4-(1H-四唑-5-基氧基)苯胺 | 467226-44-4

• 分子结构分类: 有机化合物 - 有机氧化合物
• 中文名称: 4-(1H-四唑-5-基氧基)苯胺
• 英文名称: 4-(1H-tetrazol-5-yloxy)aniline
• 英文别名: 5-(4-aminophenoxy)-1H-tetrazole；4-(2H-tetrazol-5-yloxy)aniline
• CAS: 467226-44-4
• 化学式: C₇H₇N₅O
• mdl: MFCD08060048
• 分子量: 177.165
• InChiKey: KYRUSFOAGBAPGT-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  0.7
• 重原子数：
  13
• 可旋转键数：
  2
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.0
• 拓扑面积：
  89.7
• 氢给体数：
  2
• 氢受体数：
  5

安全信息

• 海关编码：
  2933990090
• WGK Germany：
  3

反应信息

• 作为反应物：
  描述：

  4-(1H-四唑-5-基氧基)苯胺 、 丙烯酰氯 以 苯 为溶剂， 反应 24.0h， 以68.6%的产率得到N-[4-(1H-tetrazol-5-yloxy)phenyl]acrylamide
  参考文献：
  名称：

  Synthesis, characterization, and free radical polymerization of new acrylamide-based monomer containing a 1H-tetrazole ring: Thermal investigation and derivatization of the homopolymer

  摘要：

  N-[4-(1H-Tetrazol-5-yloxy)phenyl]acrylamide was synthesized and subjected to homopolymerization under radical initiation. The structure of the monomer and homopolymer was characterized by elemental analyses (C, H, N), FT-IR, and C-13 and H-1 NMR data. Thermal behavior of the homopolymer was studied by differential scanning calorimetry and thermogravimetric analysis. The tetrazole ring in the homopolymer was converted into imidoyl azide derivatives via reactions with cyanogen bromide, p-toluenesulfonyl chloride, and trifluoro-methanesulfonyl chloride.

  DOI：

  10.1134/s1070428007060152

文献信息

• NOVEL HETARYL-PHENYLENEDIAMINE-PYRIMIDINES AS PROTEIN KINASE INHIBITORS
  申请人：Jautelat Rolf

  公开号：US20080176866A1

  公开（公告）日：2008-07-24

  The invention relates to novel hetaryl-phenylenediamine-pyrimidines and to their structurally related oxygen and sulphur analogues of the general formula I, processes for their preparation, and their use as medicaments.

  这项发明涉及新型杂环-苯二胺-嘧啶化合物及其结构相关的氧和硫类似物，其一般化学式为I，以及它们的制备方法和作为药物的用途。
• Synthesis and characterization of new polynuclear bis-5-oxy-1H-tetrazoles
  作者：Y. Mansoori、R. Sarvari、M. R. Zamanloo、G. H. Imanzadeh

  DOI：10.1134/s1070428009010229

  日期：2009.1

  Different bis-phenols reacted with cyanogen bromide in the presence of triethylamine as base to give the corresponding bis-cyanates which were treated with sodium azide in acetone as solvent to produce new bis(5-oxy-1H-tetrazole) derivatives. One more bis-tetrazole derivative was synthesized by reaction of 5-(4-aminophenoxy)-1H-tetrazole with adipoyl chloride. The prepared compounds were characterized

  在三乙胺作为碱的存在下，不同的双酚与溴化氰反应，得到相应的双氰酸酯，将其用叠氮化钠在丙酮中作为溶剂处理，生成新的双（5-氧基-1 H-四唑）衍生物。通过5-（4-氨基苯氧基）-1 H-四唑与己二酰氯的反应合成了另一种双四唑衍生物。所制备的化合物通过常规光谱技术表征。
• Neuartige Hetaryl-Phenylendiamin-Pyrimidine als Proteinkinaseinhibitoren zur Behandlung von Krebs
  申请人：Bayer Schering Pharma Aktiengesellschaft

  公开号：EP1939185A1

  公开（公告）日：2008-07-02

  Die Erfindung betrifft neuartige Hetaryl-Phenylendiamin-Pyrimidine sowie deren strukturell verwandte Sauerstoff- und Schwefelanaloga der allgemeinen Formel I, Verfahren zu deren Herstellung, sowie deren Verwendung als Arzneimittel in der Behandlung von Krebs.

  本发明涉及通式 I 的新型 hetaryl-苯二胺嘧啶及其结构上相关的氧和硫类似物，涉及其制备工艺及其作为治疗癌症药物的用途。
• Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt comprising substrates
  申请人：BASF SE

  公开号：US10899945B2

  公开（公告）日：2021-01-26

  Use of a chemical mechanical polishing (CMP) composition (Q) for chemical mechanical polishing of a substrate (S) comprising (i) cobalt and/or (ii) a cobalt alloy and (iii) Ti N and/or TaN, wherein the CMP composition (Q) comprises (E) Inorganic particles (F) at least one organic compound comprising an amino-group and an acid group (Y), wherein said compound comprises n amino groups and at least n+1 acidic protons, wherein n is a integer≥1. (G) at least one oxidizer in an amount of from 0.2 to 2.5 wt.-% based on the total weight of the respective CMP composition, (H) an aqueous medium wherein the CMP composition (Q) has a pH of more than 6 and less than 9.

  一种化学机械抛光(CMP)组合物(Q)，用于对包含(i)钴和/或(ii)钴合金和(iii)Ti N和/或TaN的基体(S)进行化学机械抛光，其中所述CMP组合物(Q)包含 (E) 无机颗粒 (F) 至少一种包含氨基和酸基(Y)的有机化合物，其中所述化合物包含n个氨基和至少n+1个酸性质子，其中n为整数≥1。(G) 至少一种氧化剂，其用量为 0.2 至 2.5 wt.- %，以混合物总重量为基准。(H) 一种水介质，其中 CMP 组合物 (Q) 的 pH 值大于 6 但小于 9。
• USE OF A CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR POLISHING OF COBALT COMPRISING SUBSTRATES
  申请人：BASF SE

  公开号：EP3334794B1

  公开（公告）日：2020-02-19