(2R,3S,4S,5S,6S)-2-(hydroxymethyl)-6-(3-hydroxypropoxy)oxane-3,4,5-triol | 1310450-17-9

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: (2R,3S,4S,5S,6S)-2-(hydroxymethyl)-6-(3-hydroxypropoxy)oxane-3,4,5-triol
• CAS: 1310450-17-9
• 化学式: C₉H₁₈O₇
• 分子量: 238.238
• InChiKey: NZVFKYQBYRSBTH-DFTQBPQZSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  -2.5
• 重原子数：
  16
• 可旋转键数：
  5
• 环数：
  1.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  120
• 氢给体数：
  5
• 氢受体数：
  7

反应信息

• 作为产物：
  描述：

  (2S,3S,4S,5S,6R)-2-[3-[[3-(dimethylamino)phenyl]-diphenylmethoxy]propoxy]-6-(hydroxymethyl)oxane-3,4,5-triol 以 甲醇 、 乙腈 为溶剂， 反应 4.5h， 以84%的产率得到(2R,3S,4S,5S,6S)-2-(hydroxymethyl)-6-(3-hydroxypropoxy)oxane-3,4,5-triol
  参考文献：
  名称：

  Development of Trityl-Based Photolabile Hydroxyl Protecting Groups

  摘要：

  A series of trityl-based photolabile hydroxyl protecting groups have been examined. These PPGs evolve from the traditional acid-labile trityl protecting group with proper electron-donating substituents. Structure-reactivity relationships have been explored. A m-dimethylamino group is crucial to achieve high photochemical deprotection efficiency. The o-hydroxyl group in 8 greatly improves the yield of the photochemical deprotection reaction, compared with the corresponding o-methoxyl-substituted counterpart 7. However, comparison between the photoreactions of 9 and 11 does not show similar structural relevance. The PPG in ether I (i.e., DMATr group) is structurally simple and easy to prepare and install. Its deprotection can be successfully carried out with irradiation of sunlight without requirement of photochemical devices.

  DOI：

  10.1021/jo200692c

文献信息

• EP0901513A4
  申请人：——

  公开号：EP0901513A4

  公开（公告）日：2000-11-15
• SUGAR SURFACTANTS COMBINED WITH SPECIFIC POLYQUATERNIUM COMPONENT
  申请人：HENKEL CORPORATION

  公开号：EP0901513A1

  公开（公告）日：1999-03-17
• [EN] SUGAR SURFACTANTS COMBINED WITH SPECIFIC POLYQUATERNIUM COMPONENT<br/>[FR] TENSIOACTIFS DE GLUCIDIQUES COMBINES AVEC DES COMPOSANTS POLYQUATERNIUM SPECIFIQUES
  申请人：HENKEL CORPORATION

  公开号：WO1997042281A1

  公开（公告）日：1997-11-13

  (EN) A surfactant composition containing: (a) a nonionic sugar surfactant selected from the group consisting of alkyl glucose esters, aldobionamides, gluconamides, glyceramides, glyceroglycolipids, polyhydroxy fatty acid amides, alkyl polyglycosides having general formula (I): R1O(R2O)b(Z)a wherein R1 is a monovalent organic radical having from about 6 to about 30 carbon atoms; R2 is divalent alkylene radical having from 2 to 4 carbon atoms; Z is a saccharide residue having 5 or 6 carbons atoms; b is a number having a value from 0 to about 12; a is a number having a value from 1 to about 6, and mixtures thereof; and (b) an additive consisting of a copolymer of acrylamide and dimethyl diallyl ammonium chloride.(FR) Composition tensioactive contenant: (a) un tensioactif glucidique non ionique choisi dans le groupe comprenant les esters d'alkyl-glucose, tels aldobionamides, les gluconamides, les glycéramides, les glycéroglycolipides, les amides d'acides gras poylhydroxylés, les alkyl polyglycosides définis par la formule générale (I): R1O(R2O)b(Z)a dans laquelle R1 est un radical organique monovalent ayant environ 6 à environ 30 atomes de carbone; R2 est un radical alkylène divalent qui a entre 2 et 4 atomes de carbone; Z est un résidu saccharide à 5 ou 6 atomes de carbone; b est un nombre compris entre 0 et environ 12; a est un nombre compris entre 1 et environ 6, et des mélanges de ces composés, et (b) un additif consistant en un copolymère d'acrylamide et de chlorure diméthyldiallylammonium.
• [EN] PROCESS FOR MAKING SKIN CLEANSING COMBINATION SOAP BARS AND CLEANSING LIQUIDS<br/>[FR] PROCEDE DE PREPARATION D'UNE COMBINAISON DE BARRES DE SAVON ET DE LIQUIDES DE TOILETTE
  申请人：HENKEL CORPORATION

  公开号：WO1998006800A1

  公开（公告）日：1998-02-19

  (EN) A surfactant composition consisting essentially of: (a) from about 20 to about 63 % by weight of an acyl isethionate; (b) from about 3 to about 52 % by weight of a nonionic sugar surfactant selected from the group consisting of alkyl glucose esters, aldobionamides, gluconamides, glyceramides, glyceroglycolipids, polyhydroxy fatty acid amides, alkyl polyglycosides having general formula (I): R1O(R2O)b(Z)a, wherein R1 is a monovalent organic radical having from about 6 to about 30 carbon atoms; R2 is a divalent alkylene radical having from 2 to 4 carbon atoms; Z is a saccharide residue having 5 or 6 carbon atoms; b is a number having a value from 0 to about 12; a is a number having a value from 1 to about 6, and mixtures thereof; (c) from about 7 to about 23 % by weight of a free fatty acid; and (d) remainder, water, all weights being based on the weight of the surfactant composition.(FR) Composition tensioactive constituée essentiellement par (a) 20 à 63 % d'un iséthionate d'acyle et (b) 3 à 52 % en poids d'un tensioactif de sucre non-ionique sélectionné dans le groupe constitué par des esters de glucose d'alkyle, des aldobionamides, des gluconamides, des glycéramides, des glycéroglycolipides, des amides d'acides polyhydroxy gras, des polyglycosides d'alkyle représentés par la formule (I): R1O(R2O)b(Z)a dans laquelle R1 représente un radical organique monovalent possédant de 6 à 30 atomes de carbone; R2 représente un radical divalent d'alkylène possédant de 2 à 4 atomes de carbone; Z représente un résidu de saccharide possédant de 5 à 6 atomes de carbones; b est un nombre possédant une valeur entre 0 et 12; a est un nombre possédant une valeur entre 1 et 6, ainsi que leurs mélanges; (c) 7 à 23 % d'un acide gras libre; le reste (c) étant constitué par de l'eau, tous les poids étant basés sur le poids de la composition tensioactive.
• Development of Trityl-Based Photolabile Hydroxyl Protecting Groups
  作者：Lei Zhou、Haishen Yang、Pengfei Wang

  DOI：10.1021/jo200692c

  日期：2011.8.5

  A series of trityl-based photolabile hydroxyl protecting groups have been examined. These PPGs evolve from the traditional acid-labile trityl protecting group with proper electron-donating substituents. Structure-reactivity relationships have been explored. A m-dimethylamino group is crucial to achieve high photochemical deprotection efficiency. The o-hydroxyl group in 8 greatly improves the yield of the photochemical deprotection reaction, compared with the corresponding o-methoxyl-substituted counterpart 7. However, comparison between the photoreactions of 9 and 11 does not show similar structural relevance. The PPG in ether I (i.e., DMATr group) is structurally simple and easy to prepare and install. Its deprotection can be successfully carried out with irradiation of sunlight without requirement of photochemical devices.