2-Methyl-3,6,9,12-tetraoxatetradecane | 63095-30-7

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: 2-Methyl-3,6,9,12-tetraoxatetradecane
• 英文别名: 2-[2-[2-(2-ethoxyethoxy)ethoxy]ethoxy]propane
• CAS: 63095-30-7
• 化学式: C₁₁H₂₄O₄
• 分子量: 220.31
• InChiKey: IPJXGXLWHUYXCS-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  0.8
• 重原子数：
  15
• 可旋转键数：
  11
• 环数：
  0.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  36.9
• 氢给体数：
  0
• 氢受体数：
  4

文献信息

• DIARYLETHENE COMPOUNDS AND USES THEREOF
  申请人：SWITCH MATERIALS, INC.

  公开号：US20160083398A1

  公开（公告）日：2016-03-24

  A compound according to Formula IA and IB, reversibly convertible under photochromic and electrochromic conditions between a ring-open isomer A and a ring-closed isomer B is provided. For substitutent groups, Z is N, O or S; each R 1 is independently selected from the group consisting of H, or halo; each R 2 is independently selected from the group consisting of H, halo, a polymer backbone, alkyl or aryl; or, when both R 2 together form —CH═CH— and form part of a polymer backbone; each R 3 is independently selected from the group consisting of H, halo, alkyl, alkoxy, thioalkyl or aryl; each R 4 is aryl; and each R 5 is independently selected from the group consisting of H, halo, alkyl, alkoxy, thioalkyl or aryl.

  本发明提供了一种按照式IA和IB的化合物，在光致变色和电致变色条件下，可在环开放异构体A和环闭合异构体B之间可逆地转化。对于取代基，Z为N、O或S；每个R1独立地选自H或卤素；每个R2独立地选自H、卤素、聚合物骨架、烷基或芳基；或者，当两个R2一起形成-CH═CH-并形成聚合物骨架的一部分时；每个R3独立地选自H、卤素、烷基、烷氧基、硫代烷基或芳基；每个R4为芳基；每个R5独立地选自H、卤素、烷基、烷氧基、硫代烷基或芳基。
• US20140256936A1
  申请人：——

  公开号：US20140256936A1

  公开（公告）日：2014-09-11
• POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US20150212417A1

  公开（公告）日：2015-07-30

  A positive resist composition is provided comprising a polymer comprising recurring units having a carboxyl or phenolic hydroxyl group substituted with an acid labile group and recurring units of caramel furanone ester, and having a Mw of 1,000-500,000. The resist composition has a satisfactory effect of suppressing acid diffusion and a high resolution, and forms a pattern of good profile and minimal edge roughness after exposure.
• US7189493B2
  申请人：——

  公开号：US7189493B2

  公开（公告）日：2007-03-13
• US9227986B2
  申请人：——

  公开号：US9227986B2

  公开（公告）日：2016-01-05