2-adamantyloxymethyl methacrylate | 791611-93-3

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: 2-adamantyloxymethyl methacrylate
• 英文别名: (2-Adamantyloxymethyl)methacrylate；2-adamantyloxymethyl 2-methylprop-2-enoate
• CAS: 791611-93-3
• 化学式: C₁₅H₂₂O₃
• 分子量: 250.338
• InChiKey: MCUUWZPZTJNAHA-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.4
• 重原子数：
  18
• 可旋转键数：
  5
• 环数：
  4.0
• sp3杂化的碳原子比例：
  0.8
• 拓扑面积：
  35.5
• 氢给体数：
  0
• 氢受体数：
  3

反应信息

• 作为产物：
  描述：

  甲基丙烯酸 、 三乙胺 、 2-Adamantyloxymethyl chloride 在 乙酸乙酯 、 水 作用下， 以 四氢呋喃 为溶剂， 反应 12.0h， 生成 2-adamantyloxymethyl methacrylate
  参考文献：
  名称：

  Positive resist composition and method of forming resist pattern

  摘要：

  一种正性光阻组合物，包括树脂组分（A）和酸作用下表现出增强碱溶性的酸敏感组分（B）。其中，组分（A）包括一个由通式（a1-2）或（a1-4）表示的结构单元（a1），一个源自含有内酯基的单环或多环基团的丙烯酸酯的结构单元（a2），以及一个与结构单元（a1）和结构单元（a2）不同且源自含有脂环基的非酸解离、抑制溶解基团和不含极性基团的丙烯酸酯的结构单元（a3）。组分（B）包括一个离子盐（B1），其阴离子部分由公式R41—SO3−表示。

  公开号：

  US07803512B2

文献信息

• RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND POLYMERIC COMPOUND
  申请人：Tokyo Ohka Kogyo Co., Ltd.

  公开号：US20140221673A1

  公开（公告）日：2014-08-07

  A resist composition including a base component (A) which exhibits changed solubility in a developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the base component (A) containing a polymeric compound (A1) having a structural unit (a5) represented by general formula (a5-0) shown below (R 1 represents a sulfur atom or an oxygen atom; R 2 represents a single bond or a divalent linking group; and Y represents an aromatic hydrocarbon group or an aliphatic hydrocarbon group having a polycyclic group, provided that the aromatic hydrocarbon group or the aliphatic hydrocarbon may have a carbon atom or a hydrogen atom thereof substituted with a substituent.

  一种抗蚀组合物，包括基础组分（A），在酸的作用下在显影溶液中表现出改变的溶解性，以及在暴露后生成酸的酸发生器组分（B），基础组分（A）包含具有下述通用式（a5-0）所示的结构单元（a5）的聚合物化合物（A1）（R1代表硫原子或氧原子；R2代表单键或二价连接基团；Y代表芳香烃基团或具有多环基团的脂肪烃基团，前提是芳香烃基团或脂肪烃基团可以有其中的碳原子或氢原子被取代的取代基）。
• Bottom Antireflective Coating Compositions
  申请人：Houlihan Francis M.

  公开号：US20090104559A1

  公开（公告）日：2009-04-23

  Developable bottom antireflective coating compositions are provided.

  提供可开发底部防反射涂层组合物。
• Oxime sulfonates and the use thereof as latent acids
  申请人：Yamato Hitoshi

  公开号：US20100167178A1

  公开（公告）日：2010-07-01

  Compounds of the formula (I), (II) or (III), wherein R 1 is for example C 1 -C 18 alkylsulfonyl, C 1 -C 10 haloalkylsulfonyl, camphorylsulfonyl, phenyl-C 1 -C 3 alkylsulfonyl, phenylsulfonyl, naphthylsulfonyl, anthrylsulfonyl, phenanthrylsulfonyl or heteroarylsulfonyl, R′ 1 is for example phenylenedisulfonyl, R 2 is for example CN, C 1 -C 10 haloalkyl or C 1 -C 10 haloalkyl which is substituted by (IV); Ar 1 is for example phenyl optionally substituted by a group of formula (IV); Ar′ 1 is for example phenylene which optionally is substituted by a group of formula (IV); A 1 , A 2 and A 3 independently of each other are for example hydrogen, halogen, CN, or C 1 -C 18 alkyl; D 2 is for example a direct bond, O, (CO)O, (CO)S, SO 2 , OSO 2 or C 1 -C 18 alkylene; or A 3 and D 2 together form C 3 -C 30 cycloalkenyl; or A 2 and D 2 together with the carbon of the ethylenically unsaturated double bond to which they are attached form C 3 -C 30 cycloalkyl; D 3 and D 4 for example independently of each other are a direct bond, O, S, C 1 -C 18 alkylene or C 3 -C 30 cycloalkylene provided that at least one of the radicals R 2 , Ar 1 or Ar′ 1 comprises a group of the formula (IV); are suitable as photolatent acid donors and for the preparation of corresponding polymers to be employed in chemically amplified photoresists.

