3-(1-methacryloyloxyethoxy)-1-oxaspiro[4.5]decane-2-on | 862474-64-4

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: 3-(1-methacryloyloxyethoxy)-1-oxaspiro[4.5]decane-2-on
• 英文别名: 1-[(2-Oxo-1-oxaspiro[4.5]decan-3-yl)oxy]ethyl 2-methylprop-2-enoate
• CAS: 862474-64-4
• 化学式: C₁₅H₂₂O₅
• 分子量: 282.337
• InChiKey: AQLVHXAEQYHJSD-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.2
• 重原子数：
  20
• 可旋转键数：
  5
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.73
• 拓扑面积：
  61.8
• 氢给体数：
  0
• 氢受体数：
  5

文献信息

• Unsaturated carboxylic acid hemicacetal ester, polymeric compound and photoresist resin composition
  申请人：Koyama Hiroshi

  公开号：US20060160247A1

  公开（公告）日：2006-07-20

  A polymeric compound having a repeated unit corresponding to an unsaturated carboxylic acid hemiacetal ester represented by the following formula (1); wherein R a is a hydrogen atom, a halogen atom, an alkyl group of carbon number 1 to 6 or a haloalkyl group of carbon number 1 to 6, R b is a hydrocarbon group having a hydrogen atom at a first poison, R c is a hydrogen atom or a hydrocarbon group and R d is an organic group having a cyclic skeleton. This polymeric compound, further, may have a repeated unit corresponding to at least one monomer selected from a monomer having a lactone skeleton, a monomer having a cyclic ketone skeleton, a monomer having an acid anhydride group and a monomer having an imide group [except for a repeated unit corresponding to the said unsaturated carboxylic acid hemiacetal ester] and/or a repeated unit corresponding to at least one monomer selected from a monomer having a hydroxyl group and others. This polymeric compound shows superior acid-eliminating function in case of using as photoresist.

  一种聚合物化合物，其重复单元对应于由以下式（1）表示的不饱和羧酸半缩醛酯： 其中，R为氢原子，卤素原子，碳数为1到6的烷基或碳数为1到6的卤代烷基，Rb为在第一位置具有氢原子的碳氢基，Rc为氢原子或碳氢基，而Rd为具有环状骨架的有机基团。此聚合物化合物还可以具有对应于至少一种单体的重复单元，所述单体具有内酯骨架、环状酮骨架、酸酐基或亚酰胺基[除了对应于所述不饱和羧酸半缩醛酯的重复单元]和/或对应于至少一种具有羟基的单体的重复单元和其他单体。该聚合物化合物在用作光刻胶时表现出优越的酸消除功能。
• POLYMERIC COMPOUND CONTAINING REPEATING UNIT HAVING 2-OXATRICYCLO[4.2.1.04,8]NONAN-3-ONE RING, AND PHOTORESIST RESIN COMPOSITION
  申请人：DAICEL CHEMICAL INDUSTRIES, LTD.

  公开号：EP1681307A1

  公开（公告）日：2006-07-19

  A polymeric compound of the invention includes at least one monomer unit represented by the following formula (I); wherein Ra is a hydrogen atom, a halogen atom, an alkyl group of 1 to 6 carbon atoms or an haloalkyl group of 1 to 6 carbon atoms; each of R1 and R2 is identical to or different from a hydrogen atom or a hydrocarbon group, provided that at least one of R1 and R2 is a hydrocarbon group; R1 and R2 may be bonded together to form a ring with an adjacent carbon atom; and each of R3, R4, R5, R6, R7, R8 and R9 is identical to or different from a hydrogen atom or a hydrocarbon group. This polymeric compound has not only high substrate adhesion and high etching resistance but also high solubility for a resist solvent.

  本发明的聚合化合物包括至少一个由下式 (I) 表示的单体单元； 其中，Ra 是氢原子、卤素原子、1 至 6 个碳原子的烷基或 1 至 6 个碳原子的卤代烷基；R1 和 R2 中的每一个与氢原子或烃基相同或不同，条件是 R1 和 R2 中至少有一个是烃基；R1 和 R2 可键合在一起，与相邻的碳原子形成一个环；R3、R4、R5、R6、R7、R8 和 R9 中的每一个与氢原子或烃基相同或不同。这种聚合化合物不仅具有高基底附着力和高抗蚀刻性，而且对抗蚀剂溶剂具有高溶解性。
• Polymeric compound containing a repeated unit having a 2-oxatricyclo [4.2.1.0 4.8] nonan-3-one ring and photoresist resin composition
  申请人：Koyama Hiroshi

  公开号：US20060281022A1

  公开（公告）日：2006-12-14

  A polymeric compound of the invention includes at least one monomer unit represented by the following formula (I); wherein R a is a hydrogen atom, a halogen atom, an alkyl group of 1 to 6 carbon atoms or an haloalkyl group of 1 to 6 carbon atoms; each of R 1 and R 2 is identical to or different from a hydrogen atom or a hydrocarbon group, provided that at least one of R 1 and R 2 is a hydrocarbon group; R 1 and R 2 may be bonded together to form a ring with an adjacent carbon atom; and each of R 3 , R 4 , R 5 , R 6 , R 7 , R 8 and R 9 is identical to or different from a hydrogen atom or a hydrocarbon group. This polymeric compound has not only high substrate adhesion and high etching resistance but also high solubility for a resist solvent.
• PROCESS FOR PRODUCTION OF POLYMER
  申请人：Okumura Arimichi

  公开号：US20110040056A1

  公开（公告）日：2011-02-17

  Disclosed is a process for the production of a polymer by polymerizing a monomer or monomers in a solvent to give a polymer solution; and bringing the polymer solution into contact with a poor solvent to precipitate the polymer and to remove impurities therefrom, in which the polymer solution is diluted with a solvent before being brought into contact with the poor solvent to precipitate the polymer. The polymerization solvent preferably has a coefficient of viscosity at 20° C. of 1 mPa·s or more. The dilution solvent preferably has a coefficient of viscosity at 20° C. of less than 1 mPa·s. The process enables efficient production of a polymer with good reproducibility in quality, which polymer contains less amounts of residual monomers and is useful as resist polymers, polymers for undercoat films of multilayer resists, polymers for anti-reflection coatings, and polymers for immersion topcoats.
• US7407733B2
  申请人：——

  公开号：US7407733B2

  公开（公告）日：2008-08-05