Selectivity of tetrahydrofuran formation from inactivated aliphatic alcohols by the bromine-silver-salt reaction
作者:Nina Matheny Roscher、D. Kent Shaffar
DOI:10.1016/s0040-4020(01)96881-4
日期:1984.1
Studies of the bromine-silver carbonate reaction with aliphatic alcohols in which intramoleular δ-H competition is possible are generally quite specific. Loss of tertiary δ- hydrogen occurs preferentially from both tertiary and secondary alfphatic alcohols to yield the most highly substituted cyclic ether. For example, 2,5-dimethyl-2-octanol yields only 2,2,5-trimethyl-5-propyletrahydrofuran as the
Guerbet, Comptes Rendus Hebdomadaires des Seances de l'Academie des Sciences, 1912, vol. 154, p. 714
作者:Guerbet
DOI:——
日期:——
ROSCHER, N. M.;SHAFFER, D. K., TETRAHEDRON, 1984, 40, N 14, 2643-2650
作者:ROSCHER, N. M.、SHAFFER, D. K.
DOI:——
日期:——
KIT D'ATTRACTIFS POUR ATTIRER LE SCOLYTE DU CAFE
申请人:Institut National de la Recherche Agronomique
公开号:EP3550970A1
公开(公告)日:2019-10-16
RESIST PATTERN COATING AGENT AND RESIST PATTERN FORMING METHOD USING THE SAME
申请人:YADA Yuji
公开号:US20110223544A1
公开(公告)日:2011-09-15
A resist pattern coating agent includes a hydroxyl group-containing resin and a solvent. The solvent includes an alcohol shown by a following formula (1) in an amount of about 30 mass % or more,
R—OH (1)
wherein R represents a branched alkyl group having 3 to 10 carbon atoms. The resist pattern coating agent is used in a resist pattern-forming method. The method includes forming a first resist pattern on a substrate using a first radiation-sensitive resin composition. The first resist pattern is treated with the resist pattern coating agent. A second resist pattern is formed on the substrate treated with the resist pattern coating agent using a second radiation-sensitive resin composition.