4-(1H-1,2,4-三唑-5-基)苯甲酸 | 876715-40-1

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 唑类
• 中文名称: 4-(1H-1,2,4-三唑-5-基)苯甲酸
• 英文名称: 4-(4H-1,2,4-triazol-3-yl)benzoic acid
• 英文别名: 4-(1H-1,2,4-triazol-5-yl)benzoic acid
• CAS: 876715-40-1
• 化学式: C₉H₇N₃O₂
• mdl: MFCD07643206
• 分子量: 189.173
• InChiKey: BNQHSXYQJHXBMM-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.2
• 重原子数：
  14
• 可旋转键数：
  2
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.0
• 拓扑面积：
  78.9
• 氢给体数：
  2
• 氢受体数：
  4

安全信息

• 危险等级：
  IRRITANT
• 危险品标志：
  Xi
• 海关编码：
  2933990090

反应信息

• 作为反应物：
  描述：

  4-(1H-1,2,4-三唑-5-基)苯甲酸 在 lithium aluminium tetrahydride 、 甲醇 作用下， 以 四氢呋喃 为溶剂， 以97%的产率得到(4-(1H-1,2,4-triazol-3-yl)phenyl)methanol
  参考文献：
  名称：

  WO2008/51494

  摘要：

  公开号：

文献信息

• [EN] AMINOMETHYL QUINOLONE COMPOUNDS<br/>[FR] COMPOSÉS D'AMINOMÉTHYL-QUINOLONE
  申请人：HOFFMANN LA ROCHE

  公开号：WO2013007676A1

  公开（公告）日：2013-01-17

  The invention relates to JNK inhibitors and corresponding methods, formulations, and compositions for inhibiting JNK and treating JNK-mediated disorders. The application discloses JNK inhibitors, as described below in Formula (I): wherein the variables are as defined herein. The compounds and compositions disclosed herein are useful to modulate the activity of JNK and treat diseases associated with JNK activity. Disclosed are methods and formulations for inhibiting JNK and treating JNK-mediated disorders, and the like, with the compounds, and processes for making said compounds, and corresponding compositions, disclosed herein.

  这项发明涉及JNK抑制剂及相应的用于抑制JNK和治疗JNK介导的疾病的方法、配方和组合物。该申请披露了JNK抑制剂，如下所述的化学式(I)：其中变量如本文所定义。本文披露的化合物和组合物可用于调节JNK的活性并治疗与JNK活性相关的疾病。还披露了用于抑制JNK和治疗JNK介导的疾病等的方法和配方，以及用于制备上述化合物和相应组合物的过程。
• AMINOMETHYL QUINOLONE COMPOUNDS
  申请人：Bilotta Joseph A.

  公开号：US20130018043A1

  公开（公告）日：2013-01-17

  The invention relates to JNK inhibitors and corresponding methods, formulations, and compositions for inhibiting JNK and treating JNK-mediated disorders. The application discloses JNK inhibitors, as described below in Formula I: wherein the variables are as defined herein. The compounds and compositions disclosed herein are useful to modulate the activity of JNK and treat diseases associated with JNK activity. Disclosed are methods and formulations for inhibiting JNK and treating JNK-mediated disorders, and the like, with the compounds, and processes for making said compounds, and corresponding compositions, disclosed herein.

  本发明涉及JNK抑制剂及其相应的方法、配方和组合物，用于抑制JNK并治疗JNK介导的疾病。本申请公开了JNK抑制剂，如下式I所述：其中变量如本文所定义。本文所披露的化合物和组合物，有利于调节JNK的活性并治疗与JNK活性相关的疾病。本文披露了用所述化合物抑制JNK和治疗JNK介导的疾病的方法和配方，以及制备上述化合物和相应组合物的过程。
• Aminomethyl quinolone compounds
  申请人：Bilotta Joseph A.

  公开号：US08501732B2

  公开（公告）日：2013-08-06

  The invention relates to JNK inhibitors and corresponding methods, formulations, and compositions for inhibiting JNK and treating JNK-mediated disorders. The application discloses JNK inhibitors, as described below in Formula I: wherein the variables are as defined herein. The compounds and compositions disclosed herein are useful to modulate the activity of JNK and treat diseases associated with JNK activity. Disclosed are methods and formulations for inhibiting JNK and treating JNK-mediated disorders, and the like, with the compounds, and processes for making said compounds, and corresponding compositions, disclosed herein.

  该发明涉及JNK抑制剂及相应的方法、配方和组成物，用于抑制JNK并治疗JNK介导的疾病。该申请披露了如下式I所述的JNK抑制剂：其中变量如本文所定义。本文所披露的化合物和组成物有用于调节JNK活性并治疗与JNK活性相关的疾病。本文还披露了使用上述化合物的方法和配方，用于抑制JNK并治疗JNK介导的疾病等，以及制备上述化合物和相应组成物的过程。
• Metal polishing slurry
  申请人：FUJIFILM Corporation

  公开号：EP1837903A2

  公开（公告）日：2007-09-26

  The metal polishing slurry according to the present invention for use in chemical mechanical polishing during semiconductor device fabrication contains at least one compound of formula (A) below and at least one compound of formula (B) or formula (C) below: [wherein R1, R2, R3, R4 and R5 are each independently hydrogen, methyl, ethyl, phenyl, amino, sulfo, carboxy, aminomethyl, carboxymethyl, sulfomethyl, o-aminophenyl, m-aminophenyl, p-aminophenyl, o-carboxyphenyl, m-carboxyphenyl, p-carboxyphenyl, o-sulfophenyl, m-sulfophenyl or p-sulfophenyl].

  根据本发明，在半导体器件制造过程中用于化学机械抛光的金属抛光浆料含有至少一种下式（A）化合物和至少一种下式（B）或（C）化合物： [其中 R1、R2、R3、R4 和 R5 各自独立地为氢、甲基、乙基、苯基、氨基、磺基、羧基、氨基甲基、羧基甲基、磺基甲基、邻氨基苯基、间氨基苯基、对氨基苯基、邻羧基苯基、间羧基苯基、对羧基苯基、邻磺基苯基、间磺基苯基或对磺基苯基]。
• CYCLOALKANE-1,3-DIAMINE DERIVATIVE
  申请人：Daiichi Sankyo Company, Limited

  公开号：EP3892278A1

  公开（公告）日：2021-10-13

  The present invention provides a compound or a pharmaceutically acceptable salt thereof having an inhibitory action on the interaction between menin and an MLL protein. The compound represented by the formula (1) or a pharmaceutically acceptable salt thereof. wherein, in the formula (1), the dotted circle, R1, R2, R3, R4, R5, R6, R7, R8, Ring Q1, W, m and n are each as defined in the description.

  本发明提供了一种化合物或其药学上可接受的盐，对 Menin 与 MLL 蛋白之间的相互作用具有抑制作用。式（1）所代表的化合物或其药学上可接受的盐。 其中，在式(1)中，虚圈、R1、R2、R3、R4、R5、R6、R7、R8、环Q1、W、m和n各自如描述中所定义。