Novel polymerizable ester compounds having formulae (1) to (4) undergo no acid-induced decomposition by β-elimination wherein A
1
is a polymerizable functional group having a carbon-carbon double bond, R
1
is H or —C—(R
5
)
3
, R
2
and R
3
are alkyl, R
4
is H or alkyl, R
5
is a monovalent hydrocarbon group, X is alkylene, Y is methylene, ethylene or isopropylidene, Z is alkylene, and n=1 or 2. Resist compositions comprising polymers derived from the ester compounds have excellent sensitivity and resolution and lend themselves to micropatterning lithography.
具有式(1)至(4)的新型可聚合酯化合物在β-消除反应中不会发生酸诱导分解,其中A1是具有碳-碳双键的可聚合官能团,R1为H或-C-(R5)3,R2和R3为烷基,R4为H或烷基,R5为一价的碳氢基团,X为烷基,Y为亚甲基、
乙烯基或异丙基亚甲基,Z为烷基,n=1或2。由酯化合物衍生的聚合物制备的抗蚀剂具有优异的敏感性和分辨率,并适用于微型图案制造技术。