Lacton-5,6-Dihydroxy-3-carboxy-7-oxa-bicyclo<2.2.1>heptancarbonsaeure-(2)-methylester | 1187449-98-4

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 内酯类
• 英文名称: Lacton-5,6-Dihydroxy-3-carboxy-7-oxa-bicyclo<2.2.1>heptancarbonsaeure-(2)-methylester
• 英文别名: Methyl 2-hydroxy-5-oxo-4,8-dioxatricyclo[4.2.1.03,7]nonane-9-carboxylate
• CAS: 1187449-98-4
• 化学式: C₉H₁₀O₆
• 分子量: 214.175
• InChiKey: KJVPSJHWDUHVQM-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  -1.3
• 重原子数：
  15
• 可旋转键数：
  2
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.78
• 拓扑面积：
  82.1
• 氢给体数：
  1
• 氢受体数：
  6

文献信息

• POLYMERIZABLE ESTER COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：HASEGAWA Koji

  公开号：US20130017484A1

  公开（公告）日：2013-01-17

  Polymerizable ester compounds having formula (1) are novel wherein R 1 is H, F, methyl or trifluoromethyl, R 2 is an acid labile group, Aa is a divalent hydrocarbon group which may be separated by —O— or —C(═O)—, and k 1 is 0 or 1. They are useful as monomers to produce polymers which are transparent to radiation ≦500 nm. Radiation-sensitive resist compositions comprising the polymers as base resin exhibit excellent developed properties.

  具有式（1）的可聚合酯化合物是新颖的，其中R1为H、F、甲基或三氟甲基，R2为酸敏感基团，Aa为二价的碳氢基团，可以通过—O—或—C（═O）—分离，k1为0或1。它们可用作单体，用于生产对辐射≦500 nm透明的聚合物。以这些聚合物作为基础树脂的辐射敏感抗蚀剂组合物表现出优异的显影性能。
• Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method using the same, polymerizable compound and polymer compound obtained by polymerizing the polymerizable compound
  申请人：FUJIFILM Corporation

  公开号：EP2105440B1

  公开（公告）日：2012-10-24
• NOVEL COMPOUND AND METHOD OF PRODUCING SAME, ACID GENERATOR, RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN
  申请人：Kawaue Akiya

  公开号：US20090208871A1

  公开（公告）日：2009-08-20

  A resist composition including a base component (A) that exhibits changed solubility in an alkali developing solution under the action of acid, and an acid generator component (B) that generates acid upon exposure, wherein the acid generator component (B) includes an acid generator (B1) consisting of a compound represented by general formula (b1-2) shown below: [Chemical Formula 1] A + Z − (b1-2) wherein A + represents an organic cation; and Z − represents an anionic cyclic group, wherein the cyclic group includes an ester linkage within the ring structure, two mutually different groups are bonded to the ring structure, one of these groups includes an ester linkage in which a carbon atom that constitutes part of the ester linkage is bonded directly to the ring structure, and the other group includes an anion moiety.
• POLYMERIZABLE TERTIARY ESTER COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20130189620A1

  公开（公告）日：2013-07-25

  The present invention provides a polymerizable tertiary ester compound represented by the following general formula (1a) or (1b). There is provided a polymerizable ester compound useful as a monomer for a base resin of a resist composition having a high resolution and a reduced pattern edge roughness in photolithography using a high-energy beam such as an ArF excimer laser light as a light source, especially in immersion lithography, a polymer containing a polymer of the ester compound, a resist composition containing the polymer as a base resin, and a patterning process using the resist composition.
• PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME
  申请人：Rohm and Haas Electronic Materials, LLC

  公开号：US20160124304A1

  公开（公告）日：2016-05-05

  New methods are provided for synthesis of photoacid generator compounds (“PAGs”), new photoacid generator compounds and photoresist compositions that comprise such PAG compounds. In a particular aspect, sulfonium-containing (S+) photoacid generators and methods of synthesis of sulfonium photoacid generators are provided.