Copper paste for joining, method for manufacturing joined body, and method for manufacturing semiconductor device
申请人:HITACHI CHEMICAL COMPANY, LTD.
公开号:US10748865B2
公开(公告)日:2020-08-18
Provided is a copper paste for joining including copper particles, second particles including a metal element other than copper, and a dispersion medium, in which the copper particles include submicro copper particles having a volume-average particle diameter of 0.12 μm or more and 0.8 μm or less and micro copper particles having a volume-average particle diameter of 2 μm or more and 50 μm or less, a sum of a content of the submicro copper particles and a content of the micro copper particles is 80% by mass or more of a sum of masses of the copper particles and the second particles, the content of the submicro copper particles is 30% by mass or more and 90% by mass or less of a sum of a mass of the submicro copper particles and a mass of the micro copper particles, and a content of the second particles is 0.01% by mass or more and 10% by mass or less of the sum of the masses of the copper particles and the second particles.
本发明提供了一种用于连接的铜浆,包括铜颗粒、包括铜以外的金属元素的第二颗粒和分散介质,其中铜颗粒包括体积-平均颗粒直径大于或等于 0.12 μm 且小于或等于 0.12 μm 的亚微型铜颗粒,以及体积-平均颗粒直径大于或等于 2 μm 且小于或等于 50 μm 的微型铜颗粒。8 μm 或更小的亚微米铜颗粒和体积平均颗粒直径为 2 μm 或更大且小于 50 μm 的微米铜颗粒,亚微米铜颗粒的含量和微米铜颗粒的含量之和为铜颗粒和第二颗粒质量之和的 80% 或更多,亚微米铜颗粒的含量为亚微米铜颗粒质量和微米铜颗粒质量之和的 30% 或更多且 90% 或更少,第二颗粒的含量为 0.01% (以质量计)或以上,10% (以质量计)或以下。