申请人:DIC Corporation
公开号:US20180334523A1
公开(公告)日:2018-11-22
Provided are a novolac resin having developability, heat resistance, and dry etching resistance, and a photosensitive composition, a curable composition, and a resist film. A novolac resin including, as a repeating unit, a structural moiety represented by Structural Formula (1) or (2):
(in the formula, Ar represents an arylene group, R
1
's each independently represent any one of a hydrogen atom, an alkyl group, an alkoxy group, and a halogen atom, m's each independently represent an integer of 1 to 3, and X is any one of a hydrogen atom, a tertiary alkyl group, an alkoxyalkyl group, an acyl group, an alkoxycarbonyl group, a hetero atom-containing cyclic hydrocarbon group, and a trialkylsilyl group) in which at least one of X's present in the resin is any one of a tertiary alkyl group, an alkoxyalkyl group, an acyl group, an alkoxycarbonyl group, a hetero atom-containing cyclic hydrocarbon group, and a trialkylsilyl group.
提供一种具有可开发性、耐热性和干法蚀刻抗性的新戊醛树脂,以及一种光敏组合物、可固化组合物和抗蚀膜。一种新戊醛树脂包括以下结构单元:
(在公式中,Ar代表芳基,R
1
分别独立地代表氢原子、烷基、烷氧基和卤素原子中的任意一种,m分别独立地代表1至3的整数,X代表氢原子、三级烷基、烷氧基烷基、酰基、烷氧羰基、含杂原子的环烃基和三烷基硅基中的任意一种),树脂中至少有一个X是三级烷基、烷氧基烷基、酰基、烷氧羰基、含杂原子的环烃基和三烷基硅基中的任意一种。