α-Methoxy-α-acetoxyessigsaeure-methylester | 24607-11-2

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: α-Methoxy-α-acetoxyessigsaeure-methylester
• 英文别名: Methyl 2-acetyloxy-2-methoxyacetate
• CAS: 24607-11-2
• 化学式: C₆H₁₀O₅
• 分子量: 162.142
• InChiKey: XOIWLDPRBXTYOV-UHFFFAOYSA-N

物化性质

• 沸点：
  203.7±25.0 °C(Predicted)
• 密度：
  1.147±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  0
• 重原子数：
  11
• 可旋转键数：
  5
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.67
• 拓扑面积：
  61.8
• 氢给体数：
  0
• 氢受体数：
  5

反应信息

• 作为反应物：
  描述：

  α-Methoxy-α-acetoxyessigsaeure-methylester 在 五氯化磷 作用下， 生成 甲基氯(甲氧基)乙酸酯
  参考文献：
  名称：

  Gloede,J. et al., Journal fur praktische Chemie (Leipzig 1954), 1969, vol. 311, p. 497 - 505

  摘要：

  DOI：
• 作为产物：
  描述：

  二甲氧基乙酸甲酯 、 乙酸酐 在 磷酸 作用下， 生成 α-Methoxy-α-acetoxyessigsaeure-methylester
  参考文献：
  名称：

  Gloede,J. et al., Journal fur praktische Chemie (Leipzig 1954), 1969, vol. 311, p. 497 - 505

  摘要：

  DOI：

文献信息

• Pattern forming method, composition kit and resist film, manufacturing method of electronic device using these, and electronic device
  申请人：FUJIFILM Corporation

  公开号：US10031419B2

  公开（公告）日：2018-07-24

  There is provided a pattern forming method comprising (i) forming a film on a substrate using an actinic ray-sensitive or radiation-sensitive resin composition which contains (A) a resin which decomposes due to an action of an acid to change its solubility with respect to a developer and (C) a specific resin, (ii) forming a top coat layer using a top coat composition which contains a resin (T) on the film, (iii) exposing the film which has the top coat layer to actinic rays or radiation, and (iv) forming a pattern by developing the film which has the top coat layer after the exposing.

  本发明提供了一种图案形成方法，包括(i)使用感光树脂组合物或辐射敏感树脂组合物在基底上形成胶片，该组合物包含(A)由于酸的作用而分解，从而改变其相对于显影剂的溶解度的树脂和(C)特定树脂、(ii) 使用含有树脂 (T) 的表层组合物在胶片上形成表层，(iii) 将具有表层的胶片暴露于放 射线或辐射，(iv) 在暴露后对具有表层的胶片进行显影，形成图案。
• BRANCHED POLYCARBONATE
  申请人：Namba Nobutsugu

  公开号：US20130136883A1

  公开（公告）日：2013-05-30

  A branched polycarbonate having a branching derived from a polyfunctional compound, comprising a repeating unit represented by general formula (1), a branched structure (a) derived from the polyfunctional compound and a branched structure (b) including at least one selected from the group consisting of branched structures represented by general formulas (2), (3) and (4), the total content of (a) and (b) with respect to (1) being 0.2-1.0 mol %, the ratio of (b) with respect to the total of (a) and (b) being 0.1-0.6, and the ratio of (2) with respect to the content of (b) being 0.5 or greater. [In formulas, Ar represents a divalent aromatic residue and Ar′ represents a trivalent aromatic residue.]
• ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM AND METHOD OF FORMING PATTERN
  申请人：FUJIFILM CORPORATION

  公开号：US20140227636A1

  公开（公告）日：2014-08-14

  Provided is an actinic-ray- or radiation-sensitive resin composition including a resin (Aa) containing at least one repeating unit (Aa1) derived from monomers of general formula (aa1-1) below and at least one repeating unit (Aa2) derived from monomers of general formula (aa2-1) below and comprising a resin (Ab) that when acted on by an acid, changes its alkali solubility.
• PATTERN FORMING METHOD, COMPOSITION KIT AND RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE USING THESE, AND ELECTRONIC DEVICE
  申请人：FUJIFILM Corporation

  公开号：US20160048075A1

  公开（公告）日：2016-02-18

  There is provided a pattern forming method comprising (i) forming a film on a substrate using an actinic ray-sensitive or radiation-sensitive resin composition which contains (A) a resin which decomposes due to an action of an acid to change its solubility with respect to a developer and (C) a specific resin, (ii) forming a top coat layer using a top coat composition which contains a resin (T) on the film, (iii) exposing the film which has the top coat layer to actinic rays or radiation, and (iv) forming a pattern by developing the film which has the top coat layer after the exposing.
• ORGANIC THIN-FILM TRANSISTOR AND METHOD FOR MANUFACTURING SAME
  申请人：FUJIFILM Corporation

  公开号：US20160372662A1

  公开（公告）日：2016-12-22

  An organic thin-film transistor including: a gate electrode, an organic semiconductor layer, a gate insulating layer, a source electrode, and a drain electrode on a substrate, in which the organic semiconductor layer includes an organic semiconductor and a resin (C) having one or more groups selected from the group consisting of a group having fluorine atoms, a group having silicon atoms, an alkyl group having one or more carbon atoms or having two or more carbon atoms in a case of forming an alkoxycarbonyl group, a cycloalkyl group, an aralkyl group, an aryloxycarbonyl group, an aromatic ring group substituted with at least one alkyl group, and an aromatic ring group substituted with at least one cycloalkyl group; and a method for manufacturing an organic thin-film transistor including: applying a coating solution which contains the organic semiconductor and the resin (C) and causing the resin (C) to be unevenly distributed.