1-Hydroxymethyl-perhydronaphthalin | 17264-06-1

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: 1-Hydroxymethyl-perhydronaphthalin
• 英文别名: 1,2,3,4,4a,5,6,7,8,8a-Decahydronaphthalen-1-ylmethanol
• CAS: 17264-06-1
• 化学式: C₁₁H₂₀O
• 分子量: 168.279
• InChiKey: MFEUDYLNPARYNR-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.5
• 重原子数：
  12
• 可旋转键数：
  1
• 环数：
  2.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  20.2
• 氢给体数：
  1
• 氢受体数：
  1

文献信息

• Curable epoxy resin composition
  申请人：ASAHI DENKA KOGYO KABUSHIKI KAISHA

  公开号：EP0197458A2

  公开（公告）日：1986-10-15

  A thermosetting epoxy resin composition of one pack type is provided which contains as indispensable constituents (I) an epoxy resin containing more than one adjacent epoxy groups on the average in the molecule and (II) curing amount or curing-accelerating amount of a compound obtained by reacting (a) a specified amine/epoxy adduct with (b) phenolic , resin(s) and/or polyhydric phenol compound(s) in a weight ratio of (a) to (b) of 1/0.1 to 1/0.8. The composition of the present invention has excellent storage stability and it is curable at a relatively low temperature to form a cured product having excellent mechanical strength, adhesiveness and water resistance.

  本发明提供了一种单组分热固性环氧树脂组合物，其不可或缺的成分包括：(I) 分子中平均含有一个以上相邻环氧基团的环氧树脂；(II) 固化量或固化加速量的化合物，该化合物由(a)特定的胺/环氧加合物与(b)酚醛树脂和/或多羟基酚化合物反应而得，(a)与(b)的重量比为 1/0.1 至 1/0.8。本发明的组合物具有极佳的储存稳定性，可在相对较低的温度下固化，形成具有极佳机械强度、粘合性和耐水性的固化产品。
• CURABLE COMPOSITION FOR NANOIMPRINT AND PATTERN-FORMING METHOD
  申请人：FUJIFILM Corporation

  公开号：EP2244281A1

  公开（公告）日：2010-10-27

  A curable composition for nanoimprints which comprises a polycyclic aromatic structure-having polymerizable monomer and a photopolymerization initiator is excellent in mold releasability, etching resistance and solvent resistance and capable of forming patterns.

  一种用于纳米压印的固化组合物由具有多环芳烃结构的可聚合单体和光聚合引发剂组成，具有优异的脱模性、耐蚀刻性和耐溶剂性，并能形成图案。
• CURABLE COMPOSITION FOR NANOIMPRINT, AND PATTERNING METHOD
  申请人：KODAMA Kunihiko

  公开号：US20090283937A1

  公开（公告）日：2009-11-19

  A curable composition for nanoimprints which comprises a polycyclic aromatic structure-having polymerizable monomer and a photopolymerization initiator is excellent in mold releasability, etching resistance and solvent resistance and capable of forming patterns.
• US4535103A
  申请人：——

  公开号：US4535103A

  公开（公告）日：1985-08-13
• US4657953A
  申请人：——

  公开号：US4657953A

  公开（公告）日：1987-04-14