2-硫代-6-氮杂尿苷 | 27089-56-1

• 分子结构分类: 有机化合物 - 有机氧化合物
• 中文名称: 2-硫代-6-氮杂尿苷
• 英文名称: 2-Thio-6-aza-uridin
• 英文别名: 2-thio-6-azauridine；2-[(2R,3R,4S,5R)-3,4-dihydroxy-5-(hydroxymethyl)oxolan-2-yl]-3-sulfanylidene-1,2,4-triazin-5-one
• CAS: 27089-56-1
• 化学式: C₈H₁₁N₃O₅S
• 分子量: 261.258
• InChiKey: TVCBDTCUOVDLNZ-SHUUEZRQSA-N

物化性质

• 熔点：
  201-203 °C(lit.)
• 密度：
  2.02±0.1 g/cm3 (20 ºC 760 Torr)

计算性质

• 辛醇/水分配系数(LogP)：
  -1.3
• 重原子数：
  17
• 可旋转键数：
  2
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.62
• 拓扑面积：
  116
• 氢给体数：
  4
• 氢受体数：
  7

安全信息

• WGK Germany：
  3

文献信息

• Chemical Mechanical Polishing Slurry Composition for Shallow Trench Isolation Process of Semiconductor
  申请人：Nam Ho-Seong

  公开号：US20070220813A1

  公开（公告）日：2007-09-27

  The present invention is related to a chemical-mechanical polishing slurry for shallow trench isolation, more concretely, to a chemical-mechanical polishing slurry comprising an aqueous abrasive solution comprised of deionized water, polishing particles, and a polishing particle dispersant; and an aqueous additive solution comprised of a carboxylic acid polymer compound, a nitrogen-containing organic cyclic compound, and an amine-group compound. The removal selectivity of the slurry may be improved by significantly lowering the speed of polishing of nitride film by adding a nitrogen-containing organic cyclic compound to an acrylic acid polymer compound, and by increasing the speed of removal of silicon oxide film by adding an amine-group compound, which is an accelerator of hydrolysis of silicon oxide film.
• HUMAN PARAINFLUENZA VIRUS TYPE 3 EXPRESSING THE ENHANCED GREEN FLUORESCENT PROTEIN FOR USE IN HIGH-THROUGHPUT ANTIVIRAL ASSAYS
  申请人：Roth Jason Peter

  公开号：US20100316991A1

  公开（公告）日：2010-12-16

  Disclosed herein is a recombinant human parainfluenza virus expressing the enhanced green fluorescent protein. Methods of making and methods of using a recombinant human parainfluenza virus expressing the enhanced green fluorescent protein are also disclosed. A recombinant human parainfluenza virus expressing the enhanced green fluorescent protein was rescued and evaluated for its use in antiviral assays. Without limiting the invention, in one example, there is provided a cDNA clone of SEQ ID NO: 1.
• US3975374A
  申请人：——

  公开号：US3975374A

  公开（公告）日：1976-08-17
• US7497966B2
  申请人：——

  公开号：US7497966B2

  公开（公告）日：2009-03-03
• [EN] CHEMICAL MECHANICAL POLISHING SLURRY COMPOSITION FOR SHALLOW TRENCH ISOLATION PROCESS OF SEMICONDUCTOR<br/>[FR] COMPOSITION DE PATE DE POLISSAGE CHIMIOMECANIQUE SERVANT A ISOLER UNE TRANCHEE PEU PROFONDE DE SEMI-CONDUCTEUR
  申请人：HANWHA CHEMICAL CORP

  公开号：WO2006004258A1

  公开（公告）日：2006-01-12

  The present invention is related to a chemical-mechanical polishing slurry for shallow trench isolation, more concretely, to a chemical-mechanical polishing slurry comprising an aqueous abrasive solution comprised of deionized water, polishing particles, and a polishing particle dispersant; and an aqueous additive solution comprised of a carboxylic acid polymer compound, a nitrogen-containing organic cyclic compound, and an amine-group compound. The removal selectivity of the slurry may be improved by significantly lowering the speed of polishing of nitride film by adding a nitrogen-containing organic cyclic compound to an acrylic acid polymer compound, and by increasing the speed of removal of silicon oxide film by adding an amine- group compound, which is an accelerator of hydrolysis of silicon oxide film.

表征谱图