steareth-15 | 13440-28-3

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: steareth-15
• 英文别名: 2-[2-[2-[2-[2-[2-[2-[2-[2-[2-[2-[2-[2-[2-(2-Octadecoxyethoxy)ethoxy]ethoxy]ethoxy]ethoxy]ethoxy]ethoxy]ethoxy]ethoxy]ethoxy]ethoxy]ethoxy]ethoxy]ethoxy]ethanol
• CAS: 13440-28-3
• 化学式: C₄₈H₉₈O₁₆
• 分子量: 931.297
• InChiKey: YMQVYKBIPDKDJA-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  6.3
• 重原子数：
  64
• 可旋转键数：
  61
• 环数：
  0.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  159
• 氢给体数：
  1
• 氢受体数：
  16

反应信息

• 作为反应物：
  描述：

  马来酸酐 、 steareth-15 反应 10.0h， 生成
  参考文献：
  名称：

  改性双尾阴离子表面活性剂的制备及表面活性

  摘要：

  我们制备了一系列改性的双尾表面活性剂，其中包含两个相同的非离子部分和一个阴离子间隔基。通过使两摩尔聚氧乙烯烷基醚与一摩尔马来酸酐反应以形成具有双子结构的二酯来制备每种表面活性剂。然后通过烯键与亚硫酸氢钠的反应引入阴离子磺酸盐基团。这些化合物的结构通过红外光谱，核磁共振光谱和元素分析得到证实。这些改性的双尾表面活性剂具有良好的表面性能，包括低泡，润湿和石灰皂分散能力。它们对分散染料的优异分散能力是由于表面活性剂的双尾结构，

  DOI：

  10.1007/s11743-012-1345-0

文献信息

• Curable composition and cured product thereof, method for producing cured product, method for manufacturing optical component, method for manufacturing circuit board, and method for manufacturing electronic component
  申请人：CANON KABUSHIKI KAISHA

  公开号：US10023673B2

  公开（公告）日：2018-07-17

  To provide a curable composition for nanoimprinting that can form a cured product that has a sufficiently cured surface and is less prone to a pattern collapse defect even when the curable composition is cured by a photo-nanoimprint method at a low exposure dose. To provide a nanoimprint method for forming such a cured product. To provide a cured product that is less prone to a pattern collapse defect even when cured at a low exposure dose, a method for producing such a cured product, a method for manufacturing an optical component, a method for manufacturing a circuit board, and a method for manufacturing an electronic component. A curable composition that satisfies the formula (1) in a cured state: Er1/Er2≥1.10  (1) wherein Er1 denotes the surface reduced modulus (GPa) of a cured product of the curable composition, and Er2 denotes the internal reduced modulus (GPa) of the cured product.

  提供一种用于纳米压印的可固化组合物，即使该可固化组合物以低曝光剂量通过光纳米压印方法固化，也能形成具有充分固化表面且不易出现图案塌陷缺陷的固化产品。提供一种形成这种固化产品的纳米压印方法。提供一种即使在低曝光剂量下固化也不易出现图案塌陷缺陷的固化产品、一种生产这种固化产品的方法、一种制造光学元件的方法、一种制造电路板的方法和一种制造电子元件的方法。 在固化状态下满足式（1）的可固化组合物： Er1/Er2≥1.10 (1) 其中 Er1 表示固化组合物固化产物的表面还原模量（GPa），Er2 表示固化产物的内部还原模量（GPa）。
• CURABLE COMPOSITION AND CURED PRODUCT THEREOF, METHOD FOR PRODUCING CURED PRODUCT, METHOD FOR MANUFACTURING OPTICAL COMPONENT, METHOD FOR MANUFACTURING CIRCUIT BOARD, AND METHOD FOR MANUFACTURING ELECTRONIC COMPONENT
  申请人：CANON KABUSHIKI KAISHA

  公开号：US20170183437A1

  公开（公告）日：2017-06-29

  To provide a curable composition for nanoimprinting that can form a cured product that has a sufficiently cured surface and is less prone to a pattern collapse defect even when the curable composition is cured by a photo-nanoimprint method at a low exposure dose. To provide a nanoimprint method for forming such a cured product. To provide a cured product that is less prone to a pattern collapse defect even when cured at a low exposure dose, a method for producing such a cured product, a method for manufacturing an optical component, a method for manufacturing a circuit board, and a method for manufacturing an electronic component. A curable composition that satisfies the formula (1) in a cured state: Er 1 /Er 2 ≧1.10  (1) wherein Er 1 denotes the surface reduced modulus (GPa) of a cured product of the curable composition, and Er 2 denotes the internal reduced modulus (GPa) of the cured product.