
• 分子量: 276.37
• InChiKey: RAPPFFJFBVRVDZ-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.8
• 重原子数：
  19
• 可旋转键数：
  8
• 环数：
  1.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  57.2
• 氢给体数：
  1
• 氢受体数：
  5

文献信息

• ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE SAME AND PATTERN FORMING METHOD
  申请人：Fujii Kana

  公开号：US20120003586A1

  公开（公告）日：2012-01-05

  Provided are an actinic ray-sensitive or radiation-sensitive resin composition; a resist film using the composition; and a pattern forming method. The actinic ray-sensitive or radiation-sensitive resin composition includes (A) a resin capable of increasing the solubility in an alkali developer by the action of an acid, the resin containing a repeating unit represented by formula (I), a repeating unit represented by formula (II) and a repeating unit represented by formula (III), and (B) a compound capable of generating a fluorine atom-containing acid upon irradiation with an actinic ray or radiation: wherein each of R 1 and R 11 independently represents a hydrogen atom or an alkyl group which may have a substituent, and R 12 represents a phenyl group which may have a substituent.

  提供了一种光致射线敏感或辐射敏感的树脂组合物；使用该组合物的光刻膜；以及一种图案形成方法。该光致射线敏感或辐射敏感的树脂组合物包括（A）一种树脂，能够通过酸的作用增加在碱性显影剂中的溶解度，该树脂含有由式（I）表示的重复单元、由式（II）表示的重复单元和由式（III）表示的重复单元；和（B）一种化合物，能够在光致射线或辐射照射下产生含氟酸基的酸：其中，R1和R11各自独立地表示氢原子或可能具有取代基的烷基，而R12表示可能具有取代基的苯基。
• Positive resist composition
  申请人：FUJIFILM Corporation

  公开号：EP1296190B1

  公开（公告）日：2010-05-05
• US7255971B2
  申请人：——

  公开号：US7255971B2

  公开（公告）日：2007-08-14
• US8541161B2
  申请人：——

  公开号：US8541161B2

  公开（公告）日：2013-09-24
• [EN] ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE SAME AND PATTERN FORMING METHOD<br/>[FR] COMPOSITION DE RÉSINE SENSIBLE AUX RAYONS ACTINIQUES OU AU RAYONNEMENT, FILM DE RESIST L'UTILISANT ET PROCÉDÉ DE FORMATION D'UN MOTIF
  申请人：FUJIFILM CORP

  公开号：WO2010110472A1

  公开（公告）日：2010-09-30

  Provided are an actinic ray-sensitive or radiation-sensitive resin composition; a resist film using the composition; and a pattern forming method. The actinic ray-sensitive or radiation-sensitive resin composition includes (A) a resin capable of increasing the solubility in an alkali developer by the action of an acid, the resin containing a repeating unit represented by formula (I), a repeating unit represented by formula (II) and a repeating unit represented by formula (III), and (B) a compound capable of generating a fluorine atom-containing acid upon irradiation with an actinic ray or radiation: wherein each of R1 and R11 independently represents a hydrogen atom or an alkyl group which may have a substituent, and R12 represents a phenyl group which may have a substituent.