  化合物的公式为（I），（II）或（III），其中R1例如为C1-C18烷基磺酰基，C1-C10卤代烷基磺酰基，樟脑磺酰基，苯基-C1-C3烷基磺酰基，苯基磺酰基，萘基磺酰基，蒽基磺酰基，菲磺酰基或杂环芳基磺酰基，R'1例如为苯基二磺酰基，R2例如为CN，C1-C10卤代烷基或被（IV）取代的C1-C10卤代烷基；Ar1例如为苯基，可选地被公式（IV）的基团取代；Ar'1例如为苯基，可选地被公式（IV）的基团取代；A1，A2和A3独立地例如为氢，卤素，CN或C1-C18烷基；D2例如为直接键，O，（CO）O，（CO）S，SO2，OSO2或C1-C18烷基；或A3和D2一起形成C3-C30环烯基；或A2和D2与它们所附着的乙烯基双键的碳一起形成C3-C30环烷基；D3和D4例如独立地为直接键，O，S，C1-C18烷基或C3-C30环烷基，至少其中之一的基团R2，Ar1或Ar'1包含公式（IV）的基团，适用作光激发酸给体，并用于制备相应的聚合物，以用于化学增强型光刻胶。
• NOVEL SULFONATE AND ITS DERIVATIVE, PHOTOSENSITIVE ACID GENERATOR, AND RESIST COMPOSITION AND PATTERNING PROCESS USING THE SAME
  申请人：OHASHI Masaki

  公开号：US20100209827A1

  公开（公告）日：2010-08-19

  There is disclosed a sulfonate shown by the following general formula (2). R 1 —COOC(CF 3 ) 2 —CH 2 SO 3 − M + (2) (In the formula, R 1 represents a linear, a branched, or a cyclic monovalent hydrocarbon group having 1 to 50 carbon atoms optionally containing a hetero atom. M + represents a cation.) There can be provided: a novel sulfonate which is effective for a chemically amplified resist composition having a sufficiently high solubility (compatibility) in a resist solvent and a resin, a good storage stability, a PED stability, a further wider depth of focus, a good sensitivity, in particular a high resolution and a good pattern profile form; a photosensitive acid generator; a resist composition using this; a photomask blank, and a patterning process.

  本发明揭示了一种磺酸盐，其通式如下（2）所示。 R1-COOC（CF3）2-CH2SO3-M+（2）（其中，R1表示具有1至50个碳原子的线性、分支或环状单价碳氢基团，可选含有杂原子。M+表示一个阳离子）。本发明可以提供：一种新型磺酸盐，其在抗蚀剂溶剂和树脂中具有足够高的溶解度（相容性），良好的储存稳定性，PED稳定性，进一步扩大焦点深度，良好的灵敏度，特别是高分辨率和良好的图案轮廓形态；一种光敏酸发生剂；使用该组合物的抗蚀剂组合物；一种光掩膜空白，以及一种制图工艺。
• POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD
  申请人：Kinoshita Yohei

  公开号：US20090035698A1

  公开（公告）日：2009-02-05

  The present invention is a positive resist composition and a resist pattern forming method including a resin component (A) which has a polymer compound (A1) having a structural units (a1) including an acetal type acid dissociable, dissolution inhibiting group, a structural unit (a2) derived from an acrylate ester having a lactone-containing polycyclic group, and a structural unit (a3) derived from an acrylate ester having a polar group-containing aliphatic hydrocarbon group, and an acid generator component (B) having an onium salt-based acid generator (B1) having a cation portion represented by a general formula (b-1) shown below [wherein, R 11 represents an alkyl group, an alkoxy group, a halogen atom or a hydroxyl group; R 12 to R 13 each represents, independently, an aryl group or the alkyl group that may have substituent group; n′ represents either 0 or an integer from 1 to 3].

  本发明涉及一种正性光阻组合物和一种光阻图案形成方法，包括树脂组分（A）和酸发生剂组分（B）。其中，树脂组分（A）包括聚合物化合物（A1），其具有包括缩醛型酸解离、溶解抑制基的结构单元（a1），源自含有内酯基多环芳香族基团的丙烯酸酯的结构单元（a2），以及源自含有极性基团的脂肪族烃基的丙烯酸酯的结构单元（a3）；酸发生剂组分（B）包括一个离子型盐基酸发生剂（B1），其阳离子部分由下式（b-1）表示[其中，R11代表烷基、烷氧基、卤素原子或羟基；R12到R13各自独立地代表芳基或可能具有取代基的烷基；n'代表0或1到3的整数]。