1-Oxy-3-propionyloxyadamantan | 63001-22-9

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: 1-Oxy-3-propionyloxyadamantan
• 英文别名: (3-Hydroxy-1-adamantyl) propanoate
• CAS: 63001-22-9
• 化学式: C₁₃H₂₀O₃
• 分子量: 224.3
• InChiKey: KWSMJJIQODSRKW-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.8
• 重原子数：
  16
• 可旋转键数：
  3
• 环数：
  4.0
• sp3杂化的碳原子比例：
  0.92
• 拓扑面积：
  46.5
• 氢给体数：
  1
• 氢受体数：
  3

文献信息

• Oxime sulfonates and the use thereof as latent acids
  申请人：Yamato Hitoshi

  公开号：US20100167178A1

  公开（公告）日：2010-07-01

  Compounds of the formula (I), (II) or (III), wherein R 1 is for example C 1 -C 18 alkylsulfonyl, C 1 -C 10 haloalkylsulfonyl, camphorylsulfonyl, phenyl-C 1 -C 3 alkylsulfonyl, phenylsulfonyl, naphthylsulfonyl, anthrylsulfonyl, phenanthrylsulfonyl or heteroarylsulfonyl, R′ 1 is for example phenylenedisulfonyl, R 2 is for example CN, C 1 -C 10 haloalkyl or C 1 -C 10 haloalkyl which is substituted by (IV); Ar 1 is for example phenyl optionally substituted by a group of formula (IV); Ar′ 1 is for example phenylene which optionally is substituted by a group of formula (IV); A 1 , A 2 and A 3 independently of each other are for example hydrogen, halogen, CN, or C 1 -C 18 alkyl; D 2 is for example a direct bond, O, (CO)O, (CO)S, SO 2 , OSO 2 or C 1 -C 18 alkylene; or A 3 and D 2 together form C 3 -C 30 cycloalkenyl; or A 2 and D 2 together with the carbon of the ethylenically unsaturated double bond to which they are attached form C 3 -C 30 cycloalkyl; D 3 and D 4 for example independently of each other are a direct bond, O, S, C 1 -C 18 alkylene or C 3 -C 30 cycloalkylene provided that at least one of the radicals R 2 , Ar 1 or Ar′ 1 comprises a group of the formula (IV); are suitable as photolatent acid donors and for the preparation of corresponding polymers to be employed in chemically amplified photoresists.

  化合物的公式为（I），（II）或（III），其中R1例如为C1-C18烷基磺酰基，C1-C10卤代烷基磺酰基，樟脑磺酰基，苯基-C1-C3烷基磺酰基，苯基磺酰基，萘基磺酰基，蒽基磺酰基，菲磺酰基或杂环芳基磺酰基，R'1例如为苯基二磺酰基，R2例如为CN，C1-C10卤代烷基或被（IV）取代的C1-C10卤代烷基；Ar1例如为苯基，可选地被公式（IV）的基团取代；Ar'1例如为苯基，可选地被公式（IV）的基团取代；A1，A2和A3独立地例如为氢，卤素，CN或C1-C18烷基；D2例如为直接键，O，（CO）O，（CO）S，SO2，OSO2或C1-C18烷基；或A3和D2一起形成C3-C30环烯基；或A2和D2与它们所附着的乙烯基双键的碳一起形成C3-C30环烷基；D3和D4例如独立地为直接键，O，S，C1-C18烷基或C3-C30环烷基，至少其中之一的基团R2，Ar1或Ar'1包含公式（IV）的基团，适用作光激发酸给体，并用于制备相应的聚合物，以用于化学增强型光刻胶。
• MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：EP3168207A1

  公开（公告）日：2017-05-17

  A monomer of formula (1a) or (1b) is provided wherein A is a polymerizable group, R1-R6 are monovalent hydrocarbon groups, X1 is a divalent hydrocarbon group, Z1 is an aliphatic group, Z2 forms an alicyclic group, k = 0 or 1, m = 1 or 2, n = 1 to 4. A useful polymer is obtained by polymerizing the monomer. A resist composition comprising the polymer has improved development properties and is processed to form a negative pattern having high contrast, high resolution and etch resistance which is insoluble in alkaline developer.

  提供了式 (1a) 或 (1b) 单体，其中 A 是可聚合基团，R1-R6 是一价烃基团，X1 是二价烃基团，Z1 是脂肪族基团，Z2 形成脂环族基团，k = 0 或 1，m = 1 或 2，n = 1 至 4。包含该聚合物的抗蚀剂组合物具有更好的显影性能，经处理后可形成具有高对比度、高分辨率和抗蚀刻性的阴图，且不溶于碱性显影剂。
• COMPOUND AND CHEMICALLY AMPLIFIED RESIST COMPOSITION CONTAINING THE SAME
  申请人：Takemoto Ichiki

  公开号：US20100151379A1

  公开（公告）日：2010-06-17

  The present invention provides a compound represented by the formula (I): wherein P 1 , P 2 , P 3 , P 4 and P 5 each independently represents a hydrogen atom etc., and at least one selected from the group consisting of R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 , R 8 and R 9 is the group represented by the formula (II): wherein X 1 and X 2 each independently represent a hydrogen atom etc., n represents an integer of 1 to 4, Z 1 represents a C1-C6 alkyl group etc., and ring Y represents an alicyclic hydrocarbon group, and the others each independently represent a hydrogen atom, a C1-C6 alkyl group or a hydroxyl group, and a chemically amplified resist composition containing the same.
• COPOLYMER FOR RESIST COMPRISING NOVEL ACRYL BASED MONOMER AND RESIN COMPOSITION FOR RESIST COMPRISING THE SAME
  申请人：SHIN Jin Bong

  公开号：US20120251952A1

  公开（公告）日：2012-10-04

  A resist resin composition includes 100 parts by weight of a copolymer represented by Formula 3 below; 0.5 to 1.5 parts by weight of a photoacid generator and 700 to 1,500 parts by weight of a solvent: wherein R 1 , R 2 , and R 3 are each independently a C 1-30 alkyl group or a C 3-30 cycloalkyl group that has or does not have hydrogen, an ether group, an ester group, a carbonyl group, an acetal group, an epoxy group, a nitrile group, or an aldehyde group, R 4 , R 5 , and R 6 are each independently hydrogen or a methyl group, and l, m, n, and o each independently refer to the number of repeating units in a main backbone and satisfy the conditions: l+m+n+o=1, 0≦l/(l+m+n+o)<0.4, 0
• US8158329B2
  申请人：——

  公开号：US8158329B2

  公开（公告）日：2012-04-17