3-isopropyl-4-methyl-dihydro-furan-2-one | 108420-21-9

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 内酯类
• 英文名称: 3-isopropyl-4-methyl-dihydro-furan-2-one
• 英文别名: 3-Isopropyl-4-methyl-dihydro-furan-2-on；4-Methyl-3-propan-2-yloxolan-2-one
• CAS: 108420-21-9
• 化学式: C₈H₁₄O₂
• 分子量: 142.198
• InChiKey: ZGZIJAOTDSGXMP-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2
• 重原子数：
  10
• 可旋转键数：
  1
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.88
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为产物：
  描述：

  3-甲基-2-丙-2-基丁酸 在 双氧水 、 C₄₆H₄₀F₁₈MnN₆O₆S₂ 作用下， 以 水 为溶剂， 以81%的产率得到3-isopropyl-4-methyl-dihydro-furan-2-one
  参考文献：
  名称：

  非活化一级和二级 γ-C-H 键的高度对映选择性催化内酯化

  摘要：

  手性氧化脂肪族部分在生物和药物相关分子中反复出现，并构成了需要进一步阐述的最通用的功能类型之一。在此，我们报告了一种通过对易获得的羧酸中的强非活化伯键和仲 C( sp 3 )–H 键的对映选择性氧化来直接和一般地获得手性γ -内酯的方案。关键的实现方面是使用强大的空间阻碍锰催化剂，使用过氧化氢作为氧化剂提供出色的对映选择性（高达 >99.9%）和产率（高达 96%）。所得的γ-内酯对于天然产物和可回收聚合物材料的制备具有直接意义。

  DOI：

  10.1021/jacs.3c06231

文献信息

• Chemical amplification type positive photosensitive resin composition, a photosensitive dry film, a method for producing a photosensitive dry film, a method for producing a patterned resist film, a method of manufacturing a template with a substrate, and a method of manufacturing a plated shaped product, and a Mercapto compound
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US11061326B2

  公开（公告）日：2021-07-13

  A chemically amplified positive-type photosensitive resin composition capable of suppressing the occurrence of “footing” in which the width of the bottom (the side proximal to the surface of a support) becomes narrower than the top (the side proximal to the surface of a resist layer) in the nonresist portion when a resist pattern serving as a template for a plated article is formed on a metal surface of a substrate having a metal surface using the composition. A mercapto compound having the formula (C) shown below is added to the composition and includes an acid generator which generates acid upon exposure to an irradiated active ray or radiation and a resin the solubility of which in alkali increases under the action of acid: wherein n1, n2, Rc1, and Rc are defined in claim 1.

  一种化学放大正型光敏树脂组合物，当使用该组合物在具有金属表面的基板的金属表面上形成作为电镀物品模板的抗蚀图案时，能够抑制非抗蚀部分底部（靠近支撑物表面的一面）的宽度比顶部（靠近抗蚀层表面的一面）窄的 "起脚 "现象的发生。在组合物中加入具有下图所示式（C）的巯基化合物，该化合物包括一种酸发生器和一种树脂，前者在受到辐照活性射线或辐射时产生酸，后者在酸的作用下在碱中的溶解度增加： 其中 n1、n2、Rc1 和 Rc 在权利要求 1 中定义。
• CHEMICAL AMPLIFICATION TYPE POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, A PHOTOSENSITIVE DRY FILM, A METHOD FOR PRODUCING A PHOTOSENSITIVE DRY FILM, A METHOD FOR PRODUCING A PATTERNED RESIST FILM, A METHOD OF MANUFACTURING A TEMPLATE WITH A SUBSTRATE, AND A METHOD OF MANUFACTURING A PLATED SHAPED PRODUCT, AND A MERCAPTO COMPOUND
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US20190101825A1

  公开（公告）日：2019-04-04

  A chemically amplified positive-type photosensitive resin composition capable of suppressing the occurrence of “footing” in which the width of the bottom (the side proximal to the surface of a support) becomes narrower than the top (the side proximal to the surface of a resist layer) in the nonresist portion when a resist pattern serving as a template for a plated article is formed on a metal surface of a substrate having a metal surface using the composition. A mercapto compound with a specific structure is added to the composition and includes an acid generator which generates acid upon exposure to an irradiated active ray or radiation and a resin the solubility of which in alkali increases under the action of acid.
• US7402606B2
  申请人：——

  公开号：US7402606B2

  公开（公告）日：2008-07-22