3,4-Diethyl-4-butanolid | 36560-39-1

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 内酯类
• 英文名称: 3,4-Diethyl-4-butanolid
• 英文别名: 4,5-Diethyloxolan-2-one
• CAS: 36560-39-1
• 化学式: C₈H₁₄O₂
• 分子量: 142.198
• InChiKey: YXKUBRHBUAHTEM-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.9
• 重原子数：
  10
• 可旋转键数：
  2
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.88
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  2

文献信息

• A process of coupling living polymers with gamma-hydroxy acid-lactones
  申请人：PHILLIPS PETROLEUM COMPANY

  公开号：EP0050832A2

  公开（公告）日：1982-05-05

  Lactones derived from gamma-hydroxy acids are employed as coupling agents for polymers derived from alkali metal-initiated polymerizations. These coupling agents provide effective coupling without formation of undesirable by-products.

  从γ-羟基酸中提取的内酯可用作碱金属引发聚合反应所产生的聚合物的偶联剂。 这些偶联剂可提供有效的偶联，而不会形成不良副产品。
• A CONTINUOUS PROCESS FOR THE CARBONYLATION OF ETHYLENE
  申请人：Lucite International UK Limited

  公开号：EP2794548B1

  公开（公告）日：2019-05-15
• PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE
  申请人：FUJIFILM CORPORATION

  公开号：US20150378257A1

  公开（公告）日：2015-12-31

  According to one example of the present application, there is provided a pattern forming method including: (i) forming a film by using an actinic ray-sensitive or radiation-sensitive resin composition containing (A) a specific resin and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; (ii) exposing the film; and (iii) developing the film exposed, by using an organic solvent-containing developer to form a negative pattern.
• PATTERN FORMING METHOD, RESIST PATTERN, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE
  申请人：FUJIFILM Corporation

  公开号：US20170349686A1

  公开（公告）日：2017-12-07

  A pattern forming method includes the following steps (a) to (d): (a) applying an actinic ray-sensitive or radiation-sensitive resin composition including a resin capable of increasing a polarity by the action of an acid onto a substrate to form a resist film, (b) forming an upper layer film on the resist film, (c) exposing the resist film having the upper layer film formed thereon, and (d) developing the exposed resist film using an organic developer to form a pattern, in which the resin capable of increasing the polarity by the action of an acid includes an acid-decomposable repeating unit having an acid-leaving group a having 4 to 7 carbon atoms, and the maximum value of the number of carbon atoms and the protection rate of the acid-leaving group a satisfy specific conditions.
• US4308364A
  申请人：——

  公开号：US4308364A

  公开（公告）日：1981-12-29